title: Sticking probability of CN(X2Σ+) radicals onto amorphous carbon nitride films formed from the decomposition of BrCN induced by the microwave discharge flow of Ar.
abstract: The sticking probability, s, of CN(X(2)Σ(+)) radicals onto amorphous carbon nitride (a-CN(x)) films with high [N]/([N]+[C]) ratios (≤0.5) was evaluated. CN(X(2)Σ(+)) radicals were generated from the decomposition of BrCN with the microwave discharge flow of Ar in the two experimental configurations, I and II, where the distance between the tip of the nozzle introducing BrCN is close (≈10 mm) to and distant (≈0.3 m) from the laser-beam path or the Si substrate, respectively. For each configuration, s was evaluated both under the desiccated and H(2)O-added conditions from the number density of CN(X(2)Σ(+)) evaluated from the intensity of the CN(A(2)Π(i)-X(2)Σ(+)) laser-induced fluorescence spectrum calibrated against Rayleigh scattering intensity of Ar, the flow speed measured by a time-resolved emission, and the film mass. The [N]/([N]+[C]) ratios of films were evaluated as 0.4-0.5 and 0.3 in the configurations I and II, respectively, from the compositional analysis using Rutherford back scattering and elastic recoil detection analysis together with the XPS analysis. The variation of s under various experimental conditions was discussed based on the electron densities in the reaction region and the relative density of the hydrogen-termination structures of the film surface.
authors: Department of Chemistry, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan.
authors: Haruhiko
authors: H
authors: Ito
authors: Hitoshi
authors: H
authors: Araki
authors: Akira
authors: A
authors: Wada
authors: Ayumi
authors: A
authors: Yamamoto
authors: Tsuneo
authors: T
authors: Suzuki
authors: Hidetoshi
authors: H
authors: Saitoh
mesh_terms: D001128:Argon / Q000737:chemistry*; D001965:Bromides / Q000737:chemistry*; D002625:Chemistry, Organic / Q000379:methods*; D003486:Cyanides / Q000737:chemistry*; D005609:Free Radicals / Q000737:chemistry*; D008027:Light; D008872:Microwaves; D009570:Nitriles / Q000737:chemistry*; D012542:Scattering, Radiation; D013055:Spectrophotometry, Infrared; D013059:Spectrum Analysis, Raman
chemical_list: D001965:Bromides; D003486:Cyanides; D005609:Free Radicals; D009570:Nitriles; C011206:cyanogen; D001128:Argon