title: Chemically isolated graphene nanoribbons reversibly formed in fluorographene using polymer nanowire masks.
abstract: We demonstrated the fabrication of graphene nanoribbons (GNRs) as narrow as 35 nm created using scanning probe lithography to deposit a polymer mask(1-3) and then fluorinating the sample to isolate the masked graphene from the surrounding wide band gap fluorographene. The polymer protected the GNR from atmospheric adsorbates while the adjacent fluorographene stably p-doped the GNRs which had electron mobilities of ∼2700 cm2/(V·s). Chemical isolation of the GNR enabled resetting the device to nearly pristine graphene.
authors: U.S. Naval Research Laboratory, Washington, DC 20375, United States.
authors: Woo-Kyung
authors: WK
authors: Lee
authors: Jeremy T
authors: JT
authors: Robinson
authors: Daniel
authors: D
authors: Gunlycke
authors: Rory R
authors: RR
authors: Stine
authors: Cy R
authors: CR
authors: Tamanaha
authors: William P
authors: WP
authors: King
authors: Paul E
authors: PE
authors: Sheehan