title: Modulation of the absorption coefficient at 1.3 μm in Ge/SiGe multiple quantum well heterostructures on silicon.
abstract: We report modulation of the absorption coefficient at 1.3 μm in Ge/SiGe multiple quantum well heterostructures on silicon via the quantum-confined Stark effect. Strain engineering was exploited to increase the direct optical bandgap in the Ge quantum wells. We grew 9 nm-thick Ge quantum wells on a relaxed Si0.22Ge0.78 buffer and a contrast in the absorption coefficient of a factor of greater than 3.2 was achieved in the spectral range 1290-1315 nm.
authors: Institute of Microwaves and Photonics, School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom. l.j.m.lever@leeds.ac.uk
authors: L
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authors: Lever
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authors: Hu
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authors: Myronov
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authors: Liu
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authors: Owens
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authors: Gardes
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authors: Marko
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authors: Sweeney
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authors: Ikonić
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authors: Leadley
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authors: Reed
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authors: Kelsall