title: Multiple double cross-section transmission electron microscope sample preparation of specific sub-10 nm diameter Si nanowire devices.
abstract: The ability to prepare multiple cross-section transmission electron microscope (XTEM) samples from one XTEM sample of specific sub-10 nm features was demonstrated. Sub-10 nm diameter Si nanowire (NW) devices were initially cross-sectioned using a dual-beam focused ion beam system in a direction running parallel to the device channel. From this XTEM sample, both low- and high-resolution transmission electron microscope (TEM) images were obtained from six separate, specific site Si NW devices. The XTEM sample was then re-sectioned in four separate locations in a direction perpendicular to the device channel: 90° from the original XTEM sample direction. Three of the four XTEM samples were successfully sectioned in the gate region of the device. From these three samples, low- and high-resolution TEM images of the Si NW were taken and measurements of the NW diameters were obtained. This technique demonstrated the ability to obtain high-resolution TEM images in directions 90° from one another of multiple, specific sub-10 nm features that were spaced 1.1 μm apart.
authors.affiliation: IBM Thomas J. Watson Research Center, 1101 Kitchawan Road, Yorktown Heights, NY 10598, USA. gignac@us.ibm.com
authors.forename: Lynne M
authors.initials: LM
authors.lastname: Gignac
authors.forename: Surbhi
authors.initials: S
authors.lastname: Mittal
authors.forename: Sarunya
authors.initials: S
authors.lastname: Bangsaruntip
authors.forename: Guy M
authors.initials: GM
authors.lastname: Cohen
authors.forename: Jeffrey W
authors.initials: JW
authors.lastname: Sleight
mesh_terms: D004583:Electrons; D007477:Ions; D008846:Micromanipulation / Q000379:methods*; D046529:Microscopy, Electron, Transmission / Q000295:instrumentation; D036103:Nanotechnology / Q000379:methods*; D053770:Nanowires / Q000032:analysis* / Q000648:ultrastructure; D012666:Semiconductors; D012825:Silicon / Q000032:analysis*; D013048:Specimen Handling / Q000379:methods*
chemical_list: D007477:Ions; D012825:Silicon