title: Atomic vapor deposition approach to In2O3 thin films.
abstract: In2O3 thin films were grown by atomic vapor deposition (AVD) on Si(100) and glass substrates from a tris-guanidinate complex of indium [In(N(i)Pr2guanid)3] under an oxygen atmosphere. The effects of the growth temperature on the structure, morphology and composition of In2O3 films were investigated. X-ray diffraction (XRD) measurements revealed that In2O3 films deposited in the temperature range 450-700 degreesC crystallised in the cubic phase. The film morphology, studied by scanning electron microscopy (SEM) and atomic force microscopy (AFM), was strongly dependent on the substrate temperature. Stoichiometric In2O3 films were formed under optimised processing conditions as was confirmed by X-ray photoelectron and X-ray excited Auger electron spectroscopies (XPS, XE-AES), as well as by Rutherford backscattering spectrometry (RBS). Finally, optical properties were investigated by photoluminescence (PL) measurements, spectroscopic ellipsometry (SE) and optical absorption. In2O3 films grown on glass exhibited excellent transparency (approximately 90%) in the Visible (Vis) spectral region.
authors.affiliation: Inorganic Materials Chemistry, Ruhr-University Bochum, 44801 Bochum, Germany.
authors.forename: Malte
authors.initials: M
authors.lastname: Hellwig
authors.forename: Harish
authors.initials: H
authors.lastname: Parala
authors.forename: Joanna
authors.initials: J
authors.lastname: Cybinksa
authors.forename: Davide
authors.initials: D
authors.lastname: Barreca
authors.forename: Alberto
authors.initials: A
authors.lastname: Gasparotto
authors.forename: Benedikt
authors.initials: B
authors.lastname: Niermann
authors.forename: Hans-Werner
authors.initials: HW
authors.lastname: Becker
authors.forename: Detlef
authors.initials: D
authors.lastname: Rogalla
authors.forename: Jürgen
authors.initials: J
authors.lastname: Feydt
authors.forename: Stephan
authors.initials: S
authors.lastname: Irsen
authors.forename: Anja-Verena
authors.initials: AV
authors.lastname: Mudring
authors.forename: Jörg
authors.initials: J
authors.lastname: Winter
authors.forename: Roland A
authors.initials: RA
authors.lastname: Fischer
authors.forename: Anjana
authors.initials: A
authors.lastname: Devi