title: Influence of varying porogen loads and different UV cures on low-kappa film characteristics.
abstract: Nanoporous low-kappa films were manufactured by using a 3-step process: co-deposition of a skeleton and porogens by PECVD, porogen removal by remote plasma and UV cure. In this study, the influence of both the variation of the porogen load and the different types of UV-cures on several film characteristics were investigated. Improved kappa-values were observed for increased porogen to skeleton ratios and a broad band cure, where the wavelength of the photons is always higher than 200 nm. However the Young's modulus and hardness decreased correspondingly. These variations can be attributed to the changing density and chemical composition of the different films. A wide range of low-kappa films was obtained by tuning the porogen load and applying different types of UV cures.
authors.affiliation: imec, Kapeldreef 75 3001 Leuven, Belgium.
authors.forename: Leo
authors.initials: L
authors.lastname: Farrell
authors.forename: Patrick
authors.initials: P
authors.lastname: Verdonck
authors.forename: Els
authors.initials: E
authors.lastname: Van Besien
authors.forename: Ivan
authors.initials: I
authors.lastname: Ciofi
authors.forename: Gianpaolo
authors.initials: G
authors.lastname: Borrello
authors.forename: Kris
authors.initials: K
authors.lastname: Vanstreels
authors.forename: Shabnam
authors.initials: S
authors.lastname: Mardani
authors.forename: Mikhail R
authors.initials: MR
authors.lastname: Baklanov