title: Polymeric photoresist nanoparticles: light-induced degradation of hydrophobic polymers in aqueous dispersion.
abstract: Nanoparticles consisting of a photoreactive polymer able to radically switch its hydrophobicity are successfully prepared by miniemulsion polymerization. Irradiation with UV light causes degradation of the particles where at complete dissolution is achieved by changing the initial hydrophobic photoresist polymer into hydrophilic poly(methacrylic acid). Incorporation of the fluorescence-sensitive Nile red serves as a solvatochromic probe to study the particle degradation. Diffusion of either Nile red out from or water into the former hard spherical nanoparticles is studied and not only renders the described material an ideal system for applications, where in situ dissolution of nanoparticles may be needed, but also bears the additional advantage of performing controlled burst release.
authors.affiliation: Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz, Germany.
authors.forename: Daniel
authors.initials: D
authors.lastname: Klinger
authors.forename: Katharina
authors.initials: K
authors.lastname: Landfester
mesh_terms: D057927:Hydrophobic and Hydrophilic Interactions / Q000528:radiation effects; D053758:Nanoparticles / Q000737:chemistry* / Q000648:ultrastructure; D010777:Photochemistry / Q000379:methods; D011109:Polymethacrylic Acids / Q000737:chemistry*; D014466:Ultraviolet Rays
chemical_list: D011109:Polymethacrylic Acids; C030613:polymethacrylic acid