title: Fabrication of phase masks with variable diffraction efficiency using HEBS glass technology.
abstract: A new fabrication method of apodized diffractive optical elements is proposed. It relies on using high energy beam sensitive glass as a halftone mask for variable diffraction efficiency phase masks generation in a resist layer. The presented technology is especially effective in mass production. Although fabrication of an amplitude mask is required, it is then repeatedly used in a single shot projection photolithography, which is much simpler and less laborious than the direct variable-dose pattern writing. Three prototypes of apodized phase masks were manufactured and characterized. The main advantages as well as limitations of the proposed technology are discussed.
authors.affiliation: National Institute of Telecommunications, Szachowa 1, 04-894 Warsaw, Poland. T.Osuch@itl.waw.pl
authors.forename: Tomasz
authors.initials: T
authors.lastname: Osuch
authors.forename: Andrzej
authors.initials: A
authors.lastname: Kowalik
authors.forename: Zbigniew
authors.initials: Z
authors.lastname: Jaroszewicz
authors.forename: Marcin
authors.initials: M
authors.lastname: Sarzyński