title: Surface modification of carbon post arrays by atomic layer deposition of ZnO film.
abstract: The applicability of atomic layer deposition (ALD) process to the carbon microelectromechanical system technology was studied for a surface modification method of the carbon post electrodes. A conformal coating of the ALD-ZnO film was successfully demonstrated on the carbon post arrays which were fabricated by the traditional photolithography and subsequent two-step pyrolysis. A significant Zn diffusion into the underlying carbon posts was observed during the ALD process. The addition of a sputter-deposited ZnO interfacial layer efficiently blocked the Zn diffusion without altering the microstructure and surface morphology of the ALD-ZnO film.
authors: School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746, Korea.
authors: Hyun Ae
authors: HA
authors: Lee
authors: Young-Chul
authors: YC
authors: Byun
authors: Umesh
authors: U
authors: Singh
authors: Hyoung J
authors: HJ
authors: Cho
authors: Hyoungsub
authors: H
authors: Kim