title: Patterning of polymer nanocomposite resists containing metal nanoparticles by electron beam lithography.
abstract: Poly(vinyl pyrrolidone) (PVP)-stabilized silver nanoparticles (NPs) were used as a new nanocomposite resist for electron beam lithography. A nanocomposite resist prepared by reducing silver nitrate in an alcoholic PVP solution was patterned by using a scanning electron microscope equipped with a nanometer pattern generation system. Well-defined negative tone patterns with a good sensitivity of 200 microC/cm2 and a contrast of 2.83 were obtained using the prepared nanocomposite resist. In addition, the changes in the morphology and structure of the resist patterns with a thermal treatment temperature were investigated by a FE-SEM with an EDX. The results revealed that the patterns of Ag NPs were formed through sintering the formed resist patterns at above 300 degrees C.
authors: Department of Polymer Science and Engineering, Chungnam National University, Yuseong-gu, Daejeon 305-701, Republic of Korea.
authors: Byoung-Min
authors: BM
authors: Lee
authors: Dong-Woo
authors: DW
authors: Kang
authors: Chan-Hee
authors: CH
authors: Jung
authors: Jae-Hak
authors: JH
authors: Choi
authors: In-Tae
authors: IT
authors: Hwang
authors: Sung-Kwon
authors: SK
authors: Hong
authors: Jae-Suk
authors: JS
authors: Lee