title: Ridge formation and removal via annealing in exfoliated graphene.
abstract: It is well known that graphene is a very promising material due to its excellent physical, chemical, and thermal properties. Previously, ridges in graphene on a substrate were found in epitaxial graphene on a SiC substrate. It was found in this study that ridges can be made on a graphene layer via mechanical exfoliation on a sapphire substrate, and that ridges can be created or removed through heating and cooling. Due to the difference of the thermal-expansion coefficients of the substrate and graphene, it can be said that thermal cycling causes compressive strain, which is released by forming ridges. Annealing was carried out in a vacuum chamber within the pressure range of 10(-3)-10(-6) Torr and at 900-1100 degrees C. To analyze the shapes and mechanical properties of the ridges, Raman spectroscopy and AFM measurement were performed. It was found that the ridges can be extended by defect as a nucleation center, and the graphene layer can be folded along the preexisting ridge during heating and cooling.
authors: Faculty of Nanotechnology and Advanced Material Engineering and Graphene Research Institute, Sejong University, Seoul 143-747, South Korea.
authors: Sang A
authors: SA
authors: Han
authors: In Sung
authors: IS
authors: Choi
authors: Hyo Sub
authors: HS
authors: An
authors: Hyunsoo
authors: H
authors: Lee
authors: Hyeon Deuk
authors: HD
authors: Yong
authors: Sangwook
authors: S
authors: Lee
authors: Jongwan
authors: J
authors: Jung
authors: Nae Sung
authors: NS
authors: Lee
authors: Yongho
authors: Y
authors: Seo