title: Single digit nanofabrication by step-and-repeat nanoimprint lithography.
abstract: A novel strategy for fabricating nanoimprint templates with sub-10 nm patterns is demonstrated by combining electron beam lithography and atomic layer deposition. Nanostructures are replicated by step-and-repeat nanoimprint lithography and successfully transferred into functional material with high fidelity. The process extends the capacity of step-and-repeat nanoimprint lithography as a single digit nanofabrication method. Using the ALD process for feature shrinkage, we identify a size dependent deposition rate.
authors.affiliation: aBeam Technologies, 5286 Dunnigan Court, Castro Valley, CA 94546, USA. cp@abeamtech.com
authors.forename: C
authors.initials: C
authors.lastname: Peroz
authors.forename: S
authors.initials: S
authors.lastname: Dhuey
authors.forename: M
authors.initials: M
authors.lastname: Cornet
authors.forename: M
authors.initials: M
authors.lastname: Vogler
authors.forename: D
authors.initials: D
authors.lastname: Olynick
authors.forename: S
authors.initials: S
authors.lastname: Cabrini