title: Analysis of the release characteristics of cu-treated antimicrobial implant surfaces using atomic absorption spectrometry.
abstract: New developments of antimicrobial implant surfaces doped with copper (Cu) ions may minimize the risk of implant-associated infections. However, experimental evaluation of the Cu release is influenced by various test parameters. The aim of our study was to evaluate the Cu release characteristics in vitro according to the storage fluid and surface roughness. Plasma immersion ion implantation of Cu (Cu-PIII) and pulsed magnetron sputtering process of a titanium copper film (Ti-Cu) were applied to titanium alloy (Ti6Al4V) samples with different surface finishing of the implant material (polished, hydroxyapatite and corundum blasted). The samples were submersed into either double-distilled water, human serum, or cell culture medium. Subsequently, the Cu concentration in the supernatant was measured using atomic absorption spectrometry. The test fluid as well as the surface roughness can alter the Cu release significantly, whereby the highest Cu release was determined for samples with corundum-blasted surfaces stored in cell medium.
authors.affiliation: Biomechanics and Implant Technology Research Laboratory, Department of Orhtopeadics, University of Rostock, Doberaner Stra β e 142, 18057 Rostock, Germany.
authors.forename: Carmen
authors.initials: C
authors.lastname: Zietz
authors.forename: Andreas
authors.initials: A
authors.lastname: Fritsche
authors.forename: Birgit
authors.initials: B
authors.lastname: Finke
authors.forename: Vitezslav
authors.initials: V
authors.lastname: Stranak
authors.forename: Maximilian
authors.initials: M
authors.lastname: Haenle
authors.forename: Rainer
authors.initials: R
authors.lastname: Hippler
authors.forename: Wolfram
authors.initials: W
authors.lastname: Mittelmeier
authors.forename: Rainer
authors.initials: R
authors.lastname: Bader