title: Chemical etching of zinc oxide for thin-film silicon solar cells.
abstract: Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided.
authors.affiliation: IEK5-Photovoltaik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany. j.huepkes@fz-juelich.de
authors.forename: Jürgen
authors.initials: J
authors.lastname: Hüpkes
authors.forename: Jorj I
authors.initials: JI
authors.lastname: Owen
authors.forename: Sascha E
authors.initials: SE
authors.lastname: Pust
authors.forename: Eerke
authors.initials: E
authors.lastname: Bunte