title: DNA strand patterns on aluminium thin films.
abstract: A new patterning method using Deoxyribose Nucleic Acid (DNA) strands capable of producing nanogaps of less than 100 nm is proposed and investigated in this work. DNA strands from Bosenbergia rotunda were used as the fundamental element in patterning DNA on thin films of aluminium (Al) metal without the need for any lithographic techniques. The DNA strands were applied in buffer solutions onto thin films of Al on silicon (Si) and the chemical interactions between the DNA strands and Al creates nanometer scale arbitrary patterning by direct transfer of the DNA strands onto the substrate. This simple and cost-effective method can be utilized in the fabrication of various components in electronic chips for microelectronics and Nano Electronic Mechanical System (NEMS) applications in general.
authors.affiliation: Low Dimensional Material Research Centre, Department of Physics, University of Malaya, 50603, Kuala Lumpur, Malaysia. mahmoudy_phy@yahoo.com
authors.forename: Nadia Mahmoudi
authors.initials: NM
authors.lastname: Khatir
authors.forename: Seyedeh Maryam
authors.initials: SM
authors.lastname: Banihashemian
authors.forename: Vengadesh
authors.initials: V
authors.lastname: Periasamy
authors.forename: Wan Haliza Abd
authors.initials: WH
authors.lastname: Majid
authors.forename: Saadah Abdul
authors.initials: SA
authors.lastname: Rahman
authors.forename: Fatemeh
authors.initials: F
authors.lastname: Shahhosseini
mesh_terms: D000535:Aluminum / Q000737:chemistry*; D018744:DNA, Plant / Q000737:chemistry*; D036103:Nanotechnology / Q000379:methods*; D030521:Zingiberaceae
chemical_list: D018744:DNA, Plant; D000535:Aluminum