title: Chiral nematic fluids as masks for lithography.
abstract: A lithographic scheme is reported that uses a cholesteric liquid crystal with its helical axis in the plane of the sample as a "mask" for imprinting patterns in a photoresist over a large area. On the application of an electric field the cholesteric liquid crystals produce a texture that acts as a lattice of cylindrical lenses for one polarization of a light beam. This is used in photolithography to create parallel lines over large areas.
authors.affiliation: Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Korea.
authors.forename: Hyeon Su
authors.initials: HS
authors.lastname: Jeong
authors.forename: Yun Ho
authors.initials: YH
authors.lastname: Kim
authors.forename: Ji Sun
authors.initials: JS
authors.lastname: Lee
authors.forename: Jung Hyun
authors.initials: JH
authors.lastname: Kim
authors.forename: Mohan
authors.initials: M
authors.lastname: Srinivasarao
authors.forename: Hee-Tae
authors.initials: HT
authors.lastname: Jung
mesh_terms: D050866:Liquid Crystals / Q000737:chemistry*; D055620:Optical Phenomena; D011327:Printing; D013237:Stereoisomerism