title: Thermal behavior of MOCVD-grown Cu-clusters on ZnO(1010).
abstract: Scanning tunnelling microscopy (STM) and X-ray photoelectron spectroscopy (XPS, AES) were used to study MOCVD of Cu-clusters on the mixed terminated ZnO(1010) surface in comparison to MBE Cu-deposition. Both deposition methods result in the same Cu cluster morphology. After annealing to 670 K the amount of Cu visible above the oxide surface is found to decrease substantially, indicating a substantial diffusion of Cu atoms inside the ZnO-bulk. The spectroscopic data do not show any evidence for changes in the Cu oxidation state during thermal treatment up to 770 K.
authors.affiliation: Institut für Experimentalphysik IV/AG Oberflächenphysik, Ruhr-Universität Bochum, 44780 Bochum, Germany. martin.kroll@rub.de
authors.forename: Martin
authors.initials: M
authors.lastname: Kroll
authors.forename: Thomas
authors.initials: T
authors.lastname: Löber
authors.forename: Vadim
authors.initials: V
authors.lastname: Schott
authors.forename: Christof
authors.initials: C
authors.lastname: Wöll
authors.forename: Ulrich
authors.initials: U
authors.lastname: Köhler