title: Maskless multiple-beam laser lithography for large-area nanostructure/microstructure fabrication.
abstract: This paper reports a maskless multiple-beam laser lithography technique for large-area nanostructure/microstructure fabrication. This lithography technique can flexibly generate arbitrary nanostructures/microstructures over a large area at a high speed. The feature size of the nanostructures/microstructures can be controlled by exposure time and moving speed of the nanostage. Functional predesigned patterns, including split-ring resonator metamaterials for terahertz waves, can be obtained. More complicated structures can be made by single- and double-exposure schemes to make hybrid nanostructures/microstructures and tune surface plasmonic resonance properties. Meanwhile, microstructures with large height to lateral dimension ratios (2.5D microstructures) fabricated on silicon substrates can be used as mold tools for soft lithography. This technology shows its unique capacity to create various nanostructures/microstructures for extensive applications.
authors.affiliation: Department of Electrical and Computer Engineering, National University of Singapore, 117576 Singapore.
authors.forename: Min
authors.initials: M
authors.lastname: Tang
authors.forename: Zai Chun
authors.initials: ZC
authors.lastname: Chen
authors.forename: Zhi Qiang
authors.initials: ZQ
authors.lastname: Huang
authors.forename: Yoo Sang
authors.initials: YS
authors.lastname: Choo
authors.forename: Ming Hui
authors.initials: MH
authors.lastname: Hong
mesh_terms: D006046:Gold / Q000737:chemistry; D007834:Lasers; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000295:instrumentation / Q000379:methods*; D011327:Printing; D012825:Silicon / Q000737:chemistry; D020349:Surface Plasmon Resonance; D013499:Surface Properties
chemical_list: D006046:Gold; D012825:Silicon