title: Covalent layer-by-layer assembly of redox active molecular multilayers on silicon (100) by photochemical thiol-ene chemistry.
abstract: The fabrication of thin organic films covalently grafted onto silicon substrates is of significant interest, as they are expected to give access to a broad range of new materials for integration into microelectronic applications. Covalent layer-by-layer (LbL) assembly offers a high degree of freedom when designing such thin films. In this work an approach for the preparation of covalent redox active molecular multilayers on silicon (100) surfaces is presented using a highly branched decaallylferrocene and thiol-ene click chemistry. The multilayers are analyzed by ellipsometry, X-ray photoelectron sprectroscopy, and cyclic voltammetry. The results indicate that the multilayer growth is linear for at least sixteen layers and the density of ferrocenes per layer is in the range of 6 × 10⁻¹¹ mol cm⁻². Moreover, this method for LbL assembly is extended to surfaces which have been locally passivated by microcontact printing. By atomic force microscopy measurements it is possible to show that the covalent LbL deposition proceeds exclusively in the nonpassivated areas.
authors.affiliation: Organic Chemistry Institute and Center for Nanotechnology (CeNTech), Westfälische Wilhelms-Universität Münster, Corrensstrasse 40, 48149 Münster, Germany.
authors.forename: Christian
authors.initials: C
authors.lastname: Schulz
authors.forename: Susann
authors.initials: S
authors.lastname: Nowak
authors.forename: Roland
authors.initials: R
authors.lastname: Fröhlich
authors.forename: Bart Jan
authors.initials: BJ
authors.lastname: Ravoo