title: Hole-mask colloidal nanolithography for large-area low-cost metamaterials and antenna-assisted surface-enhanced infrared absorption substrates.
abstract: We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials and measure their infrared optical properties. This novel substrate is employed for antenna-assisted surface-enhanced infrared absorption measurements using octadecanethiol (ODT) and deuterated ODT, which demonstrates easy adjustability of our material to vibrational modes. Our method has the potential to make resonant plasmon-enhanced infrared spectroscopy a standard lab tool in biology, pharmacology, and medicine.
authors.affiliation: Physics Institute and Research Center SCoPE, Pfaffenwaldring 57, University of Stuttgart, 70569 Stuttgart, Germany.
authors.forename: Stefano
authors.initials: S
authors.lastname: Cataldo
authors.forename: Jun
authors.initials: J
authors.lastname: Zhao
authors.forename: Frank
authors.initials: F
authors.lastname: Neubrech
authors.forename: Bettina
authors.initials: B
authors.lastname: Frank
authors.forename: Chunjie
authors.initials: C
authors.lastname: Zhang
authors.forename: Paul V
authors.initials: PV
authors.lastname: Braun
authors.forename: Harald
authors.initials: H
authors.lastname: Giessen
mesh_terms: D000042:Absorption; D003102:Colloids; D007259:Infrared Rays; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D010781:Photography / Q000379:methods*; D016062:Porosity; D012031:Refractometry; D020349:Surface Plasmon Resonance / Q000379:methods*
chemical_list: D003102:Colloids