Fabrication of hierarchical structures by unconventional two-step imprinting.
We present a simple sequential imprinting lithography method to fabricate micro/nanoscale hierarchical structures. This method involves hot embossing and capillary force lithography with two stamps of different microscales, which avoids using nanoscale stamps. By varying the experimental conditions in the capillary force lithography process, the morphology of the resulting structures can be controlled. This method may provide a facile and low-cost route for fabricating large area patterns of hierarchical structures.
State Key Laboratory of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, PR China.
Gang
G
Shi
Nan
N
Lu
Hongbo
H
Xu
Yandong
Y
Wang
Shoulei
S
Shi
Hui
H
Li
Ying
Y
Li
Lifeng
L
Chi
D056656:Lab-On-A-Chip Devices; D018625:Microscopy, Atomic Force; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology; D012822:Silicon Dioxide / Q000737:chemistry*
D012822:Silicon Dioxide