Mechanisms of pH-dependent activity for water oxidation to molecular oxygen by MnO2 electrocatalysts.
Manganese oxides function as efficient electrocatalysts for water oxidation to molecular oxygen in strongly alkaline conditions, but are inefficient at neutral pH. To provide new insight into the mechanism underlying the pH-dependent activity of the electrooxidation reaction, we performed UV-vis spectroelectrochemical detection of the intermediate species for water oxidation by a manganese oxide electrode. Layered manganese oxide nanoparticles, δ-MnO(2) (K(0.17)[Mn(4+)(0.90)Mn(3+)(0.07)□(0.03)]O(2)·0.53H(2)O) deposited on fluorine-doped tin oxide electrodes were shown to catalyze water oxidation at pH from 4 to 13. At this pH range, a sharp rise in absorption at 510 nm was observed with a concomitant increase of anodic current for O(2) evolution. Using pyrophosphate as a probe molecule, the 510 nm absorption was attributable to Mn(3+) on the surface of δ-MnO(2). The onset potential of the water oxidation current was constant at approximately 1.5 V vs SHE from pH 4 to pH 8, but sharply shifted to negative at pH > 8. Strikingly, this behavior was well reproduced by the pH dependence of the onset of 510 nm absorption, indicating that Mn(3+) acts as the precursor of water oxidation. Mn(3+) is unstable at pH < 9 due to the disproportionation reaction resulting in the formation of Mn(2+) and Mn(4+), whereas it is effectively stabilized by the comproportionation of Mn(2+) and Mn(4+) in alkaline conditions. Thus, the low activity of manganese oxides for water oxidation under neutral conditions is most likely due to the inherent instability of Mn(3+), whose accumulation at the surface of catalysts requires the electrochemical oxidation of Mn(2+) at a potential of approximately 1.4 V. This new model suggests that the control of the disproportionation and comproportionation efficiencies of Mn(3+) is essential for the development of Mn catalysts that afford water oxidation with a small overpotential at neutral pH.
Department of Applied Chemistry, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Tokyo 113-8656, Japan.
Toshihiro
T
Takashima
Kazuhito
K
Hashimoto
Ryuhei
R
Nakamura