title: Water-developable poly(2-oxazoline)-based negative photoresists.
abstract: Copoly(2-oxazoline)-based photoresists are prepared from pEtOx(80) Bu(=) Ox(20)  and pPhOx(80) Dc(=) Ox(20) , respectively, a tetrathiol, and a photosensitive initiator. It is possible to prepare copoly(2-oxazoline)s bearing unsaturated side chains in a microwave reactor on a decagram scale in reaction times of 100 min or shorter. UV irradiation of dried polymer films through a quartz mask induces the thiol-ene reaction in the illuminated areas. Subsequent development of the polymer films in halogen-free solvents reproduces the negative pattern of the mask with a resolution of 2 μm. The pEtOx(80) Bu(=) Ox(20) -derived photoresists can also be developed in water.
authors.affiliation: Polymer Competence Center Leoben GmbH PCCL, Leoben, Austria.
authors.forename: Verena
authors.initials: V
authors.lastname: Schenk
authors.forename: Lisa
authors.initials: L
authors.lastname: Ellmaier
authors.forename: Elisabeth
authors.initials: E
authors.lastname: Rossegger
authors.forename: Matthias
authors.initials: M
authors.lastname: Edler
authors.forename: Thomas
authors.initials: T
authors.lastname: Griesser
authors.forename: Gerald
authors.initials: G
authors.lastname: Weidinger
authors.forename: Frank
authors.initials: F
authors.lastname: Wiesbrock
mesh_terms: D015394:Molecular Structure; D010080:Oxazoles / Q000737:chemistry*; D010777:Photochemistry; D011108:Polymers / Q000138:chemical synthesis* / Q000737:chemistry; D014466:Ultraviolet Rays
chemical_list: D010080:Oxazoles; D011108:Polymers; C064210:oxazolidine