title: Orienting the demixion of a diblock copolymer using 193 nm interferometric lithography for the controlled deposition of nanoparticles.
abstract: DUV interferometric lithography and diblock copolymer self-organization have successfully been combined to provide a simple and highly collective nanopatterning technique enabling the organization of nanoparticles over several orders of magnitude, from nanometre to millimetre. The nanostructural changes at the surface of the polymer film after thermal annealing have been monitored by AFM and the process parameters optimized for obtaining a long-range organization of the lamellar domains. In particular, the impact of the annealing conditions and geometric parameters of the substrate patterns have been investigated. The nanopatterns resulting from the lamellar demixion of (PS-b-MMA) were used for a controlled deposition of nanoparticles. The affinity of the hydrophobic particles for the PS block was demonstrated, opening new doors towards the preparation of high-density arrays of nanoparticles with potential applications in data storage.
authors.affiliation: Institut de Science des Matériaux de Mulhouse (IS2M), CNRS-LRC 7228, Université de Haute Alsace, 15 rue Jean Starcky, 68057 Mulhouse, France.
authors.forename: Ali
authors.initials: A
authors.lastname: Dirani
authors.forename: Fabrice
authors.initials: F
authors.lastname: Stehlin
authors.forename: Ihab
authors.initials: I
authors.lastname: Dika
authors.forename: Arnaud
authors.initials: A
authors.lastname: Spangenberg
authors.forename: Nathan
authors.initials: N
authors.lastname: Grumbach
authors.forename: Jean-Louis
authors.initials: JL
authors.lastname: Gallani
authors.forename: Bertrand
authors.initials: B
authors.lastname: Donnio
authors.forename: Romain
authors.initials: R
authors.lastname: Greget
authors.forename: Sylvie
authors.initials: S
authors.lastname: Begin-Colin
authors.forename: Arnaud
authors.initials: A
authors.lastname: Demortière
authors.forename: Olivier
authors.initials: O
authors.lastname: Soppera
mesh_terms: D057927:Hydrophobic and Hydrophilic Interactions; D007368:Interferometry / Q000295:instrumentation / Q000379:methods*; D053758:Nanoparticles / Q000737:chemistry*; D011108:Polymers / Q000138:chemical synthesis / Q000737:chemistry*
chemical_list: D011108:Polymers