title: A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers.
abstract: A new strategy to seal mesoporous low-k thin films with a pore size of 3 nm has been developed. This is achieved by spin-coating of a self-assembled carbon-bridged organosilica layer followed by a grafting with hexamethyl disilazane.
authors.affiliation: Department of Inorganic and Physical Chemistry, Ghent University, Krijgslaan 281, building S3, 9000 Ghent, Belgium.
authors.forename: Frederik
authors.initials: F
authors.lastname: Goethals
authors.forename: Mikhail R
authors.initials: MR
authors.lastname: Baklanov
authors.forename: Ivan
authors.initials: I
authors.lastname: Ciofi
authors.forename: Christophe
authors.initials: C
authors.lastname: Detavernier
authors.forename: Pascal
authors.initials: P
authors.lastname: Van der Voort
authors.forename: Isabel
authors.initials: I
authors.lastname: Van Driessche