title: An alternative route towards micro- and nano-patterning of oxide films.
abstract: This paper presents a method to obtain submicron- and nanometer structures of different oxide films and heterostructures combining e-beam lithography and chemical etching. The most relevant advantage of this method is that structures of tens of microns in length and below ∼100 nm width can be produced, keeping the intrinsic bulk film properties, as proven by electrical transport measurements. In this way our method provides a bridge that connects the attractive properties of oxide films and the nanoworld.
authors.affiliation: Division of Superconductivity and Magnetism, University of Leipzig, Leipzig, Germany. gbridoux@yahoo.com.ar
authors.forename: G
authors.initials: G
authors.lastname: Bridoux
authors.forename: J
authors.initials: J
authors.lastname: Barzola-Quiquia
authors.forename: F
authors.initials: F
authors.lastname: Bern
authors.forename: W
authors.initials: W
authors.lastname: Böhlmann
authors.forename: I
authors.initials: I
authors.lastname: Vrejoiu
authors.forename: M
authors.initials: M
authors.lastname: Ziese
authors.forename: P
authors.initials: P
authors.lastname: Esquinazi
mesh_terms: D003460:Crystallization / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008567:Membranes, Artificial; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010087:Oxides / Q000737:chemistry*; D010316:Particle Size; D013499:Surface Properties
chemical_list: D046911:Macromolecular Substances; D008567:Membranes, Artificial; D010087:Oxides