title: Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition.
abstract: Damage tests are carried out at 1064nm to measure the laser resistance of TiO(2)/Al(2)O(3) and HfO(2)/Al(2)O(3) antireflection coatings grown by atomic layer deposition (ALD). The damage results are determined by S-on-1 and R-on-1 tests. Interestingly, the damage performance of ALD coatings is similar to those grown by conventional e-beam evaporation process. A decline law of damage resistance under multiple irradiations is revealed. The influence of growth temperature on damage performance has been investigated. Result shows that the crystallization of TiO(2) layer at higher temperature could lead to numerous absorption defects that reduce the laser-induced damage threshold (LIDT). In addition, it has been found that using inorganic compound instead of organic compound as precursors for ALD process maybe effectively prevent carbon impurities in films and will increase the LIDT obviously.
authors.affiliation: Fine Optical Engineering Research Centre, Chengdu, China. zcliu44@163.com
authors.forename: Zhichao
authors.initials: Z
authors.lastname: Liu
authors.forename: Songlin
authors.initials: S
authors.lastname: Chen
authors.forename: Ping
authors.initials: P
authors.lastname: Ma
authors.forename: Yaowei
authors.initials: Y
authors.lastname: Wei
authors.forename: Yi
authors.initials: Y
authors.lastname: Zheng
authors.forename: Feng
authors.initials: F
authors.lastname: Pan
authors.forename: Hao
authors.initials: H
authors.lastname: Liu
authors.forename: Gengyu
authors.initials: G
authors.lastname: Tang
mesh_terms: D000537:Aluminum Oxide / Q000737:chemistry; D019544:Equipment Failure Analysis / Q000295:instrumentation* / Q000379:methods*; D006195:Hafnium / Q000737:chemistry; D007834:Lasers; D008962:Models, Theoretical; D055095:Optics and Photonics / Q000295:instrumentation* / Q000379:methods*; D010087:Oxides / Q000737:chemistry; D013499:Surface Properties; D014025:Titanium / Q000737:chemistry
chemical_list: D010087:Oxides; C009495:titanium dioxide; C545179:hafnium oxide; D014025:Titanium; D000537:Aluminum Oxide; D006195:Hafnium