title: Closed-form Maker fringe formulas for poled polymer thin films in multilayer structures.
abstract: We report new closed-form expressions for Maker fringes of anisotropic and absorbing poled polymer thin films in multilayer structures that include back reflections of both fundamental and second-harmonic waves. The expressions, based on boundary conditions at each interface, can be applied to multilayer structures containing a buffer and a transparent conducting oxide layer, which might enhance multiple reflections of fundamental and second-harmonic waves inside a nonlinear thin film layer. This formulation facilitates Maker fringe analysis for a sample containing additional multilayer structures on either side of a poled polymer thin film. Experimental data and numerical simulations are given to indicate the importance of inclusion of such a reflective layer in analyses for reliable characterization of second-harmonic tensor elements.
authors.affiliation: Laboratory for Physical Sciences, University of Maryland, College Park, 20740, USA. leomac@lps.umd.edu
authors.forename: Dong Hun
authors.initials: DH
authors.lastname: Park
authors.forename: Warren N
authors.initials: WN
authors.lastname: Herman
mesh_terms: D016880:Anisotropy; D003198:Computer Simulation; D008027:Light; D008567:Membranes, Artificial; D008956:Models, Chemical; D011108:Polymers / Q000737:chemistry*; D012031:Refractometry / Q000379:methods*; D012542:Scattering, Radiation
chemical_list: D008567:Membranes, Artificial; D011108:Polymers