title: Enriching libraries of high-aspect-ratio micro- or nanostructures by rapid, low-cost, benchtop nanofabrication.
abstract: We provide a protocol for transforming the structure of an array of high-aspect-ratio (HAR) micro/nanostructures into various new geometries. Polymeric HAR arrays are replicated from a Bosch-etched silicon master pattern by soft lithography. By using various conditions, the original pattern is coated with metal, which acts as an electrode for the electrodeposition of conductive polymers, transforming the original structure into a wide range of user-defined new designs. These include scaled replicas with sub-100-nm-level control of feature sizes and complex 3D shapes such as tapered or bent columnar structures bearing hierarchical features. Gradients of patterns and shapes on a single substrate can also be produced. This benchtop fabrication protocol allows the production of customized libraries of arrays of closed-cell or isolated HAR micro/nanostructures at a very low cost within 1 week, when starting from a silicon master that otherwise would be very expensive and slow to produce using conventional fabrication techniques.
authors.affiliation: School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts, USA. philseok.kim@wyss.harvard.edu
authors.forename: Philseok
authors.initials: P
authors.lastname: Kim
authors.forename: Wilmer E
authors.initials: WE
authors.lastname: Adorno-Martinez
authors.forename: Mughees
authors.initials: M
authors.lastname: Khan
authors.forename: Joanna
authors.initials: J
authors.lastname: Aizenberg
mesh_terms: D004595:Electroplating; D049329:Nanostructures / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D012825:Silicon / Q000737:chemistry
chemical_list: D012825:Silicon