title: An EUV beamsplitter based on conical grazing incidence diffraction.
abstract: We present an innovative grating design based on conical diffraction which acts as an almost perfect and low-loss beamsplitter for extreme ultraviolet radiation. The scheme is based on a binary profile operated in grazing incidence along the grating bars under total external reflection. It is shown that periods of a few 10(2) nm may permit an exclusive (±1)(st) order diffraction with efficiencies up to ~ 35% in each of them, whereas higher evanescent orders vanish. In contrast, destructive interference eliminates the 0(th) order. For a sample made of SiO(2) on silicon, measured data and simulated results from rigorous coupled wave analysis procedures are given.
authors.affiliation: Friedrich-Schiller-Universität Jena, Institut für Angewandte Physik, Jena, Germany. christoph.braig@uni-jena.de
authors.forename: C
authors.initials: C
authors.lastname: Braig
authors.forename: L
authors.initials: L
authors.lastname: Fritzsch
authors.forename: T
authors.initials: T
authors.lastname: Käsebier
authors.forename: E-B
authors.initials: EB
authors.lastname: Kley
authors.forename: C
authors.initials: C
authors.lastname: Laubis
authors.forename: Y
authors.initials: Y
authors.lastname: Liu
authors.forename: F
authors.initials: F
authors.lastname: Scholze
authors.forename: A
authors.initials: A
authors.lastname: Tünnermann
mesh_terms: D003198:Computer Simulation; D004867:Equipment Design; D007834:Lasers; D008962:Models, Theoretical; D055095:Optics and Photonics / Q000295:instrumentation* / Q000379:methods; D012825:Silicon / Q000737:chemistry*; D012822:Silicon Dioxide / Q000737:chemistry*
chemical_list: D012822:Silicon Dioxide; D012825:Silicon