title: Enhancement of height resolution in direct laser lithography.
abstract: To address the requirements of multi-level semiconductors, we propose a new technique for overcoming the height limitation of direct laser lithography. In the proposed system, an original source beam is fed into an interference generator that divides the input beam by 50: 50 into two output beams. After going through an imaging lens, these two beams make two focusing spots, which are slightly separated in the axial direction. In the overlapped region, these two spots generate a small interferogram that shortens the depth of focus. By using this phenomenon, we are able to overcome the height limitation of direct laser lithography. The governing equations are also derived in this manuscript by using the Gaussian beam model.
authors.affiliation: Centerfor Space Optics, Korea Research Institute of Standards and Science, Daejeon 305-340, South Korea. hrhee@kriss.re.kr
authors.forename: Hyug-Gyo
authors.initials: HG
authors.lastname: Rhee
authors.forename: Yun-Woo
authors.initials: YW
authors.lastname: Lee
mesh_terms: D003198:Computer Simulation; D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D007834:Lasers; D007909:Lenses; D008027:Light; D008962:Models, Theoretical; D055096:Optical Devices; D010781:Photography / Q000295:instrumentation*; D012542:Scattering, Radiation