title: Thermoluminescence at a heating rate threshold in stressed fused silica.
abstract: The emissive properties of proton implanted fused silica surfaces have been studied by laser beam annealing. When submitted to a high thermal step from a focused CO2 laser, an intense near infra-red transient incandescence (TI) peak rises from stressed silica. The TI presents the characteristics of a thermoluminescent (TL) emission that occurs above a thermal rate threshold. We show that TI rises at the stress relaxation.
authors.affiliation: CEA-DRT-LITEN/DTNM, CEA/GRE, Grenoble, France. philippe.bouchut@cea.fr
authors.forename: Philippe
authors.initials: P
authors.lastname: Bouchut
authors.forename: Frédéric
authors.initials: F
authors.lastname: Milesi
authors.forename: Céline
authors.initials: C
authors.lastname: Da Maren
mesh_terms: D004735:Energy Transfer; D006358:Hot Temperature; D007834:Lasers; D008163:Luminescent Measurements / Q000379:methods*; D008422:Materials Testing; D012822:Silicon Dioxide / Q000737:chemistry* / Q000528:radiation effects*; D013314:Stress, Mechanical; D013814:Thermal Conductivity
chemical_list: D012822:Silicon Dioxide