Ultrafast polymerization inhibition by stimulated emission depletion for three-dimensional nanolithography.
To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.
Karlsruhe Institute of Technology, Wolfgang-Gaede-Straße 1, Karlsruhe, Germany. joachim.fischer@kit.edu
Joachim
J
Fischer
Martin
M
Wegener
D007700:Kinetics; D036103:Nanotechnology / Q000379:methods*; D055620:Optical Phenomena; D058105:Polymerization; D011327:Printing / Q000379:methods*