Two-photon continuous flow lithography.
A new approach for microfluidics-based production of polymeric particles, namely two-photon continuous flow lithography, is reported. This technique takes advantage of two-photon lithography to create objects with sub-micrometer and 3D features, and overcomes the traditional process limitations of two-photon lithography by using multiple beam production under continuous flow. Polymeric fibers, helical and bow-tie particles with sub-diffraction resolution and surface roughness as low as 10 nm are demonstrated.
National Nanotechnology Laboratory of Istituto Nanoscienze-CNR, Università del Salento, via Arnesano, Lecce, Italy.
Simona C
SC
Laza
Marco
M
Polo
Antonio A R
AA
Neves
Roberto
R
Cingolani
Andrea
A
Camposeo
Dario
D
Pisignano
D007834:Lasers; D017785:Photons; D011108:Polymers / Q000737:chemistry; D011327:Printing / Q000379:methods*
D011108:Polymers