title: Precisely-controlled fabrication of single ZnO nanoemitter arrays and their possible application in low energy parallel electron beam exposure.
abstract: Precisely-controlled fabrication of single ZnO nanoemitter arrays and their possible application in low energy parallel electron beam exposure are reported. A well defined polymethyl methacrylate (PMMA) nanohole template was employed for local solution-phase growth of single ZnO nanoemitter arrays. Chlorine plasma etching for surface smoothing and pulsed-laser illumination in nitrogen for nitrogen doping were performed, which can significantly enhance the electron emission and improve the emitter-to-emitter uniformity in performance. Mechanisms responsible for the field emission enhancing effect are proposed. Low voltage (368 V) e-beam exposure was performed by using a ZnO nanoemitter array and a periodical hole pattern (0.72-1.26 μm in diameter) was produced on a thin (25 nm) PMMA. The work demonstrates the feasibility of utilizing single ZnO nano-field emitter arrays for low voltage parallel electron beam lithography.
authors.affiliation: State Key Laboratory of Optoelectronic Materials and Technologies, School of Physics and Engineering, Sun Yat-sen University, Guangzhou 510275, People's Republic of China.
authors.forename: H
authors.initials: H
authors.lastname: He
authors.forename: J C
authors.initials: JC
authors.lastname: She
authors.forename: Y F
authors.initials: YF
authors.lastname: Huang
authors.forename: S Z
authors.initials: SZ
authors.lastname: Deng
authors.forename: N S
authors.initials: NS
authors.lastname: Xu
mesh_terms: D003460:Crystallization / Q000379:methods*; D004583:Electrons; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D013499:Surface Properties; D015034:Zinc Oxide / Q000737:chemistry*
chemical_list: D046911:Macromolecular Substances; D015034:Zinc Oxide