title: Confining grains of textured Cu2O films to single-crystal nanowires and resultant change in resistive switching characteristics.
abstract: By confining columnar grains of textured oxide film using anodized aluminum oxide template, we could obtain a grain-boundary-free (GB-free) cuprous oxide (Cu(2)O) nanowire arrays with a narrow diameter distribution and a high density under the same electrochemical deposition condition. A two-terminal device fabricated using an individual GB-free nanowire and Au/Cr electrodes exhibits bipolar resistive switching contrary to the unipolar one of a textured film, and Schottky-like conduction. On the other hand, a nanowire device with Pt electrodes reveals non-switching behavior and Ohmic conduction. Thus, we can propose that the bipolar switching of a nanowire device with Au/Cr electrodes may result from the modulation of Schottky barrier at the interface by migration of oxygen vacancies while the unipolar one of a textured film may be defined as the bulky filamentary switching along the GBs in the GB-embedded texture films.
authors.affiliation: Division of Quantum Phases & Devices, Department of Physics, Konkuk University, Seoul 143-701, South Korea.
authors.forename: Xiao Long
authors.initials: XL
authors.lastname: Deng
authors.forename: Sahwan
authors.initials: S
authors.lastname: Hong
authors.forename: Inrok
authors.initials: I
authors.lastname: Hwang
authors.forename: Jin-Soo
authors.initials: JS
authors.lastname: Kim
authors.forename: Ji Hoon
authors.initials: JH
authors.lastname: Jeon
authors.forename: Yun Chang
authors.initials: YC
authors.lastname: Park
authors.forename: Jongjin
authors.initials: J
authors.lastname: Lee
authors.forename: Sung-Oong
authors.initials: SO
authors.lastname: Kang
authors.forename: Tomoji
authors.initials: T
authors.lastname: Kawai
authors.forename: Bae Ho
authors.initials: BH
authors.lastname: Park
mesh_terms: D003300:Copper / Q000737:chemistry*; D017097:Electric Impedance; D004867:Equipment Design; D019544:Equipment Failure Analysis; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008567:Membranes, Artificial; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D012666:Semiconductors; D013499:Surface Properties
chemical_list: D046911:Macromolecular Substances; D008567:Membranes, Artificial; D003300:Copper; C030973:cupric oxide