title: SiOx/SiNy multilayers for photovoltaic and photonic applications.
abstract: Microstructural, electrical, and optical properties of undoped and Nd3+-doped SiOx/SiNy multilayers fabricated by reactive radio frequency magnetron co-sputtering have been investigated with regard to thermal treatment. This letter demonstrates the advantages of using SiNy as the alternating sublayer instead of SiO2. A high density of silicon nanoclusters of the order 1019 nc/cm3 is achieved in the SiOx sublayers. Enhanced conductivity, emission, and absorption are attained at low thermal budget, which are promising for photovoltaic applications. Furthermore, the enhancement of Nd3+ emission in these multilayers in comparison with the SiOx/SiO2 counterparts offers promising future photonic applications.PACS: 88.40.fh (Advanced materials development), 81.15.cd (Deposition by sputtering), 78.67.bf (Nanocrystals, nanoparticles, and nanoclusters).
authors.affiliation: CIMAP UMR CNRS/CEA/ENSICAEN/UCBN, 6 Bd, Maréchal Juin, 14050 Caen Cedex 4, France. pratibha-nalini.sundar@ensicaen.fr.
authors.forename: Ramesh Pratibha
authors.initials: RP
authors.lastname: Nalini
authors.forename: Larysa
authors.initials: L
authors.lastname: Khomenkova
authors.forename: Olivier
authors.initials: O
authors.lastname: Debieu
authors.forename: Julien
authors.initials: J
authors.lastname: Cardin
authors.forename: Christian
authors.initials: C
authors.lastname: Dufour
authors.forename: Marzia
authors.initials: M
authors.lastname: Carrada
authors.forename: Fabrice
authors.initials: F
authors.lastname: Gourbilleau