title: Aligned sub-10-nm block copolymer patterns templated by post arrays.
abstract: Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the self-assembly needs to be templated to impose long-range order and to control pattern registration with other substrate features. We demonstrate here the fabrication of aligned sub-10-nm line width patterns with a controlled orientation by using lithographically formed post arrays as templates for a 16 kg/mol poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) diblock copolymer. The in-plane orientation of the block copolymer cylinders was controlled by varying the spacing and geometry of the posts, and the results were modeled using 3D self-consistent field theory. This work illustrates how arrays of narrow lines with specific in-plane orientation can be produced, and how the post height and diameter affect the self-assembly.
authors.affiliation: Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.
authors.forename: Jae-Byum
authors.initials: JB
authors.lastname: Chang
authors.forename: Jeong Gon
authors.initials: JG
authors.lastname: Son
authors.forename: Adam F
authors.initials: AF
authors.lastname: Hannon
authors.forename: Alfredo
authors.initials: A
authors.lastname: Alexander-Katz
authors.forename: Caroline A
authors.initials: CA
authors.lastname: Ross
authors.forename: Karl K
authors.initials: KK
authors.lastname: Berggren