title: Modular deposition chamber for in situ X-ray experiments during RF and DC magnetron sputtering.
abstract: A new sputtering system for in situ X-ray experiments during DC and RF magnetron sputtering is described. The outstanding features of the system are the modular design of the vacuum chamber, the adjustable deposition angle, the option for plasma diagnostics, and the UHV sample transfer in order to access complementary surface analysis methods. First in situ diffraction and reflectivity measurements during RF and DC deposition of vanadium carbide demonstrate the performance of the set-up.
authors.affiliation: ANKA, Institut für Synchrotronstrahlung, Karlsruher Institut für Technologie, Karlsruhe, Germany. baerbel.krause@kit.edu
authors.forename: Bärbel
authors.initials: B
authors.lastname: Krause
authors.forename: Susan
authors.initials: S
authors.lastname: Darma
authors.forename: Marthe
authors.initials: M
authors.lastname: Kaufholz
authors.forename: Hans Hellmuth
authors.initials: HH
authors.lastname: Gräfe
authors.forename: Sven
authors.initials: S
authors.lastname: Ulrich
authors.forename: Miguel
authors.initials: M
authors.lastname: Mantilla
authors.forename: Ralf
authors.initials: R
authors.lastname: Weigel
authors.forename: Steffen
authors.initials: S
authors.lastname: Rembold
authors.forename: Tilo
authors.initials: T
authors.lastname: Baumbach