title: Fabrication of quasiperiodic nanostructures with EUV interference lithography.
abstract: We demonstrate the fabrication and analysis of well-ordered high-resolution quasiperiodic nanostructures with feature sizes down to a few tens of nanometers using extreme ultraviolet interference lithography. A well-controlled mask manufacturing process for producing high quality transmission diffraction masks enables simple and fast fabrication of highly ordered 2D quasiperiodic structures using 5- and 8-beam interference setups.
authors.affiliation: Paul Scherrer Institute, 5232 Villigen PSI, Switzerland.
authors.forename: A
authors.initials: A
authors.lastname: Langner
authors.forename: B
authors.initials: B
authors.lastname: Päivänranta
authors.forename: B
authors.initials: B
authors.lastname: Terhalle
authors.forename: Y
authors.initials: Y
authors.lastname: Ekinci