title: Photopolymerization inhibition dynamics for sub-diffraction direct laser writing lithography.
abstract: Selective inhibition of the polymerization leads to sub-diffraction feature sizes in direct writing lithography-a principle based on the idea of stimulated emission depletion (STED) microscopy. However, the detailed understanding of the inhibition process is a key point to further enhance the resolution of the system. The authors present experiments focused on the time dynamics of the inhibition process, clarifying possible photophysical pathways.
authors.affiliation: Department of Nanophysics, Istituto Italiano di Tecnologia, Genova, Italy. Benjamin.harke@iit.it
authors.forename: Benjamin
authors.initials: B
authors.lastname: Harke
authors.forename: Paolo
authors.initials: P
authors.lastname: Bianchini
authors.forename: Fernando
authors.initials: F
authors.lastname: Brandi
authors.forename: Alberto
authors.initials: A
authors.lastname: Diaspro