title: Brightness enhancement of plasma ion source by utilizing anode spot for nano applications.
abstract: Anode spots are known as additional discharges on positively biased electrode immersed in plasmas. The anode spot plasma ion source (ASPIS) has been investigated as a high brightness ion source for nano applications such as focused ion beam (FIB) and nano medium energy ion scattering (nano-MEIS). The generation of anode spot is found to enhance brightness of ion beam since the anode spot increases plasma density near the extraction aperture. Brightness of the ASPIS has been estimated from measurement of emittance for total ion beam extracted through sub-mm aperture. The ASPIS is installed to the FIB system. Currents and diameters of the focused beams with∕without anode spot are measured and compared. As the anode spot is turned on, the enhancement of beam current is observed at fixed diameter of the focused ion beam. Consequently, the brightness of the focused ion beam is enhanced as well. For argon ion beam, the maximum normalized brightness of 12,300 A∕m(2) SrV is acquired. The ASPIS is applied to nano-MEIS as well. The ASPIS is found to increase the beam current density and the power efficiency of the ion source for nano-MEIS. From the present study, it is shown that the ASPIS can enhance the performance of devices for nano applications.
authors.affiliation: Department of Nuclear Engineering, Seoul National University, Seoul 151-742, South Korea.
authors.forename: Yeong-Shin
authors.initials: YS
authors.lastname: Park
authors.forename: Yuna
authors.initials: Y
authors.lastname: Lee
authors.forename: Yoon-Jae
authors.initials: YJ
authors.lastname: Kim
authors.forename: Man-Jin
authors.initials: MJ
authors.lastname: Park
authors.forename: Dae Won
authors.initials: DW
authors.lastname: Moon
authors.forename: Kyoung-Jae
authors.initials: KJ
authors.lastname: Chung
authors.forename: Y S
authors.initials: YS
authors.lastname: Hwang