title: Technical use of compact micro-onde devices.
abstract: Due to the very small size of a COMIC (Compact MIcrowave and Coaxial) device [P. Sortais, T. Lamy, J. Médard, J. Angot, L. Latrasse, and T. Thuillier, Rev. Sci. Instrum. 81, 02B31 (2010)] it is possible to install such plasma or ion source inside very different technical environments. New applications of such a device are presented, mainly for industrial applications. We have now designed ion sources for highly focused ion beam devices, ion beam machining ion guns, or thin film deposition machines. We will mainly present new capabilities opened by the use of a multi-beam system for thin film deposition based on sputtering by medium energy ion beams. With the new concept of multi-beam sputtering (MBS), it is possible to open new possibilities concerning the ion beam sputtering (IBS) technology, especially for large size deposition of high uniformity thin films. By the use of multi-spots of evaporation, each one corresponding to an independent tuning of an individual COMIC ion source, it will be very easy to co-evaporate different components.
authors.affiliation: Laboratoire de Physique Subatomique et de Cosmologie de Grenoble-UJF-CNRS∕IN2P3-INPG, 53, rue des Martyrs, 38026 Grenoble Cedex, France. sortais@lpsc.in2p3.fr
authors.forename: P
authors.initials: P
authors.lastname: Sortais
authors.forename: T
authors.initials: T
authors.lastname: Lamy
authors.forename: J
authors.initials: J
authors.lastname: Médard
authors.forename: J
authors.initials: J
authors.lastname: Angot
authors.forename: P
authors.initials: P
authors.lastname: Sudraud
authors.forename: O
authors.initials: O
authors.lastname: Salord
authors.forename: S
authors.initials: S
authors.lastname: Homri