title: Upgraded vacuum arc ion source for metal ion implantation.
abstract: Vacuum arc ion sources have been made and used by a large number of research groups around the world over the past twenty years. The first generation of vacuum arc ion sources (dubbed "Mevva," for metal vapor vacuum arc) was developed at Lawrence Berkeley National Laboratory in the 1980s. This paper considers the design, performance parameters, and some applications of a new modified version of this kind of source which we have called Mevva-V.Ru. The source produces broad beams of metal ions at an extraction voltage of up to 60 kV and a time-averaged ion beam current in the milliampere range. Here, we describe the Mevva-V.Ru vacuum arc ion source that we have developed at Tomsk and summarize its beam characteristics along with some of the applications to which we have put it. We also describe the source performance using compound cathodes.
authors.affiliation: High Current Electronics Institute, Siberian Division of the Russian Academy of Science, Tomsk 634055, Russia. nik@opee.hcei.tsc.ru
authors.forename: A G
authors.initials: AG
authors.lastname: Nikolaev
authors.forename: E M
authors.initials: EM
authors.lastname: Oks
authors.forename: K P
authors.initials: KP
authors.lastname: Savkin
authors.forename: G Yu
authors.initials: GY
authors.lastname: Yushkov
authors.forename: I G
authors.initials: IG
authors.lastname: Brown