title: Optimum collimator for proximity X-ray lithography - Theoretical analysis.
abstract: The paper deals with the application of soft X-ray optics to the enhancement of the efficiency of X-ray proximity lithography based on a point X-ray source. The grazing incidence X-ray collimators are shown to increase the efficiency coefficient in several hundreds times. The design of the optimum X-ray collimator is proposed and analysed for the scheme of X-ray proximity lithography with spatial resolution 0.05 µm. The collimator transforms the divergent radiation of an X-ray point source into high collimated beam that illuminates uniformly the mask at normal incidence.
authors.affiliation: Lebedev Physical Institute, Leninsky prospect 53, Moscow 117924, Russia.
authors.forename: I A
authors.initials: IA
authors.lastname: Artioukov
authors.forename: I V
authors.initials: IV
authors.lastname: Kozhevnikov
authors.forename: N I
authors.initials: NI
authors.lastname: Kozhevnikova