title: Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers.
abstract: Large-aperture focusing of Al K(α) 1.49 keV x-ray photons using micropore optics made from a dry-etched 4 in. (100 mm) silicon wafer is demonstrated. Sidewalls of the micropores are smoothed with high-temperature annealing to work as x-ray mirrors. The wafer is bent to a spherical shape to collect parallel x rays into a focus. Our result supports that this new type of optics allows for the manufacturing of ultralight-weight and high-performance x-ray imaging optics with large apertures at low cost.
authors.affiliation: Department of Physics, Tokyo Metropolitan University, 1-1 Minami-Osawa, Hachioji, Tokyo, Japan. ezoe@tmu.ac.jp
authors.forename: Yuichiro
authors.initials: Y
authors.lastname: Ezoe
authors.forename: Teppei
authors.initials: T
authors.lastname: Moriyama
authors.forename: Tomohiro
authors.initials: T
authors.lastname: Ogawa
authors.forename: Takuya
authors.initials: T
authors.lastname: Kakiuchi
authors.forename: Ikuyuki
authors.initials: I
authors.lastname: Mitsuishi
authors.forename: Kazuhisa
authors.initials: K
authors.lastname: Mitsuda
authors.forename: Tatsuhiko
authors.initials: T
authors.lastname: Aoki
authors.forename: Kohei
authors.initials: K
authors.lastname: Morishita
authors.forename: Kazuo
authors.initials: K
authors.lastname: Nakajima