title: Electron cyclotron resonance plasma production by using pulse mode microwaves and dependences of ion beam current and plasma parameters on the pulse condition.
abstract: We measure the ion beam current and the plasma parameters by using the pulse mode microwave operation in the first stage of a tandem type ECRIS. The time averaged extracted ion beam current in the pulse mode operation is larger than that of the cw mode operation with the same averaged microwave power. The electron density n(e) in the pulse mode is higher and the electron temperature T(e) is lower than those of the cw mode operation. These plasma parameters are considered to cause in the increase of the ion beam current and are suitable to produce molecular or cluster ions.
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan. kiriyama@i-beam.jp
authors.forename: Ryutaro
authors.initials: R
authors.lastname: Kiriyama
authors.forename: Tomoya
authors.initials: T
authors.lastname: Takenaka
authors.forename: Yousuke
authors.initials: Y
authors.lastname: Kurisu
authors.forename: Dai
authors.initials: D
authors.lastname: Nozaki
authors.forename: Fuminobu
authors.initials: F
authors.lastname: Sato
authors.forename: Yushi
authors.initials: Y
authors.lastname: Kato
authors.forename: Toshiyuki
authors.initials: T
authors.lastname: Iida