title: Tailoring broadband antireflection on a silicon surface through two-step silver-assisted chemical etching.
abstract: Combined nanostructure arrays with tailored structural profiles are presented (see picture, GN: graded nanostructure). These arrays exhibit a sharp decrease in reflectivity when submitted to strong sunlight irradiation, showing great potential for diverse applications, such as optical and electro-optical devices and other antireflection designs.
authors.affiliation: Material and Chemical Research Laboratories, Industrial Technology Research Institute, Chutung, Hsinchu ,Taiwan. TimCYChen@itri.org.tw
authors.forename: Chia-Yun
authors.initials: CY
authors.lastname: Chen
authors.forename: Wen-Jin
authors.initials: WJ
authors.lastname: Li
authors.forename: Hsin-Hwa
authors.initials: HH
authors.lastname: Chen
mesh_terms: D008855:Microscopy, Electron, Scanning; D015394:Molecular Structure; D049329:Nanostructures / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry*; D012834:Silver / Q000737:chemistry*; D013472:Sunlight; D013499:Surface Properties
chemical_list: D012834:Silver; D012825:Silicon