title: Immobilization of enzyme and antibody on ALD-HfO2-EIS structure by NH3 plasma treatment.
abstract: Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH3 plasma treatment was proposed to replace the complicated silanization procedure for enzyme immobilization. Compared to conventional methods using chemical procedures, remote NH3 plasma treatment reduces the processing steps and time. The results exhibited that urea and antigen can be successfully detected, which indicated that the immobilization process is correct.
authors.affiliation: Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, 333, Taiwan. cslai@mail.cgu.edu.tw.
authors.forename: I-Shun
authors.initials: IS
authors.lastname: Wang
authors.forename: Yi-Ting
authors.initials: YT
authors.lastname: Lin
authors.forename: Chi-Hsien
authors.initials: CH
authors.lastname: Huang
authors.forename: Tseng-Fu
authors.initials: TF
authors.lastname: Lu
authors.forename: Cheng-En
authors.initials: CE
authors.lastname: Lue
authors.forename: Polung
authors.initials: P
authors.lastname: Yang
authors.forename: Dorota G
authors.initials: DG
authors.lastname: Pijanswska
authors.forename: Chia-Ming
authors.initials: CM
authors.lastname: Yang
authors.forename: Jer-Chyi
authors.initials: JC
authors.lastname: Wang
authors.forename: Jau-Song
authors.initials: JS
authors.lastname: Yu
authors.forename: Yu-Sun
authors.initials: YS
authors.lastname: Chang
authors.forename: Chien
authors.initials: C
authors.lastname: Chou
authors.forename: Chao-Sung
authors.initials: CS
authors.lastname: Lai