title: Preparation of regularly structured  nanotubular TiO2 thin films on ITO and  their modification with thin ALD-grown  layers.
abstract: Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.
authors.affiliation: Department of Chemistry, FI-00014 University of Helsinki, PO Box 55, Finland. jere.tupala@helsinki.fi
authors.forename: Jere
authors.initials: J
authors.lastname: Tupala
authors.forename: Marianna
authors.initials: M
authors.lastname: Kemell
authors.forename: Emma
authors.initials: E
authors.lastname: Härkönen
authors.forename: Mikko
authors.initials: M
authors.lastname: Ritala
authors.forename: Markku
authors.initials: M
authors.lastname: Leskelä