title: Near field imaging from multilayer lens.
abstract: Multilayer superlens has been reported that it had advantages over the single metal layer superlens. In this work, single silver layer and Ag-SiO2 multilayer superlens devices working at wavelength of 365 nm were fabricated using standard photolithography method. Grating objects with line/space (190 nm/190 nm) resolution could be resolved through both kinds of lens structures with working distance up to 128 nm. However, Ag-SiO2 multilayer lens shows higher transmittance and image contrast than the single silver layer device, the experimental result proves the theoretical calculation.
authors.affiliation: Department of Physics, Hong Kong Baptist University, 224 Waterloo Road, Kowloon Tong, Hong Kong, China.
authors.forename: Guixin
authors.initials: G
authors.lastname: Li
authors.forename: Jensen
authors.initials: J
authors.lastname: Li
authors.forename: H L
authors.initials: HL
authors.lastname: Tam
authors.forename: C T
authors.initials: CT
authors.lastname: Chan
authors.forename: K W
authors.initials: KW
authors.lastname: Cheah