title: Extreme ultraviolet light source based on intracavity high harmonic generation in a mode locked Ti:sapphire oscillator with 9.4 MHz repetition rate.
abstract: We report on the realization of an intracavity high harmonic source with a cutoff above 30 eV. The EUV source is based on a high power, hard-aperture, Kerr-lens mode-locked Ti:sapphire oscillator with a repetition rate of 9.4 MHz. The laser is operated in the net negative dispersion regime resulting in intracavity pulses as short as 17 fs with 1 µJ pulse energy. In a second intracavity focus, intensity more than 10¹⁴ W/cm² has been achieved, which is sufficient for high harmonic generation in a Xenon gas jet.
authors.affiliation: Helmholtz Institute Jena, Helmholtzweg 4, 07743 Jena, Germany. enikoe-judit-seres@lycos.com
authors.forename: Enikoe
authors.initials: E
authors.lastname: Seres
authors.forename: Jozsef
authors.initials: J
authors.lastname: Seres
authors.forename: Christian
authors.initials: C
authors.lastname: Spielmann
mesh_terms: D000537:Aluminum Oxide / Q000737:chemistry*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D007834:Lasers; D009991:Oscillometry / Q000295:instrumentation*; D014025:Titanium / Q000737:chemistry*; D014466:Ultraviolet Rays
chemical_list: D014025:Titanium; D000537:Aluminum Oxide