title: Ultra-low reflectance, high absorption microcrystalline silicon nanostalagmite.
abstract: In this work, microcrystalline silicon nanostalagmite [μc-SiNS] arrays have been successfully fabricated on glass by catalytic etching process through a template. The template, polystyrene [PS] nanospheres, with diameter and density of 30 to approximately 50 nm and 1010/cm2, respectively, was obtained by a modified nanophase separation of PS-containing block copolymer. The length of μc-SiNS could be controlled by the duration of etching time. The μc-SiNS exhibits ultra-low reflection approximately 0.3% and absorption around 99% over 300 to 800 nm in wavelength. Reflection is also suppressed for a wide range of angles of incidence in wide range of wavelength. This indicates the extensive light-trapping effect by the μc-SiNS and could possibly harvest a large amount of solar energy at infrared regime.
authors.affiliation: Graduate Institute of Optoelectronic Engineering, Department of Electrical Engineering, National Chung Hsing University, Taichung, Taiwan, 40227, Republic of China. zingway@dragon.nchu.edu.tw.
authors.forename: Subramani
authors.initials: S
authors.lastname: Thiyagu
authors.forename: Balasubramaniam Parvathy
authors.initials: BP
authors.lastname: Devi
authors.forename: Zingway
authors.initials: Z
authors.lastname: Pei
authors.forename: Yu-Hung
authors.initials: YH
authors.lastname: Chen
authors.forename: Jun-Chin
authors.initials: JC
authors.lastname: Liu