title: Multi-microjoule, MHz repetition rate Ti:sapphire ultrafast regenerative amplifier system.
abstract: We demonstrate a cryogenically cooled Ti:sapphire ultrafast regenerative amplifier laser system producing >20 μJ energies at 50 kHz, >12 μJ at 200 kHz and >3.5 μJ at 1MHz with repetition rates continuously tunable from 50 kHz up to 1.7 MHz in a footprint of only 60x180 cm². This laser uses down-chirped pulse amplification employing a grism stretcher and a glass-block compressor, achieving sub-60-fs pulse duration. This laser represents a several-times improvement in repetition-rate and average power over past Ti:sapphire-based ultrafast lasers in this class. We discuss the unique challenges and solutions for this laser system. This laser system has wide applications especially in ultrafast photoemission, nonlinear imaging and spectroscopy, as well as for micro/nano-machining and ultrafast laser therapy and surgery.
authors.affiliation: Kapteyn-Murnane Laboratories Inc., 1855 S 57th Ct, Boulder, Colorado 80301, USA. xzhang@kmlabs.com
authors.forename: Xiaoshi
authors.initials: X
authors.lastname: Zhang
authors.forename: Eric
authors.initials: E
authors.lastname: Schneider
authors.forename: Greg
authors.initials: G
authors.lastname: Taft
authors.forename: Henry
authors.initials: H
authors.lastname: Kaptyen
authors.forename: Margaret
authors.initials: M
authors.lastname: Murnane
authors.forename: Sterling
authors.initials: S
authors.lastname: Backus
mesh_terms: D000669:Amplifiers, Electronic; D003198:Computer Simulation; D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D007834:Lasers; D008027:Light; D008962:Models, Theoretical; D012542:Scattering, Radiation