title: Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications.
abstract: Block copolymers demonstrate potential for use in next-generation lithography due to their ability to self-assemble into well-ordered periodic arrays on the 3-100 nm length scale. The successful lithographic application of block copolymers relies on three critical conditions being met: high Flory-Huggins interaction parameters (χ), which enable formation of <10 nm features, etch selectivity between blocks for facile pattern transfer, and thin film self-assembly control. The present paper describes the synthesis and self-assembly of block copolymers composed of naturally derived oligosaccharides coupled to a silicon-containing polystyrene derivative synthesized by activators regenerated by electron transfer atom transfer radical polymerization. The block copolymers have a large χ and a low degree of polymerization (N) enabling formation of 5 nm feature diameters, incorporate silicon in one block for oxygen reactive ion etch contrast, and exhibit bulk and thin film self-assembly of hexagonally packed cylinders facilitated by a combination of spin coating and solvent annealing techniques. As observed by small angle X-ray scattering and atomic force microscopy, these materials exhibit some of the smallest block copolymer features in the bulk and in thin films reported to date.
authors.affiliation: Department of Chemical Engineering, The University of Texas at Austin, 1 University Station C0400, Austin, Texas 78712, United States.
authors.forename: Julia D
authors.initials: JD
authors.lastname: Cushen
authors.forename: Issei
authors.initials: I
authors.lastname: Otsuka
authors.forename: Christopher M
authors.initials: CM
authors.lastname: Bates
authors.forename: Sami
authors.initials: S
authors.lastname: Halila
authors.forename: Sébastien
authors.initials: S
authors.lastname: Fort
authors.forename: Cyrille
authors.initials: C
authors.lastname: Rochas
authors.forename: Jeffrey A
authors.initials: JA
authors.lastname: Easley
authors.forename: Erica L
authors.initials: EL
authors.lastname: Rausch
authors.forename: Anthony
authors.initials: A
authors.lastname: Thio
authors.forename: Redouane
authors.initials: R
authors.lastname: Borsali
authors.forename: C Grant
authors.initials: CG
authors.lastname: Willson
authors.forename: Christopher J
authors.initials: CJ
authors.lastname: Ellison
mesh_terms: D018625:Microscopy, Atomic Force; D009844:Oligosaccharides / Q000737:chemistry*; D011108:Polymers / Q000737:chemistry*; D011327:Printing / Q000379:methods*; D012825:Silicon / Q000737:chemistry*; D012997:Solvents / Q000737:chemistry
chemical_list: D009844:Oligosaccharides; D011108:Polymers; D012997:Solvents; D012825:Silicon