title: Extreme ultraviolet multilayer for the FERMI@Elettra free electron laser beam transport system.
abstract: In this work we present the design of a Pd/B₄C multilayer structure optimized for high reflectance at 6.67 nm. The structure has been deposited and also characterized along one year in order to investigate its temporal stability. This coating has been developed for the beam transport system of FERMI@Elettra Free Electron Laser: the use of an additional aperiodic capping layer on top of the structure combines the high reflectance with filter properties useful in rejecting the fundamental harmonic when the goal is to select the third FEL harmonic.
authors.affiliation: Consiglio Nazionale delle Ricerche-Institute for Photonics and Nanotechnologies, Laboratory for Ultraviolet and X-rays Optical Research, via Trasea 7, 35131 Padova, Italy.
authors.forename: Alain Jody
authors.initials: AJ
authors.lastname: Corso
authors.forename: Paola
authors.initials: P
authors.lastname: Zuppella
authors.forename: David L
authors.initials: DL
authors.lastname: Windt
authors.forename: Marco
authors.initials: M
authors.lastname: Zangrando
authors.forename: Maria Guglielmina
authors.initials: MG
authors.lastname: Pelizzo
mesh_terms: D004583:Electrons; D004867:Equipment Design; D019544:Equipment Failure Analysis; D007834:Lasers; D007909:Lenses; D014466:Ultraviolet Rays