title: Tailoring nanostructures using copolymer nanoimprint lithography.
abstract: The generation of defect-free polymer nanostructures by nanoimprinting methods is described. Long-range nanorheology and shorter-range surface energy effects can be efficiently combined to provide alignment of copolymer lamellae over several micrometers. As an example, a perpendicular organization with respect to circular tracks is shown, demonstrating the possibility of writing ordered radial nanostructures over large distances.
authors.affiliation: CEA, IRAMIS, SIS2M LIONS, CNRS, UMR n° 3299, Gif-sur-Yvette Cedex, France.
authors.forename: Pascal
authors.initials: P
authors.lastname: Thébault
authors.forename: Stefan
authors.initials: S
authors.lastname: Niedermayer
authors.forename: Stefan
authors.initials: S
authors.lastname: Landis
authors.forename: Nicolas
authors.initials: N
authors.lastname: Chaix
authors.forename: Patrick
authors.initials: P
authors.lastname: Guenoun
authors.forename: Jean
authors.initials: J
authors.lastname: Daillant
authors.forename: Xingkun
authors.initials: X
authors.lastname: Man
authors.forename: David
authors.initials: D
authors.lastname: Andelman
authors.forename: Henri
authors.initials: H
authors.lastname: Orland
mesh_terms: D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000379:methods*; D011108:Polymers / Q000737:chemistry*; D011327:Printing / Q000379:methods*; D013499:Surface Properties
chemical_list: D011108:Polymers