title: Directional photofluidization lithography: micro/nanostructural evolution by photofluidic motions of azobenzene materials.
abstract: This review demonstrates directional photofluidization lithography (DPL), which makes it possible to fabricate a generic and sophisticated micro/nanoarchitecture that would be difficult or impossible to attain with other methods. In particular, DPL differs from many of the existing micro/nanofabrication methods in that the post-treatment (i.e., photofluidization), after the preliminary fabrication process of the original micro/nanostructures, plays a pivotal role in the various micro/nanostructural evolutions including the deterministic reshaping of architectures, the reduction of structural roughness, and the dramatic enhancement of pattern resolution. Also, DPL techniques are directly compatible with a parallel and scalable micro/nanofabrication. Thus, DPL with such extraordinary advantages in micro/nanofabrication could provide compelling opportunities for basic micro/nanoscale science as well as for general technology applications.
authors.affiliation: Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Korea. ace51@kaist.ac.kr
authors.forename: Seungwoo
authors.initials: S
authors.lastname: Lee
authors.forename: Hong Suk
authors.initials: HS
authors.lastname: Kang
authors.forename: Jung-Ki
authors.initials: JK
authors.lastname: Park
mesh_terms: D001391:Azo Compounds / Q000737:chemistry*; D055616:Microtechnology / Q000379:methods*; D009038:Motion; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000379:methods*; D011327:Printing / Q000379:methods*
chemical_list: D001391:Azo Compounds; C009850:azobenzene