title: Selective-area fluorination of graphene with fluoropolymer and laser irradiation.
abstract: We have devised a method to selectively fluorinate graphene by irradiating fluoropolymer-covered graphene with a laser. This fluoropolymer produces active fluorine radicals under laser irradiation that react with graphene but only in the laser-irradiated region. The kinetics of C-F bond formation is dependent on both the laser power and fluoropolymer thickness, proving that fluorination occurs by the decomposition of the fluoropolymer. Fluorination leads to a dramatic increase in the resistance of the graphene while the basic skeletal structure of the carbon bonding network is maintained. Considering the simplicity of the fluorination process and that it allows patterning with a nontoxic fluoropolymer as a solid source, this method could find application to generate fluorinated graphene in graphene-based electronic devices such as for the electrical isolation of graphene.
authors.affiliation: Department of Mechanical Engineering and the Materials Science and Engineering Program, Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78712, USA.
authors.forename: Wi Hyoung
authors.initials: WH
authors.lastname: Lee
authors.forename: Ji Won
authors.initials: JW
authors.lastname: Suk
authors.forename: Harry
authors.initials: H
authors.lastname: Chou
authors.forename: Jongho
authors.initials: J
authors.lastname: Lee
authors.forename: Yufeng
authors.initials: Y
authors.lastname: Hao
authors.forename: Yaping
authors.initials: Y
authors.lastname: Wu
authors.forename: Richard
authors.initials: R
authors.lastname: Piner
authors.forename: Deji
authors.initials: D
authors.lastname: Akinwande
authors.forename: Kwang S
authors.initials: KS
authors.lastname: Kim
authors.forename: Rodney S
authors.initials: RS
authors.lastname: Ruoff