title: Silica deposition induced by isolated aluminum ions bound on chelate resin as a model compound of the surface of microbes.
abstract: To elucidate the mechanism of silica biodeposition in hot spring water, which is induced by Al(3+) ions bound to the surface of microbes, a chelate resin (Chelex 100) was used as a model compound of the surface of microbes. No silicic acid was adsorbed on the Na type Chelex 100, whereas silicic acids were significantly adsorbed to the Al type Chelex 100. In the Al type Chelex 100, the Al(3+) ions were present as 1:1 tridentate complex with iminodiacetate (IDA) group. After adsorption of silicic acid to Al type Chelex 100, a IDA-Al-O-Si-(OH)(3) site formed. The site acted as a template for the successive adsorption of silicic acids to form silica sheets around Al type Chelex 100 particles. In conclusion, Al(3+) ions bound to the surface of microbes play a key role as a trigger for the biodeposition of silica in hot spring water.
authors.affiliation: College of Environment and Resources, Inner Mongolia University, No. 235 West University Street, Hohhot, Inner Mongolia 010021, PR China. baishuqin2000@yahoo.com.cn
authors.forename: Shuqin
authors.initials: S
authors.lastname: Bai
authors.forename: Gaowa
authors.initials: G
authors.lastname: Naren
authors.forename: Hiroaki
authors.initials: H
authors.lastname: Noma
authors.forename: Mayumi
authors.initials: M
authors.lastname: Etou
authors.forename: Hironori
authors.initials: H
authors.lastname: Ohashi
authors.forename: Yasuhiro
authors.initials: Y
authors.lastname: Fujino
authors.forename: Katsumi
authors.initials: K
authors.lastname: Doi
authors.forename: Yoshihiro
authors.initials: Y
authors.lastname: Okaue
authors.forename: Takushi
authors.initials: T
authors.lastname: Yokoyama
mesh_terms: D000535:Aluminum / Q000737:chemistry*; D002614:Chelating Agents / Q000737:chemistry*; D007477:Ions / Q000737:chemistry; D010316:Particle Size; D012117:Resins, Synthetic / Q000737:chemistry*; D012822:Silicon Dioxide / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D002614:Chelating Agents; D007477:Ions; D012117:Resins, Synthetic; D012822:Silicon Dioxide; D000535:Aluminum