title: Photopatterning of multilayer n-alkylsilane films.
abstract: Surface photopatterning of organosilane self-assembled monolayers (SAM) has received increasing attention since its introduction 20 years ago. Herein we report for the first time a cost-efficient soft photopatterning technique affording amplified 3D multilayer structures. The essential chemistry relies on a spatially controlled photoacid-catalyzed hydrolysis and polycondensation of n-alkyltrimethoxysilane precursors (n-C(12)H(25)Si(OCH(3))(3),). Amphiphilic siloxane species are photogenerated locally and are able to self-assemble spontaneously into a long-range-ordered lamellar mesostructure.
authors.affiliation: Laboratory of Photochemistry and Macromolecular Engineering, ENSCMu, University of Haute-Alsace, 3 rue Alfred Werner, 68093 Mulhouse Cedex, France.
authors.forename: Lingli
authors.initials: L
authors.lastname: Ni
authors.forename: Abraham
authors.initials: A
authors.lastname: Chemtob
authors.forename: Céline
authors.initials: C
authors.lastname: Croutxé-Barghorn
authors.forename: Jocelyne
authors.initials: J
authors.lastname: Brendlé
authors.forename: Loïc
authors.initials: L
authors.lastname: Vidal
authors.forename: Séverinne
authors.initials: S
authors.lastname: Rigolet
mesh_terms: D008567:Membranes, Artificial; D010316:Particle Size; D055668:Photochemical Processes; D012821:Silanes / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D008567:Membranes, Artificial; D012821:Silanes