title: Loss mechanisms of surface plasmon polaritons propagating on a smooth polycrystalline Cu surface.
abstract: We study the propagation properties of surface plasmon polaritons on a Cu surface by means of photoemission electron microscopy. Use of a CMOS process to fabricate the Cu thin film is shown to enable very high propagation distances (up to 65 μm at 750 nm wavelength), provided that the copper native oxide is removed. A critical review of the optical loss mechanisms is undertaken and shed light on the effect of single grain boundaries in increasing the propagation losses of the plasmon. A microscopic interpretation is provided, relying on groove induced electromagnetic hot spots.
authors.affiliation: CEA, LETI, Minatec Campus, 17 rue des martyrs, F-38042 Grenoble, France.
authors.forename: Hyun Seok
authors.initials: HS
authors.lastname: Lee
authors.forename: Chawki
authors.initials: C
authors.lastname: Awada
authors.forename: Salim
authors.initials: S
authors.lastname: Boutami
authors.forename: Fabrice
authors.initials: F
authors.lastname: Charra
authors.forename: Ludovic
authors.initials: L
authors.lastname: Douillard
authors.forename: Roch Espiau
authors.initials: RE
authors.lastname: de Lamaestre