title: Kernel-based parametric analytical model of source intensity distributions in lithographic tools.
abstract: This paper proposes a parametric analytical source model for overall representation of the physical distribution property of partially coherent illumination sources in lithographic tools. A set of smooth kernels is adopted to construct the analytical model for the multiple mainstream illumination sources. Corrected parametrical terms are subsequently presented for characterization of different physical distortions of and deviations from actual illumination sources. The corrected parametrical terms can be decomposed into Fourier series, which have special physical meanings of respectively indicating different distortion types, including shift of the center, tilt, and ellipticity, etc. We fully expected that the proposed analytical model will provide both simulation conditions and a theoretical basis for the resolution enhancement technique and related research fields.
authors.affiliation: Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, China. shyliu@mail.hust.edu.cn
authors.forename: Shiyuan
authors.initials: S
authors.lastname: Liu
authors.forename: Wei
authors.initials: W
authors.lastname: Liu
authors.forename: Xinjiang
authors.initials: X
authors.lastname: Zhou
authors.forename: Peng
authors.initials: P
authors.lastname: Gong