title: Si-compatible cleaning process for graphene using low-density inductively coupled plasma.
abstract: We report a novel cleaning technique for few-layer graphene (FLG) by using inductively coupled plasma (ICP) of Ar with an extremely low plasma density of 3.5 × 10(8) cm(-3). It is known that conventional capacitively coupled plasma (CCP) treatments destroy the planar symmetry of FLG, giving rise to the generation of defects. However, ICP treatment with extremely low plasma density is able to remove polymer resist residues from FLG within 3 min at a room temperature of 300 K while retaining the carbon sp(2)-bonding of FLG. It is found that the carrier mobility and charge neutrality point of FLG are restored to their pristine defect-free state after the ICP treatment. Considering the application of graphene to silicon-based electronic devices, such a cleaning method can replace thermal vacuum annealing, electrical current annealing, and wet-chemical treatment due to its advantages of being a low-temperature, large-area, high-throughput, and Si-compatible process.
authors.affiliation: SKKU Advanced Institute of Nano-Technology (SAINT), Samsung-SKKU Graphene Center, Sungkyunkwan University, 300 Cheoncheon-dong, Jangan-gu, Suwon, Gyeonggi-do 440-746, Korea.
authors.forename: Yeong-Dae
authors.initials: YD
authors.lastname: Lim
authors.forename: Dae-Yeong
authors.initials: DY
authors.lastname: Lee
authors.forename: Tian-Zi
authors.initials: TZ
authors.lastname: Shen
authors.forename: Chang-Ho
authors.initials: CH
authors.lastname: Ra
authors.forename: Jae-Young
authors.initials: JY
authors.lastname: Choi
authors.forename: Won Jong
authors.initials: WJ
authors.lastname: Yoo