title: Effect of HCl on the doping and shape control of silicon nanowires.
abstract: The introduction of hydrogen chloride during the in situ doping of silicon nanowires (SiNWs) grown using the vapor-liquid-solid (VLS) mechanism was investigated. Compared with non-chlorinated atmospheres, the use of HCl with dopant gases considerably improves the surface morphology of the SiNWs, leading to extremely smooth surfaces and a greatly reduced tapering. Variations in the wire diameter are massively reduced for boron doping, and cannot be measured at 600 °C for phosphorous over several tens of micrometers. This remarkable feature is accompanied by a frozen gold migration from the catalyst, with no noticeable levels of gold clusters observed using scanning electron microscopy. A detailed study of the apparent resistivity of the NWs reveals that the dopant incorporation is effective for both types of doping. A graph linking the apparent resistivity to the dopant to silane dilution ratio is built for both types of doping and discussed in the frame of the previous results.
authors.affiliation: SiNaPS Laboratory SP2M, UMR-E CEA/UJF-Grenoble 1, INAC, Grenoble, F-38054, France. pascal.gentile@cea.fr
authors.forename: P
authors.initials: P
authors.lastname: Gentile
authors.forename: A
authors.initials: A
authors.lastname: Solanki
authors.forename: N
authors.initials: N
authors.lastname: Pauc
authors.forename: F
authors.initials: F
authors.lastname: Oehler
authors.forename: B
authors.initials: B
authors.lastname: Salem
authors.forename: G
authors.initials: G
authors.lastname: Rosaz
authors.forename: T
authors.initials: T
authors.lastname: Baron
authors.forename: M
authors.initials: M
authors.lastname: Den Hertog
authors.forename: V
authors.initials: V
authors.lastname: Calvo
mesh_terms: D003460:Crystallization / Q000379:methods*; D006851:Hydrochloric Acid / Q000737:chemistry*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D046911:Macromolecular Substances; D006851:Hydrochloric Acid; D012825:Silicon