title: Flexible control of block copolymer directed self-assembly using small, topographical templates: potential lithography solution for integrated circuit contact hole patterning.
authors.affiliation: Department of Electrical Engineering, Stanford University, 420 Via Palou, Stanford, CA 94305, USA.
authors.forename: He
authors.initials: H
authors.lastname: Yi
authors.forename: Xin-Yu
authors.initials: XY
authors.lastname: Bao
authors.forename: Jie
authors.initials: J
authors.lastname: Zhang
authors.forename: Christopher
authors.initials: C
authors.lastname: Bencher
authors.forename: Li-Wen
authors.initials: LW
authors.lastname: Chang
authors.forename: Xiangyu
authors.initials: X
authors.lastname: Chen
authors.forename: Richard
authors.initials: R
authors.lastname: Tiberio
authors.forename: James
authors.initials: J
authors.lastname: Conway
authors.forename: Huixiong
authors.initials: H
authors.lastname: Dai
authors.forename: Yongmei
authors.initials: Y
authors.lastname: Chen
authors.forename: Subhasish
authors.initials: S
authors.lastname: Mitra
authors.forename: H-S Philip
authors.initials: HS
authors.lastname: Wong
mesh_terms: D008689:Methacrylates / Q000737:chemistry; D049329:Nanostructures / Q000737:chemistry; D011108:Polymers / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry; D012666:Semiconductors
chemical_list: D008689:Methacrylates; D011108:Polymers; D011137:Polystyrenes; C522509:polystyrene-block-poly(methyl methacrylate)