title: Influence of caries infiltrant contamination on shear bond strength of different adhesives to dentin.
abstract: OBJECTIVE
  To analyze whether the contamination with a caries infiltrant system impairs the adhesive performance of etch-and-rinse and self-etching adhesives on dentin.
  
  
  METHODS
  Dentin contamination with the caries infiltrant system (Icon, DMG) was simulated by applying either hydrochloric acid (15 % HCl, Icon Etch, 15 s), the resin infiltrant (Icon infiltrant, 4 min), or both prior to the application of the respective adhesives (each group n = 10). In the control groups, the etch-and-rinse adhesive (Optibond FL, Kerr) and the self-etching adhesive (iBOND Self Etch, Hereaus) were applied without former contamination with the infiltrant system. Additionally, the adhesive performance of the resin infiltrant alone was tested. Shear bond strength of a nano-hybrid composite was analyzed after thermocycling (5,000×, 5-55°C) of the specimens and analyzed by ANOVA/Scheffé post hoc tests (p < 0.05) and Weibull statistics. Failure mode was inspected under a stereomicroscope at × 25 magnification.
  
  
  RESULTS
  Contamination with the resin infiltrant alone did not impair shear bond strength, while contamination with hydrochloric acid or with hydrochloric acid and the resin infiltrant reduced shear bond strength (MPa) of the adhesives (Optibond FL: 20.5 ± 3.6, iBOND Self Etch: 17.9 ± 2.6) significantly. Hydrochloric acid contamination increased the number of adhesive failures. The adhesive performance of the caries infiltrant system alone was insufficient.
  
  
  CONCLUSIONS
  The contamination with the caries infiltrant system impaired the shear bond strength of conventional dental adhesives.
  
  
  CONCLUSIONS
  Contamination of the caries infiltrant system on dentin should be avoided due to the detrimental effect of hydrochloric acid etching.
authors.affiliation: Department of Preventive Dentistry, Periodontology and Cariology, Center of Dental Medicine, University of Zurich, Plattenstrasse 11, 8032 Zürich, Switzerland.
authors.forename: Liuhe
authors.initials: L
authors.lastname: Jia
authors.forename: Bogna
authors.initials: B
authors.lastname: Stawarczyk
authors.forename: Patrick R
authors.initials: PR
authors.lastname: Schmidlin
authors.forename: Thomas
authors.initials: T
authors.lastname: Attin
authors.forename: Annette
authors.initials: A
authors.lastname: Wiegand
mesh_terms: D000134:Acid Etching, Dental / Q000379:methods; D000818:Animals; D002417:Cattle; D003188:Composite Resins / Q000737:chemistry; D001840:Dental Bonding; D003731:Dental Caries / Q000628:therapy*; D003799:Dental Stress Analysis / Q000295:instrumentation; D003804:Dentin / Q000473:pathology*; D017220:Dentin-Bonding Agents / Q000737:chemistry*; D006851:Hydrochloric Acid / Q000737:chemistry; D055115:Light-Curing of Dental Adhesives; D008422:Materials Testing; D053761:Nanocomposites / Q000737:chemistry; D010756:Phosphoric Acids / Q000737:chemistry; D010895:Pit and Fissure Sealants / Q000737:chemistry*; D011897:Random Allocation; D019279:Resin Cements / Q000737:chemistry; D012117:Resins, Synthetic / Q000737:chemistry*; D033081:Shear Strength; D013314:Stress, Mechanical; D013499:Surface Properties; D013696:Temperature; D013997:Time Factors
chemical_list: D003188:Composite Resins; D017220:Dentin-Bonding Agents; C469607:OptiBond FL; D010756:Phosphoric Acids; D010895:Pit and Fissure Sealants; D019279:Resin Cements; D012117:Resins, Synthetic; C501891:Tetric EvoCeram; C477386:iBond; C578177:icon infiltrant; C030242:phosphoric acid; D006851:Hydrochloric Acid