title: Optical and structural performance of the Al(1%wtSi)/Zr reflection multilayers in the 17-19nm region.
abstract: Two kinds of Al/Zr (Al(1%wtSi)/Zr and Al(Pure)/Zr) multilayers for extreme ultraviolet (EUV) optics were deposited on fluorine doped tin oxide coated glass by using direct-current magnetron sputtering technology. The comparison of the two systems shows that the Al(1%wtSi)/Zr multilayers have the lowest interfacial roughness and highest reflectivity. Based on the X-ray diffraction, the performance of the two systems is determined by the crystallization of Al layer. To fully understand the Al(1%wtSi)/Zr multilayer, we built up a two-layer model to fit situation of the AFM images, and simulate the grazing incident x-ray reflection-measurements of multilayers with various periods (N = 10, 40, 60, 80). Below 40 periods, the roughness components are lowered. After 40 periods, both surface and interfacial roughness increase with the period number, and decrease the reflectance. According to transmission electron microscope images, the model can represent the variable structure of the system.
authors.affiliation: Department Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092, China.
authors.forename: Qi
authors.initials: Q
authors.lastname: Zhong
authors.forename: Wenbin
authors.initials: W
authors.lastname: Li
authors.forename: Zhong
authors.initials: Z
authors.lastname: Zhang
authors.forename: Jingtao
authors.initials: J
authors.lastname: Zhu
authors.forename: Qiushi
authors.initials: Q
authors.lastname: Huang
authors.forename: Haochuan
authors.initials: H
authors.lastname: Li
authors.forename: Zhanshan
authors.initials: Z
authors.lastname: Wang
authors.forename: Philippe
authors.initials: P
authors.lastname: Jonnard
authors.forename: Karine
authors.initials: K
authors.lastname: Le Guen
authors.forename: Jean-Michel
authors.initials: JM
authors.lastname: André
authors.forename: Hongjun
authors.initials: H
authors.lastname: Zhou
authors.forename: Tonglin
authors.initials: T
authors.lastname: Huo
mesh_terms: D000535:Aluminum / Q000737:chemistry*; D003460:Crystallization / Q000379:methods; D004867:Equipment Design; D008280:Magnetics; D008422:Materials Testing; D018625:Microscopy, Atomic Force / Q000379:methods; D046529:Microscopy, Electron, Transmission / Q000379:methods; D055095:Optics and Photonics; D013499:Surface Properties; D014961:X-Ray Diffraction; D014965:X-Rays; D015040:Zirconium / Q000737:chemistry*
chemical_list: D015040:Zirconium; D000535:Aluminum