title: High speed photodiodes in standard nanometer scale CMOS technology: a comparative study.
abstract: This paper compares various techniques for improving the frequency response of silicon photodiodes fabricated in mainstream CMOS technology for fully integrated optical receivers. The three presented photodiodes, Spatially Modulated Light detectors, Double, and Interrupted P-Finger photodiodes, aim at reducing the low speed diffusive component of the photo generated current. For the first photodiode, Spatially Modulated Light (SML) detectors, the low speed current component is canceled out by converting it to a common mode current driving a differential transimpedance amplifier. The Double Photodiode (DP) uses two depletion regions to increase the fast drift component, while the Interrupted-P Finger Photodiode (IPFPD) redirects the low speed component towards a different contact from the main fast terminal of the photodiode. Extensive device simulations using 130 nm CMOS technology-parameters are presented to compare their performance using the same technological platform. Finally a new type of photodiode that uses triple well CMOS technology is introduced that can achieve a bandwidth of roughly 10 GHz without any process modification or high reverse bias voltages that would jeopardize the photodetector and subsequent transimpedance amplifier reliability.
authors.affiliation: Department of Electrical and Computer System Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180, USA. nakhkb@rpi.edu
authors.forename: Behrooz
authors.initials: B
authors.lastname: Nakhkoob
authors.forename: Sagar
authors.initials: S
authors.lastname: Ray
authors.forename: Mona M
authors.initials: MM
authors.lastname: Hella