title: [Self-cleaning and antimicrobial properties of methacrylic acid coupled TiO(2)/PMMA denture base resin].
abstract: OBJECTIVE
  To study the influence of TiO2 and methacrylic acid on self-cleaning and antimicrobial properties of denture base resin.
  
  
  METHODS
  TiO2 (2%, 4%, 6%) and methacrylic acid were respectively added into two makers' denture base resins. The self-cleaning property was assayed with measuring the decomposition of methylthioninium chloride. The antimicrobial property was tested with the pellicle-sticking method. The data were analysed by SPSS 12.0 software package for two-way ANOVA.
  
  
  RESULTS
  The self-cleaning and antimicrobial properties of samples were improved as TiO2 increased. Methacrylic acid had no significant influence on self-cleaning and antimicrobial properties of the samples. The decomposition ratio and antimicrobial ratio of MTi4% (Rijin) were 53.96% and 71.42%, respectively.
  
  
  CONCLUSIONS
  Methacrylic acid coupled TiO2/PMMA denture base resin enjoys good self-cleaning and antimicrobial properties.
authors.affiliation: Department of Prosthodontics, Tongji University, Shanghai, China. taojxtohoku@hotmail.com
authors.forename: Jian-xiang
authors.initials: JX
authors.lastname: Tao
authors.forename: Xiu-li
authors.initials: XL
authors.lastname: Song
authors.forename: Yuan-yuan
authors.initials: YY
authors.lastname: Yao
authors.forename: Feng-shan
authors.initials: FS
authors.lastname: Chen
authors.forename: Jian-sheng
authors.initials: JS
authors.lastname: Su
mesh_terms: D000890:Anti-Infective Agents; D003819:Denture Bases; D008689:Methacrylates; D019904:Polymethyl Methacrylate
chemical_list: D000890:Anti-Infective Agents; D008689:Methacrylates; C008384:methacrylic acid; D019904:Polymethyl Methacrylate