title: Toward optimized light utilization in nanowire arrays using scalable nanosphere lithography and selected area growth.
abstract: Vertically aligned, catalyst-free semiconducting nanowires hold great potential for photovoltaic applications, in which achieving scalable synthesis and optimized optical absorption simultaneously is critical. Here, we report combining nanosphere lithography (NSL) and selected area metal-organic chemical vapor deposition (SA-MOCVD) for the first time for scalable synthesis of vertically aligned gallium arsenide nanowire arrays, and surprisingly, we show that such nanowire arrays with patterning defects due to NSL can be as good as highly ordered nanowire arrays in terms of optical absorption and reflection. Wafer-scale patterning for nanowire synthesis was done using a polystyrene nanosphere template as a mask. Nanowires grown from substrates patterned by NSL show similar structural features to those patterned using electron beam lithography (EBL). Reflection of photons from the NSL-patterned nanowire array was used as a measure of the effect of defects present in the structure. Experimentally, we show that GaAs nanowires as short as 130 nm show reflection of <10% over the visible range of the solar spectrum. Our results indicate that a highly ordered nanowire structure is not necessary: despite the "defects" present in NSL-patterned nanowire arrays, their optical performance is similar to "defect-free" structures patterned by more costly, time-consuming EBL methods. Our scalable approach for synthesis of vertical semiconducting nanowires can have application in high-throughput and low-cost optoelectronic devices, including solar cells.
authors.affiliation: Department of Electrical Engineering, University of Southern California, Los Angeles, California 90089, United States.
authors.forename: Anuj R
authors.initials: AR
authors.lastname: Madaria
authors.forename: Maoqing
authors.initials: M
authors.lastname: Yao
authors.forename: Chunyung
authors.initials: C
authors.lastname: Chi
authors.forename: Ningfeng
authors.initials: N
authors.lastname: Huang
authors.forename: Chenxi
authors.initials: C
authors.lastname: Lin
authors.forename: Ruijuan
authors.initials: R
authors.lastname: Li
authors.forename: Michelle L
authors.initials: ML
authors.lastname: Povinelli
authors.forename: P Daniel
authors.initials: PD
authors.lastname: Dapkus
authors.forename: Chongwu
authors.initials: C
authors.lastname: Zhou
mesh_terms: D008027:Light; D008422:Materials Testing; D054802:Molecular Imprinting / Q000379:methods*; D054118:Nanospheres / Q000737:chemistry* / Q000528:radiation effects / Q000648:ultrastructure*; D043942:Nanotubes / Q000737:chemistry* / Q000528:radiation effects / Q000648:ultrastructure*