Catalyst-free metal-organic chemical vapor deposition growth of InN nanorods.
We demonstrated the successful growth of catalyst-free InN nanorods on (0001) Al2O3 substrates using metal-organic chemical vapor deposition. Morphological evolution was significantly affected by growth temperature. At 710 degrees C, complete InN nanorods with typical diameters of 150 nm and length of approximately 3.5 microm were grown with hexagonal facets. theta-2theta X-ray diffraction measurement shows that (0002) InN nanorods grown on (0001) Al2O3 substrates were vertically aligned along c-axis. In addition, high resolution transmission electron microscopy indicates the spacing of the (0001) lattice planes is 0.28 nm, which is very close to that of bulk InN. The electron diffraction patterns also revealed that the InN nanorods are single crystalline with a growth direction along (0001) with (10-10) facets.
Hybrid Materials Program (WCU), Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea.
Min Hwa
MH
Kim
Kunook
K
Chung
Dae Young
DY
Moon
Jong-Myeong
JM
Jeon
Miyoung
M
Kim
Jinsub
J
Park
Yasushi
Y
Nanishi
Gyu-Chul
GC
Yi
Euijoon
E
Yoon