A novel method for patterning of poly(3,4-ethylenedioxythiophene) films using UV exposure-activated self-assembled monolayers.
We have investigated a novel method for patterning of (3, 4-ethylenedioxythiophene) PEDOT, which has involved a selective polymerization of PEDOT on an UV-activated Self-Assembled-Monolayer surface. OTS coated surface has been activated by UV exposure, and the UV-exposed area served as adsorption sites for FeCl3 oxidants, providing a selective deposition of PEDOT films on FeCl3 adsorbed area, and thus leading to the selective patterning of PEDOT films. UV irradiation time and mask pattern dimension are main contributors to patternability: UV irradiation through Cr-mask (3 microm design) lead to approximately 3-5 microm patterns of PEDOT films, depending on the UV exposure time. In addition, a scotch tape peel test revealed excellent adhesion property of PEDOT to SiO2. Consequently, this simple method can be applied to define deep submicron dimensions due to its ability of providing a direct transfer of mask patterns to the substrate.
Center for Materials and Processes of Self-Assembly, School of Advanced Materials Engineering, Kookmin University, Seoul 136-702, Republic of Korea.
Mohammad Arifur
MA
Rahman
Taewook
T
Kwon
Young Kyu
YK
Lee
Abdur
A
Rahim
Hosoek
H
Nam
Joo-Wha
JW
Hong
Jong-Kwon
JK
Lee
Hoesup
H
Soh
Jaegab
J
Lee