Plasma ion source for in situ ion bombardment in a soft x-ray magnetic scattering diffractometer.
A new plasma ion source for in situ keV He ion bombardment of solid state samples or thin films was designed and built for ion fluences between 1 × 10(12) and 1 × 10(17) ions/cm(2). The system was designed to be mounted to different diffraction chambers for soft x-ray resonant magnetic scattering. Without breaking the vacuum due to He-ion bombardment, structural and magnetic modifications of the samples can be studied in situ and element specifically.
Institute of Physics, EP IV, University of Kassel, Heinrich-Plett-Str.40, 34132 Kassel, Germany. paper@ag-ehresmann.de
Daniel
D
Lengemann
Dieter
D
Engel
Arno
A
Ehresmann