DC magnetron sputtered polyaniline-HCl thin films for chemical sensing applications.
Thin films of conducting polymers exhibit unique chemical and physical properties that render them integral parts in microelectronics, energy storage devices, and chemical sensors. Overall, polyaniline (PAni) doped in acidic media has shown metal-like electronic conductivity, though exact physical and chemical properties are dependent on the polymer structure and dopant type. Difficulties arising from poor processability render production of doped PAni thin films particularly challenging. In this contribution, DC magnetron sputtering, a physical vapor deposition technique, is applied to the preparation of conductive thin films of PAni doped with hydrochloric acid (PAni-HCl) in an effort to circumvent issues associated with conventional thin film preparation methods. Samples manufactured by the sputtering method are analyzed along with samples prepared by conventional drop-casting. Physical characterization (atomic force microscopy, AFM) confirm the presence of PAni-HCl and show that films exhibit a reduced roughness and potentially pinhole-free coverage of the substrate. Spectroscopic evidence (UV-vis, FT-IR, and X-ray photoelectron spectroscopy (XPS)) suggests that structural changes and loss of conductivity, not uncommon during PAni processing, does occur during the preparation process. Finally, the applicability of sputtered films to gas-phase sensing of NH(3) was investigated with surface plasmon resonance (SPR) spectroscopy and compared to previous contributions. In summary, sputtered PAni-HCl films exhibit quantifiable, reversible behavior upon exposure to NH(3) with a calculated LOD (by method) approaching 0.4 ppm NH(3) in dry air.
University of Delaware, Department of Chemistry and Biochemistry, Newark, Delaware 19716, United States.
Nicola
N
Menegazzo
Devon
D
Boyne
Holt
H
Bui
Thomas P
TP
Beebe
Karl S
KS
Booksh
D000641:Ammonia / Q000032:analysis*; D000814:Aniline Compounds / Q000737:chemistry*; D005740:Gases / Q000032:analysis*; D006851:Hydrochloric Acid / Q000737:chemistry*; D057230:Limit of Detection; D018625:Microscopy, Atomic Force; D049329:Nanostructures / Q000737:chemistry*; D056951:Photoelectron Spectroscopy; D013056:Spectrophotometry, Ultraviolet; D020349:Surface Plasmon Resonance / Q000379:methods; D013499:Surface Properties
D000814:Aniline Compounds; D005740:Gases; C416807:polyaniline; D000641:Ammonia; D006851:Hydrochloric Acid