Nanotransfer printing with sub-10 nm resolution realized using directed self-assembly.
An extraordinarily facile sub-10 nm fabrication method using the synergic combination of nanotransfer printing and the directed self-assembly of block copolymers is introduced. The approach is realized by achieving the uniform self-assembly of polydimethylsiloxane (PDMS)-containing block copolymers on a PDMS mold through the stabilization of the block copolymer thin films. This simple printing method can be applied on oxides, metals, polymers, and non-planar substrates without pretreatments. The fabrication of well-aligned metallic and polymeric functional nanostructures and crossed wire structures is also presented.
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Daejeon 305-701, Republic of Korea.
Jae Won
JW
Jeong
Woon Ik
WI
Park
Lee-Mi
LM
Do
Jong-Hyun
JH
Park
Tae-Heon
TH
Kim
Geesung
G
Chae
Yeon Sik
YS
Jung
D049329:Nanostructures / Q000737:chemistry; D036103:Nanotechnology / Q000379:methods*; D010084:Oxidation-Reduction; D011108:Polymers / Q000737:chemistry; D011327:Printing / Q000379:methods*
D011108:Polymers