Novel denture-cleaning system based on hydroxyl radical disinfection.
The purpose of this study was to evaluate a new denture-cleaning device using hydroxyl radicals generated from photolysis of hydrogen peroxide (H2O2). Electron spin resonance analysis demonstrated that the yield of hydroxyl radicals increased with the concentration of H2O2 and light irradiation time. Staphylococcus aureus, Pseudomonas aeruginosa, and methicillin-resistant S aureus were killed within 10 minutes with a > 5-log reduction when treated with photolysis of 500 mM H2O2; Candida albicans was killed within 30 minutes with a > 4-log reduction with photolysis of 1,000 mM H2O2. The clinical test demonstrated that the device could effectively reduce microorganisms in denture plaque by approximately 7-log order within 20 minutes.
Tohoku University Graduate School of Dentistry, Sendai, Japan. tarou@dent.tohoku.ac.jp
Taro
T
Kanno
Keisuke
K
Nakamura
Hiroyo
H
Ikai
Eisei
E
Hayashi
Midori
M
Shirato
Takayuki
T
Mokudai
Atsuo
A
Iwasawa
Yoshimi
Y
Niwano
Masahiro
M
Kohno
Keiichi
K
Sasaki
D001419:Bacteria / Q000187:drug effects; D003778:Dentures; D004203:Disinfection; D005658:Fungi / Q000187:drug effects; D017665:Hydroxyl Radical; D008826:Microbial Sensitivity Tests
D017665:Hydroxyl Radical