Open foundry platform for high-performance electronic-photonic integration.
This paper presents photonic devices with 3 dB/cm waveguide loss fabricated in an existing commercial electronic 45 nm SOI-CMOS foundry process. By utilizing existing front-end fabrication processes the photonic devices are monolithically integrated with electronics in the same physical device layer as transistors achieving 4 ps logic stage delay, without degradation in transistor performance. We demonstrate an 8-channel optical microring-resonator filter bank and optical modulators, both controlled by integrated digital circuits. By developing a device design methodology that requires zero process infrastructure changes, a widely available platform for high-performance photonic-electronic integrated circuits is enabled.
Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, 77 Massachusetts Ave, Cambridge, Massachusetts 02139, USA.
Jason S
JS
Orcutt
Benjamin
B
Moss
Chen
C
Sun
Jonathan
J
Leu
Michael
M
Georgas
Jeffrey
J
Shainline
Eugen
E
Zgraggen
Hanqing
H
Li
Jie
J
Sun
Matthew
M
Weaver
Stevan
S
Urošević
Miloš
M
Popović
Rajeev J
RJ
Ram
Vladimir
V
Stojanović
D004581:Electronics / Q000295:instrumentation*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D055096:Optical Devices; D018511:Systems Integration; D014173:Transistors, Electronic