SPPs coupling induced interference in metal/dielectric multilayer waveguides and its application for plasmonic lithography.
We present the analyses of surface plasmon polaritons (SPPs) coupling induced interference in metal/dielectric (M/D) multilayer metamaterials and techniques to improve the performance of sub-wavelength plasmonic lithography. Expressions of beam spreading angles and interference patterns are derived from analyses of numerical simulations and the coupled mode theory. The new understandings provide useful guidelines and design criteria for plasmonic lithography. With proper layer structure design, sub-wavelength uniform periodic patterns with feature size of 1/12 of the mask's period can be realized. High pattern contrast of 0.8 and large field depth of 80 nm are also demonstrated numerically by considering the SPPs coupling in the photoresist. Both high contrast and large image depth are crucial for practical application of plasmonic lithography.
Department of Electrical Engineering and Computer Science, C-PHOM, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109, USA.
Peng
P
Zhu
Haofei
H
Shi
L Jay
LJ
Guo
D003198:Computer Simulation; D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008027:Light; D008670:Metals / Q000737:chemistry*; D008962:Models, Theoretical; D012031:Refractometry / Q000295:instrumentation*; D012542:Scattering, Radiation; D020349:Surface Plasmon Resonance / Q000295:instrumentation* / Q000379:methods*
D008670:Metals