title: Lithography-free sub-100 nm nanocone array antireflection layer for low-cost silicon solar cell.
abstract: A high-density and -uniformity sub-100 nm surface-oxidized silicon nanocone forest structure is created and integrated onto the existing texturization microstructures on a photovoltaic device surface by a one-step high-throughput plasma-enhanced texturization method. We suppressed the broadband optical reflection on chemically textured grade-B silicon solar cells for up to 70.25% through this nanomanufacturing method. The performance of the solar cell is improved with the short-circuit current increased by 7.1%, fill factor increased by 7.0%, and conversion efficiency increased by 14.66%. Our method demonstrates the potential to improve the photovoltaic device performance with low-cost and high-throughput nanomanufacturing technology.
authors: Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA.
authors: Zhida
authors: Z
authors: Xu
authors: Jing
authors: J
authors: Jiang
authors: Gang Logan
authors: GL
authors: Liu