title: The role played by oxygen plasma on Teflon: relevance to the concept of "cryptoelectrons".
abstract: Dr Williams (AIP Adv., 2012, 2, 010701) suggested that cleaning Teflon by high pressure oxygen plasma may have affected our result that Cu(2+) and Pd(2+) ions can be absorbed but not chemically reduced by a Teflon surface rubbed by PMMA (Phys. Chem. Chem. Phys., 2012, 14, 5551). In response, we show that this treatment does not affect the adsorption of Cu(2+) and Pd(2+). We reaffirm our statement that Cu(2+) and Pd(2+) ions can be adsorbed by a Teflon surface only after rubbing with the organic polymers, not before rubbing.
authors: Dept of Materials and Interfaces, Rehovot, 76100, Israel.
authors: Silvia
authors: S
authors: Piperno
authors: Hagai
authors: H
authors: Cohen
authors: Tatyana
authors: T
authors: Bendikov
authors: Meir
authors: M
authors: Lahav
authors: Igor
authors: I
authors: Lubomirsky