title: Actinic microscope for extreme ultraviolet lithography photomask inspection and review.
abstract: Two dual-configuration extreme ultraviolet (EUV, 13.5nm wavelength) optical designs are described as a means to overcome principal EUV photomask metrology challenges. Semiconductor industry-wide efforts to define performance requirements and create standalone tools that can be used to discover, review, and accurately locate phase, amplitude, and mask pattern defects are described. The reference designs co-optimize low and high magnification configurations for orthogonal chief ray planes to avoid inspection and review trade-offs and emulate the aerial image of a lithography scanner.
authors: SEMATECH, Suite 2200, 257 Fuller Road, Albany, New York 12203, USA. michael.goldstein@sematech.org
authors: Michael
authors: M
authors: Goldstein
authors: Patrick
authors: P
authors: Naulleau