title: Role of self-assembled monolayer passivation in electrical transport properties and flicker noise of nanowire transistors.
abstract: Semiconductor nanowires have achieved great attention for integration in next-generation electronics. However, for nanowires with diameters comparable to the Debye length, which would generally be required for one-dimensional operation, surface states degrade the device performance and increase the low-frequency noise. In this study, single In(2)O(3) nanowire transistors were fabricated and characterized before and after surface passivation with a self-assembled monolayer of 1-octadecanethiol (ODT). Electrical characterization of the transistors shows that device performance can be enhanced upon ODT passivation, exhibiting steep subthreshold slope (~64 mV/dec), near zero threshold voltage (~0.6 V), high mobility (~624 cm(2)/V·s), and high on-currents (~40 μA). X-ray photoelectron spectroscopy studies of the ODT-passivated nanowires indicate that the molecules are bound to In(2)O(3) nanowires through the thiol linkages. Device simulations using a rectangular geometry to represent the nanowire indicate that the improvement in subthreshold slope and positive shift in threshold voltage can be explained in terms of reduced interface trap density and changes in fixed charge density. Flicker (low-frequency, 1/f) noise measurements show that the noise amplitude is reduced following passivation. The interface trap density before and after ODT passivation is profiled throughout the band gap energy using the subthreshold current-voltage characteristics and is compared to the values extracted from the low-frequency noise measurements. The results indicate that self-assembled monolayer passivation is a promising optimization technology for the realization of low-power, low-noise, and fast-switching applications such as logic, memory, and display circuitry.
authors: School of Electrical and Computer Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, USA.
authors: Seongmin
authors: S
authors: Kim
authors: Patrick D
authors: PD
authors: Carpenter
authors: Rand K
authors: RK
authors: Jean
authors: Haitian
authors: H
authors: Chen
authors: Chongwu
authors: C
authors: Zhou
authors: Sanghyun
authors: S
authors: Ju
authors: David B
authors: DB
authors: Janes
mesh_terms: D003198:Computer Simulation; D017076:Computer-Aided Design; D004579:Electron Transport; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008422:Materials Testing; D008956:Models, Chemical; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D059629:Signal-To-Noise Ratio; D014173:Transistors, Electronic