title: Nanopatterning by direct-write atomic layer deposition.
abstract: A novel direct-write approach is presented, which relies on area-selective atomic layer deposition on seed layer patterns deposited by electron beam induced deposition. The method enables the nanopatterning of high-quality material with a lateral resolution of only ∼10 nm. Direct-write ALD is a viable alternative to lithography-based patterning with a better compatibility with sensitive nanomaterials.
authors: Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands. a.j.m.mackus@tue.nl
authors: A J M
authors: AJ
authors: Mackus
authors: S A F
authors: SA
authors: Dielissen
authors: J J L
authors: JJ
authors: Mulders
authors: W M M
authors: WM
authors: Kessels