title: Self-aligned, extremely high frequency III-V metal-oxide-semiconductor field-effect transistors on rigid and flexible substrates.
abstract: This paper reports the radio frequency (RF) performance of InAs nanomembrane transistors on both mechanically rigid and flexible substrates. We have employed a self-aligned device architecture by using a T-shaped gate structure to fabricate high performance InAs metal-oxide-semiconductor field-effect transistors (MOSFETs) with channel lengths down to 75 nm. RF measurements reveal that the InAs devices made on a silicon substrate exhibit a cutoff frequency (f(t)) of ∼165 GHz, which is one of the best results achieved in III-V MOSFETs on silicon. Similarly, the devices fabricated on a bendable polyimide substrate provide a f(t) of ∼105 GHz, representing the best performance achieved for transistors fabricated directly on mechanically flexible substrates. The results demonstrate the potential of III-V-on-insulator platform for extremely high-frequency (EHF) electronics on both conventional silicon and flexible substrates.
authors: Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, USA.
authors: Chuan
authors: C
authors: Wang
authors: Jun-Chau
authors: JC
authors: Chien
authors: Hui
authors: H
authors: Fang
authors: Kuniharu
authors: K
authors: Takei
authors: Junghyo
authors: J
authors: Nah
authors: E
authors: E
authors: Plis
authors: Sanjay
authors: S
authors: Krishna
authors: Ali M
authors: AM
authors: Niknejad
authors: Ali
authors: A
authors: Javey