Epitaxial graphene nanoribbon array fabrication using BCP-assisted nanolithography.
A process for fabricating dense graphene nanoribbon arrays using self-assembled patterns of block copolymers on graphene grown epitaxially on SiC on the wafer scale has been developed. Etching masks comprising long and straight nanoribbon array structures with linewidths as narrow as 10 nm were fabricated, and the patterns were transferred to graphene. Our process combines both top-down and self-assembly steps to fabricate long graphene nanoribbon arrays with low defect counts. These are the narrowest nanoribbon arrays of epitaxial graphene on SiC fabricated to date.
IBM T. J. Watson Research Center, Yorktown Heights, New York 10598, USA.
Guanxiong
G
Liu
Yanqing
Y
Wu
Yu-Ming
YM
Lin
Damon B
DB
Farmer
John A
JA
Ott
John
J
Bruley
Alfred
A
Grill
Phaedon
P
Avouris
Dirk
D
Pfeiffer
Alexander A
AA
Balandin
Christos
C
Dimitrakopoulos
D017554:Carbon Compounds, Inorganic / Q000737:chemistry* / Q000528:radiation effects; D003460:Crystallization / Q000379:methods*; D006108:Graphite / Q000737:chemistry* / Q000528:radiation effects; D046911:Macromolecular Substances / Q000737:chemistry / Q000528:radiation effects; D008422:Materials Testing; D008968:Molecular Conformation / Q000528:radiation effects; D054802:Molecular Imprinting / Q000379:methods*; D049329:Nanostructures / Q000737:chemistry* / Q000528:radiation effects / Q000648:ultrastructure*; D010316:Particle Size; D010781:Photography / Q000379:methods*; D017655:Silicon Compounds / Q000737:chemistry* / Q000528:radiation effects; D013499:Surface Properties / Q000528:radiation effects
D017554:Carbon Compounds, Inorganic; D046911:Macromolecular Substances; D017655:Silicon Compounds; D006108:Graphite; C022088:silicon carbide