Polymer pen lithography using dual-elastomer tip arrays.
Dual-elastomer tip arrays are developed as a simple and cost-effective approach to significantly improve the uniformity and precision of polymer pen lithography (PPL). Both experiment and mechanical simulation demonstrate that the hard-apex, soft-base tip structure of the dual-elastomer tip array leads to precise control of feature size and reduced variation among different tips over large areas through fine control of the tip deformation. The dual-elastomer tip array is believed to be readily applied to fabricate nano- and microstructures for fundamental study and applications such as bioassays, sensors, optical and electronic devices.
Nanotechnology Center, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong SAR, China.
Zhuang
Z
Xie
Youde
Y
Shen
Xuechang
X
Zhou
Yong
Y
Yang
Qing
Q
Tang
Qian
Q
Miao
Jing
J
Su
Hongkai
H
Wu
Zijian
Z
Zheng