title: Determination of n-octanol/water partition coefficients of weak ionizable solutes by RP-HPLC with neutral model compounds.
abstract: The utilization of neutral compounds as model compounds is put forward for determination of the n-octanol/water partition coefficient (K(ow)) of highly hydrophobic, weak acidic compounds by reversed-phase high performance liquid chromatography (RP-HPLC). It is based on a linear relationship between the logarithm of apparent n-octanol/water partition coefficient (log K(ow)″), expressing hydrophobicity of acidic solutes more accurately, and the logarithm of RP-HPLC retention factor of the solutes corresponding to the neat aqueous fraction of mobile phase (log k(w)). The availability of neutral model compounds was theoretically tested for this novel protocol. Moreover, a high consistency of linear log K(ow)″-log k(w) correlations was demonstrated between a mixed training set of neutral and acidic model compounds, and a training set of neutral model compounds. It is proved in theory that for a certain set of compounds investigated, all derived linear relationships between log K(ow)″ and log k(w) have a unit slope and the same intercept, regardless of mobile phase pH. This model was applied to measure log K(ow) of lipophilic aristolochic acid I (AA I) and aristolochic acid II (AA II). Log K(ow) values for AA I and AA II are 4.45±0.07 and 3.99±0.06, respectively. To the best of our knowledge, this is the first report on experimental log K(ow) data for AAs. The proposed strategy solves the problem of lacking suitable acidic model compounds with reliable experimental K(ow) in determining K(ow) of lipophilic acidic solutes by RP-HPLC.
authors: State Key Laboratory of Analytical Chemistry for Life Science, School of Chemistry & Chemical Engineering and Center of Materials Analysis, Nanjing University, 22 Hankou Road, Nanjing 210093, China.
authors: Shu-ying
authors: SY
authors: Han
authors: Jun-qin
authors: JQ
authors: Qiao
authors: Yun-yang
authors: YY
authors: Zhang
authors: Hong-zhen
authors: HZ
authors: Lian
authors: Xin
authors: X
authors: Ge