title: EDS measurements of X-ray intensity at WDS precision and accuracy using a silicon drift detector.
abstract: The accuracy and precision of X-ray intensity measurements with a silicon drift detector (SDD) are compared with the same measurements performed on a wavelength dispersive spectrometer (WDS) for a variety of elements in a variety of materials. In cases of major (>0.10 mass fraction) and minor (>0.01 mass fraction) elements, the SDD is demonstrated to perform as well or better than the WDS. This is demonstrated both for simple cases in which the spectral peaks do not interfere (SRM-481, SRM-482, and SRM-479a), and for more difficult cases in which the spectral peaks have significant interferences (the Ba L/Ti K lines in a series of Ba/Ti glasses and minerals). We demonstrate that even in the case of significant interference high count SDD spectra are capable of accurately measuring Ti in glasses with Ba:Ti mass fraction ratios from 2.7:1 to 23.8:1. The results suggest that for many measurements wavelength spectrometry can be replaced with an SDD with improved accuracy and precision.
authors: Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899-8372, USA. nicholas.ritchie@nist.gov
authors: Nicholas W M
authors: NW
authors: Ritchie
authors: Dale E
authors: DE
authors: Newbury
authors: Jeffrey M
authors: JM
authors: Davis