title: Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method.
abstract: A method for fabrication of three-dimensional (3D) silicon nanostructures based on selective formation of porous silicon using ion beam irradiation of bulk p-type silicon followed by electrochemical etching is shown. It opens a route towards the fabrication of two-dimensional (2D) and 3D silicon-based photonic crystals with high flexibility and industrial compatibility. In this work, we present the fabrication of 2D photonic lattice and photonic slab structures and propose a process for the fabrication of 3D woodpile photonic crystals based on this approach. Simulated results of photonic band structures for the fabricated 2D photonic crystals show the presence of TE or TM gap in mid-infrared range.
authors: Centre For Ion Beam Applications (CIBA), Department Of Physics, National University Of Singapore, Singapore, 117542, Singapore. rongmeijiaoyin@gmail.com.
authors: Zhiya
authors: Z
authors: Dang
authors: Mark Bh
authors: MB
authors: Breese
authors: Gonzalo
authors: G
authors: Recio-Sánchez
authors: Sara
authors: S
authors: Azimi
authors: Jiao
authors: J
authors: Song
authors: Haidong
authors: H
authors: Liang
authors: Agnieszka
authors: A
authors: Banas
authors: Vicente
authors: V
authors: Torres-Costa
authors: Raúl José
authors: RJ
authors: Martín-Palma