title: Continuous phase-shift lithography with a roll-type mask and application to transparent conductor fabrication.
abstract: We report the development of a near-field optical nanolithography method using a roll-type phase-shift mask. Sub-wavelength resolution is achieved using near-field exposure of photoresist through a cylindrical phase mask, allowing dynamic and high throughput continuous patterning. As an application, we present the fabrication of a transparent electrode in the form of a metallic wire grid by using the roller-based optical lithography method. To fabricate a mesh-type metal pattern, a specific phase-shift mask was designed and critical experimental parameters were also studied. As a result, a transparent conductor with suitable properties was achieved with a recently built cylindrical phase-shift lithography prototype designed to pattern on 100 mm(2) of substrate area.
authors.affiliation: Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI 48109, USA.
authors.forename: Moon Kyu
authors.initials: MK
authors.lastname: Kwak
authors.forename: Jong G
authors.initials: JG
authors.lastname: Ok
authors.forename: Jae Yong
authors.initials: JY
authors.lastname: Lee
authors.forename: L Jay
authors.initials: LJ
authors.lastname: Guo