title: Plasmonic properties of aluminum nanorings generated by double patterning.
abstract: In this Letter we evaluate a technique for the efficient and flexible generation of aluminum nanorings based on double patterning and variable shaped electron beam lithography. The process is demonstrated by realizing nanorings with diameters down to 90 nm and feature sizes of 30 nm utilizing a writing speed of one ring per microsecond. Because of redepositions caused by involved etching processes, the material of the rings and, therefore, the impact on the plasmonic properties, are unknown. This issue, which is commonly encountered when metals are nanostructured, is solved by adapting a realistic simulation model that accounts for geometry details and effective material properties. Based on this model, the redepositions are quantified, the plasmonic properties are investigated, and a design tool for the very general class of nanofabrication techniques involving the etching of metals is provided.
authors.affiliation: Institute of Applied Physics, Friedrich-Schiller-Universität Jena, Jena, Germany. dennis.lehr@uni-jena.de
authors.forename: Dennis
authors.initials: D
authors.lastname: Lehr
authors.forename: Kay
authors.initials: K
authors.lastname: Dietrich
authors.forename: Christian
authors.initials: C
authors.lastname: Helgert
authors.forename: Thomas
authors.initials: T
authors.lastname: Käsebier
authors.forename: Hans-Jörg
authors.initials: HJ
authors.lastname: Fuchs
authors.forename: Andreas
authors.initials: A
authors.lastname: Tünnermann
authors.forename: Ernst-Bernhard
authors.initials: EB
authors.lastname: Kley