title: A novel method for effective sodium ion implantation into silicon.
abstract: Although sodium ion implantation is useful to the surface modification of biomaterials and nano-electronic materials, it is a challenging to conduct effective sodium implantation by traditional implantation methods due to its high chemical reactivity. In this paper, we present a novel method by coupling a Na dispenser with plasma immersion ion implantation and radio frequency discharge. X-ray photoelectron spectroscopy (XPS) depth profiling reveals that sodium is effectively implanted into a silicon wafer using this apparatus. The Na 1s XPS spectra disclose Na(2)O-SiO(2) bonds and the implantation effects are confirmed by tapping mode atomic force microscopy. Our setup provides a feasible way to conduct sodium ion implantation effectively.
authors.affiliation: Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong.
authors.forename: Qiu Yuan
authors.initials: QY
authors.lastname: Lu
authors.forename: Paul K
authors.initials: PK
authors.lastname: Chu
mesh_terms: D011211:Electric Power Supplies; D004595:Electroplating / Q000295:instrumentation*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D020450:Heavy Ions; D007477:Ions; D012825:Silicon / Q000737:chemistry* / Q000528:radiation effects*; D012964:Sodium / Q000737:chemistry*
chemical_list: D007477:Ions; D012964:Sodium; D012825:Silicon