title: Direct-write non-linear photolithography for semiconductor nanowire characterization.
abstract: A practical bottleneck prohibiting the rapid, confident and damage-free electrical contacting of vapour-liquid-solid grown nanowires arises from the random spatial distribution and variation in quality of the nanowires, and the contact dimensions required. Established techniques such as electron-beam lithography or focused ion-beam deposition have challenges in scaling, damage or complexity that can make a large statistical sample difficult. We present a direct laser-writing technique to allow rapid electrical contacting of nanowires on a large variety of substrates.
authors.affiliation: Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, Canberra, ACT 0200, Australia. patrick.parkinson@anu.edu.au
authors.forename: P
authors.initials: P
authors.lastname: Parkinson
authors.forename: N
authors.initials: N
authors.lastname: Jiang
authors.forename: Q
authors.initials: Q
authors.lastname: Gao
authors.forename: H H
authors.initials: HH
authors.lastname: Tan
authors.forename: C
authors.initials: C
authors.lastname: Jagadish