title: Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection.
abstract: A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5 nm) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100 nm out-of-band radiation in EUV lithography.
authors.affiliation: FOM Institute for Plasma Physics Rijnhuizen, Nieuwegein, The Netherlands. a.j.r.vandenboogaard@rijnhuizen.nl
authors.forename: A J R
authors.initials: AJ
authors.lastname: van den Boogaard
authors.forename: F A
authors.initials: FA
authors.lastname: van Goor
authors.forename: E
authors.initials: E
authors.lastname: Louis
authors.forename: F
authors.initials: F
authors.lastname: Bijkerk