Photoresponsive surface molecularly imprinted poly(ether sulfone) microfibers.
In the present study, photoresponsive surface molecularly imprinted poly(ether sulfone) microfibers are prepared via nitration reaction, the wet-spinning technique, surface nitro reduction reaction, and surface diazotation reaction for the selectively photoregulated uptake and release of 4-hydrobenzoic acid. The prepared molecularly imprinted microfibers show selective binding to 4-HA under irradiation at 450 nm and release under irradiation at 365 nm. The simple, convenient, effective, and productive method for the preparation of azo-containing photoresponsive material is also applied to the modification of polysulfone and poly(ether ether ketone). All three benzene-ring-containing polymers show significant photoresponsibility after the azo modification.
College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China.
Dongsheng
D
Wang
Xiaoxue
X
Zhang
Shengqiang
S
Nie
Weifeng
W
Zhao
Yi
Y
Lu
Shudong
S
Sun
Changsheng
C
Zhao
D054802:Molecular Imprinting; D015394:Molecular Structure; D055668:Photochemical Processes; D011108:Polymers / Q000138:chemical synthesis* / Q000737:chemistry; D013450:Sulfones / Q000138:chemical synthesis* / Q000737:chemistry; D013499:Surface Properties
D011108:Polymers; D013450:Sulfones; C022840:polyether sulfone