Graphene oxide as a monoatomic blocking layer.
Monolayer graphene oxide (mGO) is shown to effectively protect molecular thin films from reorganization and function as an atomically thin barrier for vapor-deposited Ti/Al metal top electrodes. Fragile organic Langmuir-Blodgett (LB) films of C(22) fatty acid cadmium salts (cadmium(II) behenate) were covered by a compressed mosaic LB film of mGO flakes. These hybrid LB films were examined with atomic force microscopy (AFM) and X-ray reflectivity, both with and without the metal top electrodes. While the AFM enabled surface and morphology analysis, the X-ray reflectivity allowed for a detailed structural depth profiling of the organic film and mGO layer below the metal top layers. The structure of the mGO-protected LB films was found to be perfectly preserved; in contrast, it has previously been shown that metal deposition completely destroys the first two LB layers of unprotected films. This study provides clear evidence of the efficient protection offered by a single atomic layer of GO.
Nano-Science Center & Department of Chemistry, University of Copenhagen, Copenhagen, Denmark.
Søren
S
Petersen
Magni
M
Glyvradal
Peter
P
Bøggild
Wenping
W
Hu
Robert
R
Feidenhans'l
Bo W
BW
Laursen
D003460:Crystallization / Q000379:methods*; D004553:Electric Conductivity; D004566:Electrodes; D006108:Graphite / Q000737:chemistry*; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010087:Oxides / Q000737:chemistry*; D010316:Particle Size
D010087:Oxides; D006108:Graphite