Graphene edge lithography.
Fabrication of graphene nanostructures is of importance for both investigating their intrinsic physical properties and applying them into various functional devices. In this paper, we report a scalable fabrication approach for graphene nanostructures. Compared with conventional lithographic fabrication techniques, this new approach uses graphene edges as the templates or masks and offers advantage in technological simplicity and capability of creating small features below 10 nm scale. Moreover, mask layers used in the fabrication process could be simultaneously used as the dielectric layers for top-gated devices. The as-fabricated graphene nanoribbons (GNRs) are of high quality with the carrier mobility ∼400 cm(2)/(V s) for typical 15 nm wide ribbons. Our technique allows easy and reproducible fabrication of various graphene nanostructures, such as ribbons and rings, and can be potentially extended to other materials and systems by use of their edges or facets as templates.
Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China.
Guibai
G
Xie
Zhiwen
Z
Shi
Rong
R
Yang
Donghua
D
Liu
Wei
W
Yang
Meng
M
Cheng
Duoming
D
Wang
Dongxia
D
Shi
Guangyu
G
Zhang
D003460:Crystallization / Q000379:methods*; D006108:Graphite / Q000737:chemistry*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D054802:Molecular Imprinting / Q000379:methods*; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D010781:Photography / Q000379:methods*; D013499:Surface Properties
D046911:Macromolecular Substances; D006108:Graphite