High-rotational symmetry lattices fabricated by moiré nanolithography.
This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≤12-fold) and six times higher than two-dimensional periodic lattices (≤6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.
Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.
Steven M
SM
Lubin
Wei
W
Zhou
Alexander J
AJ
Hryn
Mark D
MD
Huntington
Teri W
TW
Odom
D003460:Crystallization / Q000379:methods*; D020724:Elastomers / Q000737:chemistry*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D054802:Molecular Imprinting / Q000379:methods*; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D010781:Photography / Q000379:methods*; D012399:Rotation; D013499:Surface Properties
D020724:Elastomers; D046911:Macromolecular Substances