Edge isolation of transparent conductive polymer (TCP) thin films on flexible substrates using UV laser ablation.
The purpose of this study was to directly use the writing techniques for the complex electrode edge isolation of transparent conductive polymer (TCP) thin films by a nanosecond pulsed UV laser processing system. The processing parameters including the laser pulse energy, the pulse repetition frequency, and the scan speed of galvanometers were examined to ablate the TCP films deposited on polyethylene terephtalate substrates of 188 microm thick. The thickness of TCP films was approximately 20 nm. The laser pulse repetition frequency and the scan speed of galvanometers were applied to calculate the overlapping rate of laser spots and to discuss the patterning region quality. Surface morphology, edge quality, and width and depth of edge isolated patterning structures after laser ablation process were measured by a three-dimensional confocal laser scanning microscope. In addition, the electrical conductivity of ablated TCP films was measured by a four-point probes instrument. After isolated line patterning was formed, the ablated TCP films with a better edge quality were obtained directly when the overlapping rate of laser spots, the scan speed, and the pulse repetition rate were 83.3%, 200 mm/s, and 40 kHz, respectively. The better surface morphology of electrode pattern structures was also obtained when the scan speed and the pulse repetition rate were 500 mm/s and 40 kHz, respectively.
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan.
Wen-Tse
WT
Hsiao
Shih-Feng
SF
Tseng
Kuo-Cheng
KC
Huang
Donyau
D
Chiang
Ming-Fei
MF
Chen
D003460:Crystallization / Q000379:methods*; D055119:Elastic Modulus / Q000528:radiation effects; D004553:Electric Conductivity; D046911:Macromolecular Substances / Q000737:chemistry / Q000528:radiation effects; D008422:Materials Testing; D008567:Membranes, Artificial; D008968:Molecular Conformation / Q000528:radiation effects; D049329:Nanostructures / Q000737:chemistry* / Q000528:radiation effects / Q000648:ultrastructure*; D010316:Particle Size; D011108:Polymers / Q000737:chemistry* / Q000528:radiation effects*; D013499:Surface Properties / Q000528:radiation effects; D014466:Ultraviolet Rays
D046911:Macromolecular Substances; D008567:Membranes, Artificial; D011108:Polymers