Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films.
Block copolymer nanolithography has been extended to the nanopatterning of organic functionalities on pyrolyzed photoresist carbon films (PPFs) via diazonium chemistry, using PS-b-P4VP as the template.
Key Laboratory of Molecular Nanostructure and Nanotechnology, Institute of Chemistry, the Chinese Academy of Sciences, Beijing 100190, China.
Xin
X
Deng
Jillian M
JM
Buriak
Pei-Xia
PX
Dai
Li-Jun
LJ
Wan
Dong
D
Wang
D002244:Carbon / Q000737:chemistry*; D003979:Diazonium Compounds / Q000737:chemistry; D015394:Molecular Structure; D036103:Nanotechnology; D011137:Polystyrenes / Q000737:chemistry*; D011145:Polyvinyls / Q000737:chemistry*; D011725:Pyridines / Q000737:chemistry*; D013499:Surface Properties
D003979:Diazonium Compounds; D011137:Polystyrenes; D011145:Polyvinyls; D011725:Pyridines; C509607:polystyrene-block-poly(4-vinylpyridine); C009139:pyrolytic carbon; D002244:Carbon