Nanoscale patterning of colloidal quantum dots on transparent and metallic planar surfaces.
The patterning of colloidal quantum dots with nanometer resolution is essential for their application in photonics and plasmonics. Several patterning approaches, such as the use of polymer composites, molecular lock-and-key methods, inkjet printing and microcontact printing of quantum dots have been recently developed. Herein, we present a simple method of patterning colloidal quantum dots for photonic nanostructures such as straight lines, rings and dot patterns either on transparent or metallic substrates. Sub-10 nm width of the patterned line could be achieved with a well-defined sidewall profile. Using this method, we demonstrate a surface plasmon launcher from a quantum dot cluster in the visible spectrum.
Frontier Research Laboratory, Samsung Advanced Institute of Technology, Yongin-si, Gyeonggi-do, Republic of Korea.
Yeonsang
Y
Park
Young-Geun
YG
Roh
Un Jeong
UJ
Kim
Dae-Young
DY
Chung
Hwansoo
H
Suh
Jineun
J
Kim
Sangmo
S
Cheon
Jaesoong
J
Lee
Tae-Ho
TH
Kim
Kyung-Sang
KS
Cho
Chang-Won
CW
Lee