title: Site-specific and patterned growth of TiO2 nanotube arrays from e-beam evaporated thin titanium film on Si wafer.
abstract: Growth of TiO(2) nanotubes on thin Ti film deposited on Si wafers with site-specific and patterned growth using a photolithography technique is demonstrated for the first time. Ti films were deposited via e-beam evaporation to a thickness of 350-1000 nm. The use of a fluorinated organic electrolyte at room temperature produced the growth of nanotubes with varying applied voltages of 10-60 V (DC) which remained stable after annealing at 500 °C. It was found that variation of the thickness of the deposited Ti film could be used to control the length of the nanotubes regardless of longer anodization time/voltage. Growth of the nanotubes on a SiO(2) barrier layer over a Si wafer, along with site-specific and patterned growth, enables potential application of TiO(2) nanotubes in NEMS/MEMS-type devices.
authors.affiliation: Electrical and Computer Engineering Department, University of Utah, Salt Lake City, UT 84112, USA.
authors.forename: Karumbaiah N
authors.initials: KN
authors.lastname: Chappanda
authors.forename: York R
authors.initials: YR
authors.lastname: Smith
authors.forename: Mano
authors.initials: M
authors.lastname: Misra
authors.forename: Swomitra K
authors.initials: SK
authors.lastname: Mohanty
mesh_terms: D003460:Crystallization / Q000379:methods*; D005740:Gases / Q000737:chemistry; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008567:Membranes, Artificial; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties; D014025:Titanium / Q000737:chemistry*
chemical_list: D005740:Gases; D046911:Macromolecular Substances; D008567:Membranes, Artificial; C009495:titanium dioxide; D014025:Titanium; D012825:Silicon