title: Concentration gradient induced morphology evolution of silica nanostructure growth on photoresist-derived carbon micropatterns.
abstract: The evolution of silica nanostructure morphology induced by local Si vapor source concentration gradient has been investigated by a smart design of experiments. Silica nanostructure or their assemblies with different morphologies are obtained on photoresist-derived three-dimensional carbon microelectrode array. At a temperature of 1,000°C, rope-, feather-, and octopus-like nanowire assemblies can be obtained along with the Si vapor source concentration gradient flow. While at 950°C, stringlike assemblies, bamboo-like nanostructures with large joints, and hollow structures with smaller sizes can be obtained along with the Si vapor source concentration gradient flow. Both vapor-liquid-solid and vapor-quasiliquid-solid growth mechanisms have been applied to explain the diverse morphologies involving branching, connecting, and batch growth behaviors. The present approach offers a potential method for precise design and controlled synthesis of nanostructures with different features.
authors.affiliation: Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China. zirong@mail.hust.edu.cn.
authors.forename: Dan
authors.initials: D
authors.lastname: Liu
authors.forename: Tielin
authors.initials: T
authors.lastname: Shi
authors.forename: Shuang
authors.initials: S
authors.lastname: Xi
authors.forename: Wuxing
authors.initials: W
authors.lastname: Lai
authors.forename: Shiyuan
authors.initials: S
authors.lastname: Liu
authors.forename: Xiaoping
authors.initials: X
authors.lastname: Li
authors.forename: Zirong
authors.initials: Z
authors.lastname: Tang