title: Defect-tolerant extreme ultraviolet nanoscale printing.
abstract: We present a defect-free lithography method for printing periodic features with nanoscale resolution using coherent extreme ultraviolet light. This technique is based on the self-imaging effect known as the Talbot effect, which is produced when coherent light is diffracted by a periodic mask. We present a numerical simulation and an experimental verification of the method with a compact extreme ultraviolet laser. Furthermore, we explore the extent of defect tolerance by testing masks with different defect layouts. The experimental results are in good agreement with theoretical calculations.
authors.affiliation: Engineering Research Center for Extreme Ultraviolet Science and Technology, and Electrical and Computer Engineering Department, Colorado State University, Fort Collins, Colorado 80523, USA. urbanski@engr.colostate.edu
authors.forename: L
authors.initials: L
authors.lastname: Urbanski
authors.forename: A
authors.initials: A
authors.lastname: Isoyan
authors.forename: A
authors.initials: A
authors.lastname: Stein
authors.forename: J J
authors.initials: JJ
authors.lastname: Rocca
authors.forename: C S
authors.initials: CS
authors.lastname: Menoni
authors.forename: M C
authors.initials: MC
authors.lastname: Marconi