title: Field electron emission from hydrogen plasma treated nano-ZnO thin films.
abstract: A nano-Zno films are deposited on the Mo film/ceramic substrates by using the electron beam vapor deposition technique. Then a hydrogen plasma treated method is used to improve the characteristics of ZnO thin films by microwave plasma chemical vapor deposition system. Effects of process parameters on morphologies and structures of the ZnO thin films are detected and analysed by field emission scanning electron microscopy, X-ray diffraction spectrum and energy dispersive spectrum. The experimental result indicates that the hydrogen plasma treated techniques can essentially reduce the surface resistance and improve the field emission current density of the nano-ZnO thin films. For the hydrogen plasma treated sample, its field emission current density can increased more than three times at 2.2 V/microm electric field condition.
authors.affiliation: College of Science, University of Shanghai for Science and Technology, Shanghai, 200093, China.
authors.forename: Xiao-Ping
authors.initials: XP
authors.lastname: Wang
authors.forename: Xin-Xin
authors.initials: XX
authors.lastname: Liu
authors.forename: Li-Jun
authors.initials: LJ
authors.lastname: Wang
authors.forename: Huai-Hui
authors.initials: HH
authors.lastname: Li
authors.forename: Cui-Yu
authors.initials: CY
authors.lastname: Mei
authors.forename: Xiao-Fei
authors.initials: XF
authors.lastname: Liu
authors.forename: Yang
authors.initials: Y
authors.lastname: Can