title: Field emission properties of carbon nanotube arrays on the thickness-controlled flexible substrate by the pattern transfer process.
abstract: A technigal with the polydimethylsiloxane (PDMS) solution infiltrated into the SiOx-coated CNTAs has been utilized to directly transfer the CNTAs away from the silicon substrate. The oxide coating layer was utilized to protect the morpholgy of as-grown patterned vertical aligmed carbon nanotube (CNTs) arrays. The high density plasma reactive ions etching (HDP-RIE) system was used to make the CNTs emerge from the surface of the flexible substrate and modify the crystallines of CNTs. After the protecting oxide was HDP-RIE-processed for 8 min, the emission current properties were enhanced to be 1.03 V/microm and 1.43 V/microm, respectively, for the turn-on field and the threshold field, as compared with 1.25 V/microm and 1.59 V/microm for the as-grown CNTs, accordingly. The Field Emission (FE) enhancement after dry etching could be attributed to the open-ended structures and better crystalline.
authors.affiliation: Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University, Hsinchu, Taiwan 300, ROC.
authors.forename: Chia-Tsung
authors.initials: CT
authors.lastname: Chang
authors.forename: Chuan-Ping
authors.initials: CP
authors.lastname: Juan
authors.forename: Yi-Chan
authors.initials: YC
authors.lastname: Lin
authors.forename: Yu-Ren
authors.initials: YR
authors.lastname: Li
authors.forename: Wan-Lin
authors.initials: WL
authors.lastname: Tsai
authors.forename: Po-Yu
authors.initials: PY
authors.lastname: Yang
authors.forename: I-Che
authors.initials: IC
authors.lastname: Lee
authors.forename: Huang-Chung
authors.initials: HC
authors.lastname: Cheng