title: Tailored star block copolymer architecture for high performance chemically amplified resists.
abstract: Star block copolymers are demonstrated for their application as a high-performance resist material. This new resist material shows advanced progress in sensitivity and solubility contrast and is finally combinatorially optimized to achieve a 66 nm line/space pattern. The tailored molecular architecture of the star block copolymer is synthesized via core-first atom transfer radical polymerization (ATRP) and shows narrow polydispersity indices below 1.2.
authors.affiliation: Makromolekulare Chemie I, Bayreuther Institut für Makromolekülforschung (BIMF) and Bayreuther Zentrum für Kolloide und Grenzflächen (BZKG), Universität Bayreuth, 95440 Bayreuth, Germany.
authors.forename: Florian
authors.initials: F
authors.lastname: Wieberger
authors.forename: Christian
authors.initials: C
authors.lastname: Neuber
authors.forename: Christopher K
authors.initials: CK
authors.lastname: Ober
authors.forename: Hans-Werner
authors.initials: HW
authors.lastname: Schmidt
mesh_terms: D008422:Materials Testing; D011108:Polymers / Q000737:chemistry*; D012995:Solubility
chemical_list: D011108:Polymers