title: Embossing of organic thin films using a surfactant assisted lift-off technique.
abstract: A simple technique for patterning organic materials using a surfactant assisted lift-off method is proposed. Thin films of various organic materials are prepared, and areas in contact with a surfactant coated poly(dimethylsiloxane) (PDMS) stamp are selectively removed. The general applicability of this technique is shown for materials containing nitrate, amine, and carboxylic acid functional groups. This technique provides a new methodology for fabricating patterns with vertical dimensions ranging from 30 nm up to 3 μm on organic thin films with specific functional groups.
authors.affiliation: Department of Chemical Engineering, Texas Tech University, Lubbock, TX 79409, United States.
authors.forename: Xin
authors.initials: X
authors.lastname: Zhang
authors.forename: Gengxin
authors.initials: G
authors.lastname: Zhang
authors.forename: Yen-Chih
authors.initials: YC
authors.lastname: Liao
authors.forename: Brandon L
authors.initials: BL
authors.lastname: Weeks
authors.forename: Zhao
authors.initials: Z
authors.lastname: Zhang
mesh_terms: D000588:Amines / Q000737:chemistry; D002264:Carboxylic Acids / Q000737:chemistry; D004129:Dimethylpolysiloxanes / Q000737:chemistry*; D049329:Nanostructures / Q000737:chemistry; D009566:Nitrates / Q000737:chemistry; D013499:Surface Properties; D013501:Surface-Active Agents / Q000737:chemistry*
chemical_list: D000588:Amines; D002264:Carboxylic Acids; D004129:Dimethylpolysiloxanes; D009566:Nitrates; D013501:Surface-Active Agents; C013830:baysilon