title: Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference.
abstract: In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939.
authors.affiliation: Centre for Optical and Laser Engineering (COLE), School of Mechanical and Aerospace Engineering, Nanyang Technological University, Singapore 639798.
authors.forename: R
authors.initials: R
authors.lastname: Sidharthan
authors.forename: V M
authors.initials: VM
authors.lastname: Murukeshan
authors.forename: K
authors.initials: K
authors.lastname: Sathiyamoorthy