title: Tuning the conditions for the deposition of nanocrystalline diamond by hot filament chemical vapour deposition.
abstract: Although large focus has been placed into the deposition of nanocrystalline and ultra-nanocrystalline diamond films, most of this research uses microwave plasma assisted CVD systems. However, the growth conditions used in microwave systems cannot be directly used in hot-filament CVD systems. This paper, aims to enlarge the knowledge of the diamond film depositing process. H2/CH4/Ar gas mixtures have been used to deposit micro, nano and ultra-nanocrystalline diamond films by hot-filament CVD systems. Additionally, the distance between the filaments array and the substrate was varied, in order to observe its effect and consequently the effect of a lower substrate temperature in the nucleation density and deposition. All the samples were characterized for microstructure and quality, using scanning electron microscopy and Raman spectroscopy.
authors.affiliation: Department of Mechanical Engineering, Centre for Mechanical Technology and Automation, University of Aveiro, Campus Universitário de Santiago, 3810-193 Aveiro, Portugal.
authors.forename: J A
authors.initials: JA
authors.lastname: Santos
authors.forename: Samaneh
authors.initials: S
authors.lastname: Ranjbar
authors.forename: V F
authors.initials: VF
authors.lastname: Neto
authors.forename: D
authors.initials: D
authors.lastname: Ruch
authors.forename: J
authors.initials: J
authors.lastname: Grácio