title: Optimization of chemical structure of Schottky-type selection diode for crossbar resistive memory.
abstract: The electrical performances of Pt/TiO(2)/Ti/Pt stacked Schottky-type diode (SD) was systematically examined, and this performance is dependent on the chemical structures of the each layer and their interfaces. The Ti layers containing a tolerable amount of oxygen showed metallic electrical conduction characteristics, which was confirmed by sheet resistance measurement with elevating the temperature, transmission line measurement (TLM), and Auger electron spectroscopy (AES) analysis. However, the chemical structure of SD stack and resulting electrical properties were crucially affected by the dissolved oxygen concentration in the Ti layers. The lower oxidation potential of the Ti layer with initially higher oxygen concentration suppressed the oxygen deficiency of the overlying TiO(2) layer induced by consumption of the oxygen from TiO(2) layer. This structure results in the lower reverse current of SDs without significant degradation of forward-state current. Conductive atomic force microscopy (CAFM) analysis showed the current conduction through the local conduction paths in the presented SDs, which guarantees a sufficient forward-current density as a selection device for highly integrated crossbar array resistive memory.
authors.affiliation: WCU Hybrid Materials Program, Department of Materials Science and Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-744, Korea.
authors.forename: Gun Hwan
authors.initials: GH
authors.lastname: Kim
authors.forename: Jong Ho
authors.initials: JH
authors.lastname: Lee
authors.forename: Woojin
authors.initials: W
authors.lastname: Jeon
authors.forename: Seul Ji
authors.initials: SJ
authors.lastname: Song
authors.forename: Jun Yeong
authors.initials: JY
authors.lastname: Seok
authors.forename: Jung Ho
authors.initials: JH
authors.lastname: Yoon
authors.forename: Kyung Jean
authors.initials: KJ
authors.lastname: Yoon
authors.forename: Tae Joo
authors.initials: TJ
authors.lastname: Park
authors.forename: Cheol Seong
authors.initials: CS
authors.lastname: Hwang