title: Block copolymer films with free interfaces: ordering by nanopatterned substrates.
abstract: We study block copolymers (BCPs) on patterned substrates, where the top polymer film surface is not constrained but is free and can adapt its shape self-consistently. In particular, we investigate the combined effect of free interface undulations with wetting of the BCP film as induced by nanopatterned substrates. Under wetting conditions and for a finite volume of BCP material, we find equilibrium droplets composed of coexisting perpendicular and parallel lamellar domains. The self-assembly of BCPs on topographic patterned substrates is also investigated and it is found that the free interface induces mixed morphologies of parallel and perpendicular domains coupled with a nonflat free interface. Our study has some interesting consequences for experimental setups of graphoepitaxy and nanoimprint lithography.
authors.affiliation: Raymond and Beverly Sackler School of Physics and Astronomy, Tel Aviv University, Ramat Aviv 69978, Tel Aviv, Israel.
authors.forename: Xingkun
authors.initials: X
authors.lastname: Man
authors.forename: David
authors.initials: D
authors.lastname: Andelman
authors.forename: Henri
authors.initials: H
authors.lastname: Orland
mesh_terms: D003198:Computer Simulation; D003460:Crystallization / Q000379:methods*; D008956:Models, Chemical; D008958:Models, Molecular; D053758:Nanoparticles / Q000737:chemistry* / Q000648:ultrastructure*; D011108:Polymers / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D011108:Polymers