title: Pitch-tunable size reduction patterning with a temperature-memory polymer.
abstract: A scalable and pitch-tunable size reduction patterning method is introduced by exploiting the temperature memory effect of shape memory polymer and replica molding of UV-curable materials.
authors.affiliation: Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea.
authors.forename: Won-Gyu
authors.initials: WG
authors.lastname: Bae
authors.forename: Jae Hoon
authors.initials: JH
authors.lastname: Choi
authors.forename: Kahp Y
authors.initials: KY
authors.lastname: Suh