title: Initiated chemical vapor deposition-based method for patterning polymer and metal microstructures on curved substrates.
abstract: A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning. Additionally, vapor-deposited polymer layers are selectively patterned to produce bifunctional surfaces.
authors.affiliation: Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA.
authors.forename: Christy D
authors.initials: CD
authors.lastname: Petruczok
authors.forename: Karen K
authors.initials: KK
authors.lastname: Gleason
mesh_terms: D005231:Fatty Acids, Unsaturated / Q000737:chemistry*; D019216:Metals, Heavy / Q000737:chemistry*; D015394:Molecular Structure; D010316:Particle Size; D000078789:Polyacetylene Polymer; D011108:Polymers / Q000737:chemistry*; D011145:Polyvinyls / Q000737:chemistry*; D053279:Polyynes / Q000737:chemistry*; D013499:Surface Properties; D014835:Volatilization
chemical_list: C434762:10,12-tricosadiynoic acid; D005231:Fatty Acids, Unsaturated; D019216:Metals, Heavy; D000078789:Polyacetylene Polymer; D011108:Polymers; D011145:Polyvinyls; D053279:Polyynes; C019535:poly(4-vinylpyridine); C082361:polydiacetylene