title: Sub-Rayleigh lithography using high flux loss-resistant entangled states of light.
abstract: Quantum lithography achieves phase superresolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable with reduced use of quantum resources and, consequently, enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of a spontaneous parametric down-converted entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the nonclassical light required for creating NOON states.
authors.affiliation: Department of Physics of Complex Systems, Weizmann Institute of Science, Rehovot, 76100 Israel.
authors.forename: Shamir
authors.initials: S
authors.lastname: Rosen
authors.forename: Itai
authors.initials: I
authors.lastname: Afek
authors.forename: Yonatan
authors.initials: Y
authors.lastname: Israel
authors.forename: Oron
authors.initials: O
authors.lastname: Ambar
authors.forename: Yaron
authors.initials: Y
authors.lastname: Silberberg