title: Anomalous potential dependence in homoepitaxial Cu(001) electrodeposition: an in situ surface x-ray diffraction study.
abstract: Homoepitaxial Cu electrodeposition on Cu(001) in chloride-containing electrolyte was studied by time-resolved in situ surface x-ray diffraction at growth rates up to 38 ML/ min. With increasing Cu electrode potential, transitions from step-flow to layer-by-layer and then to multilayer growth are observed. This potential dependence is opposite to that expected theoretically and found experimentally for the Au(001) homoepitaxial electrodeposition [K. Krug et al., Phys. Rev. Lett. 96, 246101 (2006)]. The anomalous behavior is rationalized by a decisive influence of the ordered c(2 × 2)-Cl adlayer on the surface energy landscape, specifically on the effective change in dipole moment during adatom diffusion.
authors.affiliation: Institut für Experimentelle und Angewandte Physik, Universität Kiel, Leibnizstraße 19, 24098 Kiel, Germany.
authors.forename: Frederik
authors.initials: F
authors.lastname: Golks
authors.forename: Jochim
authors.initials: J
authors.lastname: Stettner
authors.forename: Yvonne
authors.initials: Y
authors.lastname: Gründer
authors.forename: Klaus
authors.initials: K
authors.lastname: Krug
authors.forename: Jörg
authors.initials: J
authors.lastname: Zegenhagen
authors.forename: Olaf M
authors.initials: OM
authors.lastname: Magnussen