title: High quality factor and high confinement silicon resonators using etchless process.
abstract: We demonstrate high quality factor and high confinement in a silicon ring resonator fabricated by a thermal oxidation process. We fabricated a 50 μm bending radius racetrack resonator, with a 5 μm coupling region. We achieved an intrinsic quality factor of 760,000 for the fundamental TM mode, which corresponds to a propagation loss of 0.9 dB/cm. Both the fundamental TE and TM modes are highly confined in the waveguide, with effective indices of 3.0 for the TE mode and 2.9 for the TM mode.
authors.affiliation: School of Applied and Engineering Physics, Cornell University, Ithaca, NY 14853, USA.
authors.forename: Austin
authors.initials: A
authors.lastname: Griffith
authors.forename: Jaime
authors.initials: J
authors.lastname: Cardenas
authors.forename: Carl B
authors.initials: CB
authors.lastname: Poitras
authors.forename: Michal
authors.initials: M
authors.lastname: Lipson