title: Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures.
abstract: In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390-785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern.
authors.affiliation: Department of Photonics Engineering, Technical University of Denmark, Lyngby, Denmark.
authors.forename: Yiyu
authors.initials: Y
authors.lastname: Ou
authors.forename: Valdas
authors.initials: V
authors.lastname: Jokubavicius
authors.forename: Rositza
authors.initials: R
authors.lastname: Yakimova
authors.forename: Mikael
authors.initials: M
authors.lastname: Syväjärvi
authors.forename: Haiyan
authors.initials: H
authors.lastname: Ou