title: Depth profiling and imaging capabilities of an ultrashort pulse laser ablation time of flight mass spectrometer.
abstract: An ultrafast laser ablation time-of-flight mass spectrometer (AToF-MS) and associated data acquisition software that permits imaging at micron-scale resolution and sub-micron-scale depth profiling are described. The ion funnel-based source of this instrument can be operated at pressures ranging from 10(-8) to ~0.3 mbar. Mass spectra may be collected and stored at a rate of 1 kHz by the data acquisition system, allowing the instrument to be coupled with standard commercial Ti:sapphire lasers. The capabilities of the AToF-MS instrument are demonstrated on metal foils and semiconductor wafers using a Ti:sapphire laser emitting 800 nm, ~75 fs pulses at 1 kHz. Results show that elemental quantification and depth profiling are feasible with this instrument.
authors.affiliation: Department of Chemistry, University of Illinois at Chicago, Chicago, Illinois 60607, USA.
authors.forename: Yang
authors.initials: Y
authors.lastname: Cui
authors.forename: Jerry F
authors.initials: JF
authors.lastname: Moore
authors.forename: Slobodan
authors.initials: S
authors.lastname: Milasinovic
authors.forename: Yaoming
authors.initials: Y
authors.lastname: Liu
authors.forename: Robert J
authors.initials: RJ
authors.lastname: Gordon
authors.forename: Luke
authors.initials: L
authors.lastname: Hanley
mesh_terms: D007834:Lasers; D013058:Mass Spectrometry / Q000295:instrumentation*; D011312:Pressure; D012666:Semiconductors; D013997:Time Factors; D014618:Vacuum