title: Scanning X-ray nanodiffraction: from the experimental approach towards spatially resolved scattering simulations.
abstract: : An enhancement on the method of X-ray diffraction simulations for applications using nanofocused hard X-ray beams is presented. We combine finite element method, kinematical scattering calculations, and a spot profile of the X-ray beam to simulate the diffraction of definite parts of semiconductor nanostructures. The spot profile could be acquired experimentally by X-ray ptychography. Simulation results are discussed and compared with corresponding X-ray nanodiffraction experiments on single SiGe dots and dot molecules.
authors.affiliation: , Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, Berlin, D-10117, Germany. dubslaff@pdi-berlin.de.
authors.forename: Martin
authors.initials: M
authors.lastname: Dubslaff
authors.forename: Michael
authors.initials: M
authors.lastname: Hanke
authors.forename: Jens
authors.initials: J
authors.lastname: Patommel
authors.forename: Robert
authors.initials: R
authors.lastname: Hoppe
authors.forename: Christian G
authors.initials: CG
authors.lastname: Schroer
authors.forename: Sebastian
authors.initials: S
authors.lastname: Schöder
authors.forename: Manfred
authors.initials: M
authors.lastname: Burghammer