title: Improving the room-temperature confinement of light by miniaturizing mode sizes into a deep subwavelength scale using dielectric spheres in metal cavities.
abstract: The confinement of light within nanometer-scale regions may result in the significant enhancement of light-matter interactions. However, light confinement to nanometers is hindered by the diffraction limit of a dielectric material. For a dielectric cavity, if the material loss is negligible, reducing the cavity size usually causes a significantly increase in radiation loss. Surface plasmons show great promise for potential subwavelength light confinement. However, in most circumstances, light confinement by dissipative metallic materials can cause ohmic losses at optical frequencies. In such cases, the realization of light confinement with deep subwavelength mode sizes results in great losses and thus has low quality factors. In the present study, a three-dimensional light confinement with deep subwavelength mode sizes is achieved using dielectric spheres in metal cavities. Contrary to other mechanisms for subwavelength light confinement that are based on the use of dielectric or metal cavities, the nanometer-scale regions ensure that most of the light energy is confined away from the metal-dielectric interfaces, thereby decreasing light absorption in the metal cavity. In turn, the metal cavity decreases the radiation loss of light. Thus, high quality factors ranging from 2×10(2) to 6×10(2) can be obtained at room temperature. An effective electrical mode volume ranging from 7×10(-5)λ(0)(3) to 2×10(-4)λ(0)(3) (where λ(0) is the resonant wavelength in a vacuum) can be achieved. Therefore, this method of three-dimensional light confinement with deep subwavelength mode sizes using dielectric spheres in metal cavities may have potential applications in the design of nanolasers, nanophoton detectors, nonlinear optical switches, and so on.
authors.affiliation: Photonic Laboratory, College of Optoelectronic Science and Engineering, National University of Defense Technology, Changsha, Hunan 410073, China. liukener@163.com
authors.forename: Ken
authors.initials: K
authors.lastname: Liu
authors.forename: Zhang
authors.initials: Z
authors.lastname: Luo
authors.forename: Wei Min
authors.initials: WM
authors.lastname: Ye
authors.forename: Xiao Dong
authors.initials: XD
authors.lastname: Yuan
authors.forename: Zhi Hong
authors.initials: ZH
authors.lastname: Zhu
authors.forename: Chun
authors.initials: C
authors.lastname: Zeng