Generalized phase diffraction gratings with tailored intensity.
We report the generation of continuous phase masks designed to generate a set of target diffraction orders with defined relative intensity weights. We apply a previously reported analytic calculation that requires resolving a single equation with a set of parameters defining the target diffraction orders. Then the same phase map is extended to other phase patterns such as vortex generating/sensing gratings. Results are demonstrated experimentally with a parallel-aligned spatial light modulator.
Dept. de Ciencia de Materiales, Óptica y Tecnología Electrónica, Universidad Miguel Hernández, 03202 Elche, Spain. j.albero@umh.es
Jorge
J
Albero
Ignacio
I
Moreno
Jeffrey A
JA
Davis
Don M
DM
Cottrell
David
D
Sand