Modification of the surfaces of silicon wafers with temperature-responsive cross-linkable poly[oligo(ethylene oxide) methacrylate]-based star polymers.
Temperature-responsive photo-cross-linkable poly[oligo(ethylene oxide) monomethyl ether methacrylate] (POEOMA)-based star polymers were synthesized by atom transfer radical polymerization (ATRP), for the modification of silicon (Si) wafer surfaces. The polymers showed a lower critical solution temperature (LCST) behavior in aqueous media. The polymers were modified with benzophenone (Bzp) functional groups that were utilized in UV-triggered (λ = 365 nm) cross-linking reactions for the preparation of polymer networks. The star polymers were deposited onto the surfaces of Si wafers by spin coating, and stable polymer films were formed by simple UV irradiation. The stability of thermoresponsive cross-linked polymer films deposited on the Si wafer was confirmed by changing their hydrophilicity by changing the temperature of the environment. In addition, the POEOMA-based star polymers could be utilized for the preparation of photolithography-patterned surfaces. The successful formation of uniform stable polymeric films indicates that Bzp-functionalized POEOMA star polymers can be used for a simple Si surface modification.
Department of Chemistry, Carnegie Mellon University, 4400 Fifth Avenue, Pittsburgh, Pennsylvania 15213, USA.
Sangwoo
S
Park
Mingjiang
M
Zhong
Taeheon
T
Lee
Hyun-Jong
HJ
Paik
Krzysztof
K
Matyjaszewski
D003432:Cross-Linking Reagents / Q000737:chemistry; D008422:Materials Testing; D008689:Methacrylates / Q000737:chemistry*; D008968:Molecular Conformation; D011092:Polyethylene Glycols / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties; D013696:Temperature
D003432:Cross-Linking Reagents; D008689:Methacrylates; C517620:poly(oligoethylene oxide methacrylate); D011092:Polyethylene Glycols; D012825:Silicon