title: Quick photo-Fenton degradation of phenolic compounds by Cu/Al2O3-MCM-41 under visible light irradiation: small particle size, stabilization of copper, easy reducibility of Cu and visible light active material.
abstract: The present study reports the photo-Fenton degradation of phenolic compounds (phenol, 2-chloro-4-nitrophenol and 4-chloro-2-nitrophenol) in aqueous solution using mesoporous Cu/Al(2)O(3)-MCM-41 nanocomposite as a heterogeneous photo-Fenton-like catalyst. The in situ incorporation of mesoporous Al(2)O(3) (MA) into the framework of MCM-41 (sol-gel method) forms Al(2)O(3)-MCM-41 and wetness impregnation of Cu(II) on Al(2)O(3)-MCM-41 generates mesoporous Cu/Al(2)O(3)-MCM-41 composite. The effects of pH and H(2)O(2) concentration on degradation of phenol, 2-chloro-4-nitrophenol and 4-chloro-2-nitrophenol are studied. Kinetics analysis shows that the photocatalytic degradation reaction follows a first-order rate equation. Mesoporous 5 Cu/Al(2)O(3)-MCM-41 is found to be an efficient photo-Fenton-like catalyst for the degradation of phenolic compounds. It shows nearly 100% degradation in 45 min at pH 4. The combined effect of small particle size, stabilization of Cu(2+) on the support Al(2)O(3)-MCM-41, ease reducibility of Cu(2+) and visible light activeness are the key factors for quick degradation of phenolic compounds by Cu/Al(2)O(3)-MCM-41.
authors.affiliation: Colloids and Material Chemistry Department, Institute of Minerals and Materials Technology (CSIR), Bhubaneswar-751013, Orissa, India.
authors.forename: Amaresh C
authors.initials: AC
authors.lastname: Pradhan
authors.forename: Binita
authors.initials: B
authors.lastname: Nanda
authors.forename: K M
authors.initials: KM
authors.lastname: Parida
authors.forename: Mira
authors.initials: M
authors.lastname: Das
mesh_terms: D000537:Aluminum Oxide / Q000737:chemistry*; D003300:Copper / Q000737:chemistry*; D055772:Green Chemistry Technology; D006861:Hydrogen Peroxide / Q000737:chemistry*; D006863:Hydrogen-Ion Concentration; D007501:Iron / Q000737:chemistry*; D007700:Kinetics; D008027:Light; D010084:Oxidation-Reduction; D010316:Particle Size; D010636:Phenols / Q000737:chemistry*; D055668:Photochemical Processes; D016062:Porosity; D012822:Silicon Dioxide / Q000737:chemistry*; D013499:Surface Properties
chemical_list: C045076:Fenton's reagent; C509968:MCM-41; D010636:Phenols; D012822:Silicon Dioxide; D003300:Copper; D006861:Hydrogen Peroxide; D007501:Iron; D000537:Aluminum Oxide