title: Optimizing the deposition of hydrogen evolution sites on suspended semiconductor particles using on-line photocatalytic reforming of aqueous methanol solutions.
abstract: The deposition of hydrogen evolution sites on photocatalysts is a crucial step in the multistep process of synthesizing a catalyst that is active for overall photocatalytic water splitting. An alternative approach to conventional photodeposition was developed, applying the photocatalytic reforming of aqueous methanol solutions to deposit metal particles on semiconductor materials such as Ga₂O₃ and (Ga₀.₆ Zn₀.₄)(N₀.₆O₀.₄). The method allows optimizing the loading of the co-catalysts based on the stepwise addition of their precursors and the continuous online monitoring of the evolved hydrogen. Moreover, a synergetic effect between different co-catalysts can be directly established.
authors.affiliation: Laboratory of Industrial Chemistry, Ruhr-University Bochum, Universitätsstr. 150, 44780 Bochum, Germany.
authors.forename: G Wilma
authors.initials: GW
authors.lastname: Busser
authors.forename: Bastian
authors.initials: B
authors.lastname: Mei
authors.forename: Martin
authors.initials: M
authors.lastname: Muhler
mesh_terms: D002384:Catalysis; D005708:Gallium / Q000737:chemistry; D006859:Hydrogen / Q000737:chemistry*; D000432:Methanol / Q000737:chemistry*; D055668:Photochemical Processes; D012666:Semiconductors; D012996:Solutions; D013535:Suspensions; D014867:Water / Q000737:chemistry*
chemical_list: D012996:Solutions; D013535:Suspensions; D014867:Water; C038863:gallium oxide; D006859:Hydrogen; D005708:Gallium; D000432:Methanol