title: Note: Controlled fabrication of suspended metallic vacuum tunneling gaps.
abstract: We developed a new fabrication technique for the realization of nanogaps using conventional lithography and in situ controlled thermal evaporation. A 20-40 nm gap between two suspended metallic electrodes is shrunk down to about 1 nm using controlled thermal evaporation. It is demonstrated that with this technique rigid and stable metallic vacuum tunneling junctions can be consistently produced. The fabricated nanogaps were characterized by I-V measurements and their gap sizes and barrier heights were interrogated using the Simmons' model.
authors.affiliation: Faculty of Engineering and Natural Sciences, Sabancı University, Istanbul 34956, Turkey.
authors.forename: Anıl
authors.initials: A
authors.lastname: Günay-Demirkol
authors.forename: İsmet İ
authors.initials: İİ
authors.lastname: Kaya