title: Large area resist-free soft lithographic patterning of graphene.
abstract: Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.
authors.affiliation: Inorganic Materials Science, MESA + Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
authors.forename: Antony
authors.initials: A
authors.lastname: George
authors.forename: S
authors.initials: S
authors.lastname: Mathew
authors.forename: Raoul
authors.initials: R
authors.lastname: van Gastel
authors.forename: Maarten
authors.initials: M
authors.lastname: Nijland
authors.forename: K
authors.initials: K
authors.lastname: Gopinadhan
authors.forename: Peter
authors.initials: P
authors.lastname: Brinks
authors.forename: T
authors.initials: T
authors.lastname: Venkatesan
authors.forename: Johan E
authors.initials: JE
authors.lastname: ten Elshof