title: Free-standing mechanical and photonic nanostructures in single-crystal diamond.
abstract: A variety of nanoscale photonic, mechanical, electronic, and optoelectronic devices require scalable thin film fabrication. Typically, the device layer is defined by thin film deposition on a substrate of a different material, and optical or electrical isolation is provided by the material properties of the substrate or by removal of the substrate. For a number of materials this planar approach is not feasible, and new fabrication techniques are required to realize complex nanoscale devices. Here, we report a three-dimensional fabrication technique based on anisotropic plasma etching at an oblique angle to the sample surface. As a proof of concept, this angled-etching methodology is used to fabricate free-standing nanoscale components in bulk single-crystal diamond, including nanobeam mechanical resonators, optical waveguides, and photonic crystal and microdisk cavities. Potential applications of the fabricated prototypes range from classical and quantum photonic devices to nanomechanical-based sensors and actuators.
authors.affiliation: School of Engineering and Applied Sciences, Harvard University, 29 Oxford Street, Cambridge, Massachusetts 02138, United States.
authors.forename: Michael J
authors.initials: MJ
authors.lastname: Burek
authors.forename: Nathalie P
authors.initials: NP
authors.lastname: de Leon
authors.forename: Brendan J
authors.initials: BJ
authors.lastname: Shields
authors.forename: Birgit J M
authors.initials: BJ
authors.lastname: Hausmann
authors.forename: Yiwen
authors.initials: Y
authors.lastname: Chu
authors.forename: Qimin
authors.initials: Q
authors.lastname: Quan
authors.forename: Alexander S
authors.initials: AS
authors.lastname: Zibrov
authors.forename: Hongkun
authors.initials: H
authors.lastname: Park
authors.forename: Mikhail D
authors.initials: MD
authors.lastname: Lukin
authors.forename: Marko
authors.initials: M
authors.lastname: Lončar