title: Cost-effective large-scale fabrication of diffractive optical elements by using conventional semiconducting processes.
abstract: In this article, we introduce a simple fabrication method for SiO(2)-based thin diffractive optical elements (DOEs) that uses the conventional processes widely used in the semiconductor industry. Photolithography and an inductively coupled plasma etching technique are easy and cost-effective methods for fabricating subnanometer-scale and thin DOEs with a refractive index of 1.45, based on SiO(2). After fabricating DOEs, we confirmed the shape of the output light emitted from the laser diode light source and applied to a light-emitting diode (LED) module. The results represent a new approach to mass-produce DOEs and realize a high-brightness LED module.
authors.affiliation: Energy Efficiency Department, Korea Institute of Energy Research, 71-2 Jang-dong, Yuseong-gu, Daejeon 305-343, South Korea.
authors.forename: Seunghwan
authors.initials: S
authors.lastname: Yoo
authors.forename: Ho Young
authors.initials: HY
authors.lastname: Song
authors.forename: Junghoon
authors.initials: J
authors.lastname: Lee
authors.forename: Cheol-Yong
authors.initials: CY
authors.lastname: Jang
authors.forename: Hakgeun
authors.initials: H
authors.lastname: Jeong