title: A new perfluoropolyether-based hydrophobic and chemically resistant photoresist structured by two-photon polymerization.
abstract: Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in this work and successfully employed to fabricate woodpile structures in various experimental conditions. This is the first demonstration of the capability to fabricate hydrophobic and chemically resistant 3D structures with submicrometer resolution and arbitrary geometry.
authors.affiliation: Dipartimento di Chimica, Materiali e Ingegneria Chimica Giulio Natta, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milan, Italy. carmela.demarco@chem.polimi.it
authors.forename: Carmela
authors.initials: C
authors.lastname: De Marco
authors.forename: Arune
authors.initials: A
authors.lastname: Gaidukeviciute
authors.forename: Roman
authors.initials: R
authors.lastname: Kiyan
authors.forename: Shane M
authors.initials: SM
authors.lastname: Eaton
authors.forename: Marinella
authors.initials: M
authors.lastname: Levi
authors.forename: Roberto
authors.initials: R
authors.lastname: Osellame
authors.forename: Boris N
authors.initials: BN
authors.lastname: Chichkov
authors.forename: Stefano
authors.initials: S
authors.lastname: Turri