title: Cyclic block copolymers for controlling feature sizes in block copolymer lithography.
abstract: Block copolymer lithography holds promise as a next-generation technique to achieve the sub-20 nm feature sizes demanded by semiconductor roadmaps. While molecular weight and block immiscibility have traditionally been used to control feature size, this study demonstrates that macromolecular architecture is also a powerful tool for tuning domain spacing. To demonstrate this concept, a new synthetic strategy for cyclic block polymers based on highly efficient "click" coupling of difunctional linear chains is developed, and the thin film self-assembly of cyclic polystyrene-block-polyethylene oxide (cPS-b-PEO) is compared with the corresponding linear analogues. The reduced hydrodynamic radii of the cyclic systems result in ~30% decrease in domain spacing over the corresponding linear polymers.
authors.affiliation: Materials Research Laboratory, University of California, Santa Barbara, California 93106, USA.
authors.forename: Justin E
authors.initials: JE
authors.lastname: Poelma
authors.forename: Kosuke
authors.initials: K
authors.lastname: Ono
authors.forename: Daigo
authors.initials: D
authors.lastname: Miyajima
authors.forename: Takuzo
authors.initials: T
authors.lastname: Aida
authors.forename: Kotaro
authors.initials: K
authors.lastname: Satoh
authors.forename: Craig J
authors.initials: CJ
authors.lastname: Hawker
mesh_terms: D003500:Cyclization; D010084:Oxidation-Reduction; D011092:Polyethylene Glycols / Q000138:chemical synthesis / Q000737:chemistry*; D011137:Polystyrenes / Q000138:chemical synthesis / Q000737:chemistry*; D011327:Printing / Q000379:methods*; D013696:Temperature
chemical_list: D011137:Polystyrenes; C541965:polystyrene-b-poly(ethylene oxide); D011092:Polyethylene Glycols