title: Controlled positioning of nanoparticles on a micrometer scale.
abstract: For many applications it is desirable to have nanoparticles positioned on top of a given substrate well separated from each other and arranged in arrays of a certain geometry. For this purpose, a method is introduced combining the bottom-up self-organization of precursor-loaded micelles providing Au nanoparticles (NPs), with top-down electron-beam lithography. As an example, 13 nm Au NPs are arranged in a square array with interparticle distances >1 µm on top of Si substrates. By using these NPs as masks for a subsequent reactive ion etching, the square pattern is transferred into Si as a corresponding array of nanopillars.
authors.affiliation: Institute of Solid State Physics, Ulm University, D-89069 Ulm, Germany.
authors.forename: Fabian
authors.initials: F
authors.lastname: Enderle
authors.forename: Oliver
authors.initials: O
authors.lastname: Dubbers
authors.forename: Alfred
authors.initials: A
authors.lastname: Plettl
authors.forename: Paul
authors.initials: P
authors.lastname: Ziemann