title: Far-field optical control of a movable subdiffraction light grid.
abstract: We demonstrate experimentally a subdiffraction light pattern, with a period down to 150 nm, at the surface of an optimized silicon nanostructured thin film. We show, using near-field and far-field characterization, that this subdiffraction pattern can be translated and rotated just by changing the illumination angle. The movable high frequency light pattern paves the way for subdiffraction resolution surface imaging microscopy without scanning near-field probes.
authors.affiliation: Institut Fresnel, CNRS, Aix-Marseille Université, Marseille, France.
authors.forename: J
authors.initials: J
authors.lastname: Girard
authors.forename: G
authors.initials: G
authors.lastname: Scherrer
authors.forename: A
authors.initials: A
authors.lastname: Cattoni
authors.forename: E
authors.initials: E
authors.lastname: Le Moal
authors.forename: A
authors.initials: A
authors.lastname: Talneau
authors.forename: B
authors.initials: B
authors.lastname: Cluzel
authors.forename: F
authors.initials: F
authors.lastname: de Fornel
authors.forename: A
authors.initials: A
authors.lastname: Sentenac
mesh_terms: D008027:Light; D008856:Microscopy, Fluorescence / Q000295:instrumentation / Q000379:methods; D008962:Models, Theoretical; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000295:instrumentation / Q000379:methods*; D055095:Optics and Photonics / Q000295:instrumentation / Q000379:methods*; D012542:Scattering, Radiation; D012825:Silicon / Q000737:chemistry
chemical_list: D012825:Silicon