title: Selective surface functionalization at regions of high local curvature in graphene.
abstract: Monolayer graphene was deposited on a Si wafer substrate decorated with SiO(2) nanoparticles (NPs) and then exposed to aryl radicals that were generated in situ from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.
authors.affiliation: State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, and Biomedical Materials and Engineering Center, Wuhan University of Technology, Wuhan 430070, China.
authors.forename: Qingzhi
authors.initials: Q
authors.lastname: Wu
authors.forename: Yaping
authors.initials: Y
authors.lastname: Wu
authors.forename: Yufeng
authors.initials: Y
authors.lastname: Hao
authors.forename: Jianxin
authors.initials: J
authors.lastname: Geng
authors.forename: Matthew
authors.initials: M
authors.lastname: Charlton
authors.forename: Shanshan
authors.initials: S
authors.lastname: Chen
authors.forename: Yujie
authors.initials: Y
authors.lastname: Ren
authors.forename: Hengxing
authors.initials: H
authors.lastname: Ji
authors.forename: Huifeng
authors.initials: H
authors.lastname: Li
authors.forename: Danil W
authors.initials: DW
authors.lastname: Boukhvalov
authors.forename: Richard D
authors.initials: RD
authors.lastname: Piner
authors.forename: Christopher W
authors.initials: CW
authors.lastname: Bielawski
authors.forename: Rodney S
authors.initials: RS
authors.lastname: Ruoff
mesh_terms: D006108:Graphite / Q000737:chemistry*; D053758:Nanoparticles; D012822:Silicon Dioxide / Q000737:chemistry*; D013059:Spectrum Analysis, Raman
chemical_list: D012822:Silicon Dioxide; D006108:Graphite