title: Top-down preparation of self-supporting supramolecular polymeric membranes using highly selective photocyclic aromatization of cis-cisoid helical poly(phenylacetylene)s in the membrane state.
abstract: A novel, highly selective photocyclic aromatization (SCAT) of π-conjugated polymers from phenylacetylene having two hydroxyl groups to exclusively yield a 1,3,5-trisubstituted benzene derivative was developed, and its success was confirmed by (1)H NMR, GPC, and TOF-MS. The SCAT reaction has many unique characteristics. (1) It is a quantitative reaction: it gave only the corresponding cyclic trimer, i.e., a 1,3,5-trisubstituted benzene derivative, quantitatively (100%). No byproducts were produced under the best conditions. (2) It is an intramolecular reaction: it occurred between three adjacent monomer units in one macromolecule. (3) It is a stereospecific and topochemical or template reaction: the reactivity strongly depended on the configuration and conformation of the starting polymer substrates. (4) It is a photoreaction: high selectivity (100%) was observed only by the use of visible light irradiation, not by heating. (5) It is a solid-state reaction: high selectivity (100%) was observed only in the solid state, not in solution. In addition, (6) the resulting cyclic trimers could form a self-supporting membrane, despite their low molecular weights. This new approach resulted in a new class of supramolecular polymers consisting of a 1,3,5-trisubstituted benzene derivative, numbers of which were linearly linked by hydrogen bonds and stacked benzene derivatives. Since SCAT has such high selectivities and is useful for the preparation of a self-supporting supramolecular polymer membrane, many applications can be expected.
authors.affiliation: Polymer Materials Research Center and Key Laboratory of Superlight Materials & Surface Technology, Ministry of Education, College of Materials Science and Chemical Engineering, Harbin Engineering University, Harbin 150001, China.
authors.forename: Lijia
authors.initials: L
authors.lastname: Liu
authors.forename: Takeshi
authors.initials: T
authors.lastname: Namikoshi
authors.forename: Yu
authors.initials: Y
authors.lastname: Zang
authors.forename: Toshiki
authors.initials: T
authors.lastname: Aoki
authors.forename: Shingo
authors.initials: S
authors.lastname: Hadano
authors.forename: Yunosuke
authors.initials: Y
authors.lastname: Abe
authors.forename: Ikuya
authors.initials: I
authors.lastname: Wasuzu
authors.forename: Toyokazu
authors.initials: T
authors.lastname: Tsutsuba
authors.forename: Masahiro
authors.initials: M
authors.lastname: Teraguchi
authors.forename: Takashi
authors.initials: T
authors.lastname: Kaneko