title: Optimized pitch button blocking for polishing high-aspect-ratio optics.
abstract: Pitch button blocking (PBB), involving attaching small pitch buttons between the back of a thin workpiece (i.e., optic) and a blocking plate, enables noncompliant convergent polishing in which the workpiece stiffness and block interface strength are maintained. This process has been optimized, and practical design criteria (number, size, and spacing of pitch buttons) have been determined both experimentally and theoretically using a thermoelastic model. The optimized PBB process has been successfully implemented on 100-265 mm sized workpieces with aspect ratios up to 45, resulting in maximum peak-to-valley heights of <|0.1| μm after blocking and polishing.
authors.affiliation: Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, California 94551, USA. feit1@llnl.gov
authors.forename: Michael D
authors.initials: MD
authors.lastname: Feit
authors.forename: Richard P
authors.initials: RP
authors.lastname: DesJardin
authors.forename: William A
authors.initials: WA
authors.lastname: Steele
authors.forename: Tayyab I
authors.initials: TI
authors.lastname: Suratwala