title: Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength.
abstract: Fresnel zone plates are used for imaging at extreme ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes (<150  nm) and complex nanostructuring processes. Fabrication techniques such as electron-beam lithography followed by etching and electroplating processes have been developed over the years. We are reporting on the development of a technique incorporating focused gallium ion-beam lithography to fabricate Fresnel zone plates with 120 nm outermost structure size in a process that combines pattern exposure and structure transfer in one single step. The fabricated zone plates were successfully applied in a microscopic setup at λ=13  nm wavelength.
authors.affiliation: Electron Microscopy and Analysis, Center of Advanced European Studies and Research, Ludwig-Erhard-Allee 2, Bonn 53175, Germany. johannes.overbuschmann@caesar.de
authors.forename: Johannes
authors.initials: J
authors.lastname: Overbuschmann
authors.forename: Julia
authors.initials: J
authors.lastname: Hengster
authors.forename: Stephan
authors.initials: S
authors.lastname: Irsen
authors.forename: Thomas
authors.initials: T
authors.lastname: Wilhein