title: Reduction of nitric oxide by acetylene on Ir surfaces with different morphologies: comparison with reduction of NO by CO.
abstract: Reduction of nitric oxide (NO) by acetylene (C(2)H(2)) has been investigated by temperature-programmed desorption (TPD) on planar Ir(210) and faceted Ir(210) with tunable sizes of three-sided nanopyramids exposing (311), (311[overline]), and (110) faces. Upon adsorption, C(2)H(2) dissociates to form acetylide (CCH) and H species on the Ir surfaces at low C(2)H(2) precoverage. For adsorption of NO on C(2)H(2)-covered Ir, both planar and faceted Ir(210) exhibit high reactivity for reduction of NO with high selectivity to N(2) at low C(2)H(2) precoverage, although the reaction is completely inhibited at high C(2)H(2) precoverage. Coadsorbed C(2)H(2) significantly influences dissociation of NO. The N-, H-, and C-containing TPD products are dominated by N(2), H(2), CO, and CO(2) together with small amounts of H(2)O. For adsorption of NO on C-covered Ir(210) at fractional C precoverage, formation of CO(2) is promoted while production of CO is reduced. Reduction of NO by C(2)H(2) is structure sensitive on faceted Ir(210) versus planar Ir(210), but no evidence is found for size effects in the reduction of NO by C(2)H(2) on faceted Ir(210) for average facet sizes of 5 nm and 14 nm. The results are compared with reduction of NO by CO on the same Ir surfaces. As for NO+C(2)H(2), the Ir surfaces are very active for reduction of NO by CO with high selectivity to N(2) and the reaction is structure sensitive, but clear evidence is found for size effects in the reduction of NO by CO on the nanometer scale. Furthermore, coadsorbed CO does not affect dissociation of NO at low CO precoverage whereas coadsorbed CO considerably influences dissociation of NO at high CO precoverage. The adsorption sites of CCH+H on Ir are characterized by density functional theory.
authors.affiliation: Department of Physics and Astronomy, and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854, USA. wchen@physics.rutgers.edu
authors.forename: Wenhua
authors.initials: W
authors.lastname: Chen
authors.forename: Quantong
authors.initials: Q
authors.lastname: Shen
authors.forename: Robert A
authors.initials: RA
authors.lastname: Bartynski
authors.forename: Payam
authors.initials: P
authors.lastname: Kaghazchi
authors.forename: Timo
authors.initials: T
authors.lastname: Jacob