title: Solution-based adaptive parallel patterning by laser-induced local plasmonic surface defunctionalization.
abstract: Adaptive mass fabrication method based on laser-induced plasmonic local surface defunctionalization was suggested to realize solution-based high resolution self-patterning on transparent substrate in parallel. After non-patterned functional monolayer was locally deactivated by laser-induced metallic plasma species, various micro/nano metal structures could be simultaneously fabricated by the parallel self-selective deposition of metal nanoparticles on a specific region. This method makes the eco-friendly and cost-effective production of high resolution pattern possible. Moreover, it can respond to design change actively due to the broad controllable range and easy change of key patterning specifications such as a resolution (subwavelength~100 μm), thickness (100 nm~6 μm), type (dot and line), and shape.
authors.affiliation: Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, South Korea.
authors.forename: Bongchul
authors.initials: B
authors.lastname: Kang
authors.forename: Jongsu
authors.initials: J
authors.lastname: Kim
authors.forename: Minyang
authors.initials: M
authors.lastname: Yang
mesh_terms: D007834:Lasers; D008420:Manufactured Materials / Q000528:radiation effects*; D008422:Materials Testing; D020349:Surface Plasmon Resonance / Q000379:methods*; D013499:Surface Properties / Q000528:radiation effects