title: Fabrication of 3D nano-structures using reverse imprint lithography.
abstract: In spite of the fact that the fabrication process of three-dimensional nano-structures is complicated and expensive, it can be applied to a range of devices to increase their efficiency and sensitivity. Simple and inexpensive fabrication of three-dimensional nano-structures is necessary. In this study, reverse imprint lithography (RIL) with UV-curable benzylmethacrylate, methacryloxypropyl terminated poly-dimethylsiloxane (M-PDMS) resin and ZnO-nano-particle-dispersed resin was used to fabricate three-dimensional nano-structures.UV-curable resins were placed between a silicon stamp and a PVA transfer template, followed by a UV curing process. Then, the silicon stamp was detached and a 2D pattern layer was transferred to the substrate using diluted UV-curable glue. Consequently, three-dimensional nano-structures were formed by stacking the two-dimensional nano-patterned layers. RIL was applied to a light-emitting diode (LED) to evaluate the optical effects of a nano-patterned layer. As a result, the light extraction of the patterned LED was increased by about 12% compared to an unpatterned LED.
authors.affiliation: Department of Materials Science and Engineering, Korea University, Anam-Dong 5-1, Sungbuk-Ku, Seoul, Korea.
authors.forename: Kang-Soo
authors.initials: KS
authors.lastname: Han
authors.forename: Sung-Hoon
authors.initials: SH
authors.lastname: Hong
authors.forename: Kang-In
authors.initials: KI
authors.lastname: Kim
authors.forename: Joong-Yeon
authors.initials: JY
authors.lastname: Cho
authors.forename: Kyung-Woo
authors.initials: KW
authors.lastname: Choi
authors.forename: Heon
authors.initials: H
authors.lastname: Lee
mesh_terms: D003460:Crystallization / Q000379:methods*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008029:Lighting / Q000295:instrumentation*; D054802:Molecular Imprinting / Q000379:methods*; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D010781:Photography / Q000379:methods*; D012666:Semiconductors