title: Directed assembly of P3HT:PCBM blend films using a chemical template with sub-300 nm features.
abstract: Surface energy has been demonstrated as a means to direct interfacial-layer composition in polymer:fullerene blends utilized as active layers in organic photovoltaic devices. Combined with recent materials advances in the preparation of nanoscale chemical patterns, surface energy control of nanophase separation presents an opportunity to employ patterned surface energy templates to control the 3D blend morphology of polymer:fullerene blends. This report details the directed assembly of poly(3-hexylthiophene):phenyl-C61-butyric acid methyl ester (P3HT:PCBM) blends atop linear grating patterns with domains of alternating high and low surface energy of 50 to 600 nm in width prepared by nanoscale oxidative lithography of alkyl-terminated self-assembled monolayers on SiO2 and SiH surfaces. Tapping-, contact-, and current-sensing AFM studies demonstrated that chemical patterns were effective at directing the 3D morphology of P3HT:PCBM blends at dimensions of >200 nm. As the dimensionality of domains approached 100 nm, the chemical patterns were no longer able to direct phase segregation, evidence that a directed spinodal decomposition mechanism was responsible for the observed morphology. Surprisingly, the low surface energy component (P3HT) was found to be atop the high surface energy domains of the template, in conflict with current understanding of the role of surface energy directed assembly in polymer blends. These results suggest that the directed spinodal decomposition mechanism applies to conjugated polymer:fullerene blends, but that additional parameters unique to these types of systems will require refinement of the theory to adequately describe and predict the behavior of these scientifically and industrially interesting materials.
authors.affiliation: Condensed Matter Physics and Materials Science Department, Brookhaven National Laboratory, Upton, New York 11973, United States. dsgermack@gmail.com
authors.forename: David S
authors.initials: DS
authors.lastname: Germack
authors.forename: Antonio
authors.initials: A
authors.lastname: Checco
authors.forename: Benjamin M
authors.initials: BM
authors.lastname: Ocko