title: A route for fabricating printable photonic devices with sub-10 nm resolution.
abstract: A novel and robust route for high-throughput, high-performance nanophotonics-based direct imprint of high refractive index and low visible wavelength absorption materials is presented. Sub-10 nm TiO2 nanostructures are fabricated by low-pressure UV-imprinting of an organic-inorganic resist material. Post-imprint thermal annealing allows optical property tuning over a wide range of values. For instance, a refractive index higher than 2.0 and an extinction coefficient close to zero can be achieved in the visible wavelength range. Furthermore, the imprint resist material permits fabrication of crack-free nanopatterned films over large areas and is compatible for fabricating printable photonic structures.
authors: aBeam Technologies, 5286 Dunnigan Ct., Castro Valley, CA 94546, USA.
authors: Carlos
authors: C
authors: Pina-Hernandez
authors: Valeria
authors: V
authors: Lacatena
authors: Giuseppe
authors: G
authors: Calafiore
authors: Scott
authors: S
authors: Dhuey
authors: Konstantin
authors: K
authors: Kravtsov
authors: Alexander
authors: A
authors: Goltsov
authors: Deirdre
authors: D
authors: Olynick
authors: Vladimir
authors: V
authors: Yankov
authors: Stefano
authors: S
authors: Cabrini
authors: Christophe
authors: C
authors: Peroz