title: Closed-looped in situ nano processing on a culturing cell using an inverted electron beam lithography system.
abstract: The beam profile of an electron beam (EB) can be focused onto less than a nanometer spot and scanned over a wide field with extremely high speed sweeping. Thus, EB is employed for nano scale lithography in applied physics research studies and in fabrication of semiconductors. We applied a scanning EB as a control system for a living cell membrane which is representative of large scale complex systems containing nanometer size components. First, we designed the opposed co-axial dual optics containing inverted electron beam lithography (I-EBL) system and a fluorescent optical microscope. This system could provide in situ nano processing for a culturing living cell on a 100-nm-thick SiN nanomembrane, which was placed between the I-EBL and the fluorescent optical microscope. Then we demonstrated the EB-induced chemical direct nano processing for a culturing cell with hundreds of nanometer resolution and visualized real-time images of the scanning spot of the EB-induced luminescent emission and chemical processing using a high sensitive camera mounted on the optical microscope. We concluded that our closed-loop in situ nano processing would be able to provide a nanometer resolution display of virtual molecule environments to study functional changes of bio-molecule systems.
authors: Graduate School of Information Science and Technology, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan. takayuki_hoshino@ipc.i.u-tokyo.ac.jp
authors: Takayuki
authors: T
authors: Hoshino
authors: Kunihiko
authors: K
authors: Mabuchi
mesh_terms: D018929:Cell Culture Techniques; D003198:Computer Simulation / Q000706:statistics & numerical data; D004583:Electrons; D056945:Hep G2 Cells; D006801:Humans; D049449:Luminescence; D008856:Microscopy, Fluorescence; D009010:Monte Carlo Method; D049329:Nanostructures; D036103:Nanotechnology / Q000379:methods*