title: Ultra-compact and fabrication-tolerant polarization rotator based on a bend asymmetric-slab waveguide.
abstract: We propose and analyze a polarization rotator based on a bend asymmetric-slab waveguide on the silicon-on-insulator platform. The device can be fabricated using standard complementary metal-oxide-semiconductor process involving only two dry etching steps. Compared with the formerly reported polarization rotators based on two-step etching, our introduced device demonstrates a significant improvement for fabrication tolerance. Furthermore, an ultra compact structure of ~5 μm conversion length, an insertion loss of only 0.5 dB, and an extinction ratio of >40 dB for both TE to TM polarization conversion and TM to TE polarization conversion are exhibited. Operation wavelength and the influence of environmental temperature on our device are also discussed.
authors: State Key Laboratory on Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
authors: Tongtong
authors: T
authors: Cao
authors: Shaowu
authors: S
authors: Chen
authors: Yonghao
authors: Y
authors: Fei
authors: Libin
authors: L
authors: Zhang
authors: Qing-Yang
authors: QY
authors: Xu