title: Transparent conductive gas-permeation barriers on plastics by atomic layer deposition.
abstract: A mixed-deposition atomic layer deposition process produces Hf:ZnO films with uniform dopant distribution and high electrical conductivity (resistivity = 4.5 × 10(-4) W cm), optical transparency (>85% from 400-1800 nm), and moisture-barrier property (water vapor transmission rate = 6.3 × 10(-6) g m(-2) day(-1)).
authors: Department of Materials Science and Engineering, National Taiwan University, Taipei 106, Taiwan.
authors: Chun-Ting
authors: CT
authors: Chou
authors: Pei-Wei
authors: PW
authors: Yu
authors: Ming-Hung
authors: MH
authors: Tseng
authors: Che-Chen
authors: CC
authors: Hsu
authors: Jing-Jong
authors: JJ
authors: Shyue
authors: Ching-Chiun
authors: CC
authors: Wang
authors: Feng-Yu
authors: FY
authors: Tsai