title: Pattern transfer with stabilized nanoparticle etch masks.
abstract: Self-assembled nanoparticle monolayer arrays are used as an etch mask for pattern transfer into Si and SiO(x) substrates. Crack formation within the array is prevented by electron beam curing to fix the nanoparticles to the substrate, followed by a brief oxygen plasma to remove excess carbon. This leaves a dot array of nanoparticle cores with a minimum gap of 2 nm. Deposition and liftoff can transform the dot array mask into an antidot mask, where the gap is determined by the nanoparticle core diameter. Reactive ion etching is used to transfer the dot and antidot patterns into the substrate. The effect of the gap size on the etching rate is modeled and compared with the experimental results.
authors: Physics Department, Carnegie Mellon University, Pittsburgh, PA 15213-3890, USA.
authors: Charles R
authors: CR
authors: Hogg
authors: Yoosuf N
authors: YN
authors: Picard
authors: Amrit
authors: A
authors: Narasimhan
authors: James A
authors: JA
authors: Bain
authors: Sara A
authors: SA
authors: Majetich