title: Nanopatterning using a simple bi-layer lift-off process for the fabrication of a photonic crystal nanostructure.
abstract: A simple and versatile method for fabricating nanopatterns by a lift-off procedure is demonstrated. The technique involves the use of molecular transfer lithography based on water-soluble templates to form a nanopatterned UV-curable material on a PMGI layer, which serves as an underlying resin suitable for lift-off processes. This bi-layer procedure is used for the fabrication of nickel patterns, which are subsequently used as a hard mask for plasma etch processing. Using this procedure, a two-dimensional TiO(2) photonic crystal layer with a 450 nm lattice constant is fabricated on Y(3)Al(5)O(12):Ce(3+) (YAG:Ce) yellow ceramic plate phosphor to enhance its forward emission. The yellow emission in the forward direction is improved by a factor of 3.5 compared to that of a conventional non-scattering YAG:Ce phosphor plate excited by a blue LED.
authors: Smart Lighting Engineering Research Center, Rensselaer Polytechnic Institute, Troy, NY 12180, USA. maoa@rpi.edu
authors: A
authors: A
authors: Mao
authors: C D
authors: CD
authors: Schaper
authors: R F
authors: RF
authors: Karlicek