title: [Measurement of OH radicals in flame with XeCl excimer laser].
abstract: The present paper describes how to measure OH radicals in the flame of alcohol burner flame by using XeCl excimer laser. The instrument consists of a XeCl excimer laser as light source, a multiple-reflection cell with whole path length of light achieving 2 560 meters, and a double pass high resolution echelle spectrometer with resolution 3.3 pm. This paper describes the reason for using the XeCl excimer laser without spectral etaloning and how to get rid of the water in reactor chamber. The results of the experiment get some absorption peak of OH radicals from 308.145 to 308.175 nm. By choosing the appropriate fit area and fitting, the results contrast with the measure data by using Xe lamp as light source.
authors: National Engineering and Technological Research Center for Environmental Optic Monitoring Instrument, Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei 230031, China. yliu@aiofm.ac.cn
authors: Yu
authors: Y
authors: Liu
authors: Wen-Qing
authors: WQ
authors: Liu
authors: Rui-Feng
authors: RF
authors: Kan
authors: Fu-Qi
authors: FQ
authors: Si
authors: Zhen-Yu
authors: ZY
authors: Xu
authors: Ren-Zhi
authors: RZ
authors: Hu
authors: Pin-Hua
authors: PH
authors: Xie