title: Ultralow reflection from a-Si nanograss/Si nanofrustum double layers.
abstract: A double-layer nanostructure comprising amorphous Si nanograss on top of Si nanofrustums (NFs) with a total height of 680 nm exhibits ultralow reflection. Almost near-unity absorption and near-zero reflectance result in this layered nanostructure, over a broad range of wavelengths and a wide range of angles of incidence, due to the low packing density of a-Si and the smooth transition of the refractive index from the air to the Si substrate across both the nanograss and NF layers.
authors: Institute of Nanotechnology, Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan, ROC.
authors: Srikanth
authors: S
authors: Ravipati
authors: Jiann
authors: J
authors: Shieh
authors: Fu-Hsiang
authors: FH
authors: Ko
authors: Chen-Chieh
authors: CC
authors: Yu
authors: Hsuen-Li
authors: HL
authors: Chen