title: Plasmonic analog of microstrip transmission line and effect of thermal annealing on its propagation loss.
abstract: We fabricated a plasmonic analog of the microwave microstrip transmission line and measured its propagation loss before and after thermal annealing. It is found that its propagation loss at 980 nm wavelength can be reduced by more than 50%, from 0.45 to 0.20 dB/μm, after thermal annealing at 300 °C. The reduction in loss can be attributed to the improved gold surface condition and probably also to the change in the metal's inner structure. Less evident loss reduction is noticed at 1550 nm, which is owing to extremely small portion of the modal electric field located in the metal regions at this wavelength.
authors: Optics and Photonics, School of Information and Communication Technology Royal Institute of Technology (KTH), Kista 16440, Sweden.
authors: Yiting
authors: Y
authors: Chen
authors: Jing
authors: J
authors: Wang
authors: Xi
authors: X
authors: Chen
authors: Min
authors: M
authors: Yan
authors: Min
authors: M
authors: Qiu
mesh_terms: D004735:Energy Transfer; D004867:Equipment Design; D019544:Equipment Failure Analysis; D006046:Gold / Q000737:chemistry*; D006244:Hardness; D006358:Hot Temperature; D008872:Microwaves; D020349:Surface Plasmon Resonance / Q000295:instrumentation*
chemical_list: D006046:Gold