title: Third-harmonic UV generation in silicon nitride nanostructures.
abstract: We report on strong UV third-harmonic generation from silicon nitride films and resonant waveguide gratings. We determine the absolute value of third-order susceptibility of silicon nitride at wavelength of 1064 nm to be χ(³) (-3ω,ω,ω,ω) = (2.8 ± 0.6) × 10⁻²⁰m²/V², which is two orders of magnitude larger than that of fused silica. The third-harmonic generation is further enhanced by a factor of 2000 by fabricating a resonant waveguide grating onto a silicon nitride film. Our results extend the operating range of CMOS-compatible nonlinear materials to the UV spectral regime.
authors: Department of Physics, Tampere University of Technology, P. O. Box 692, FI-33101 Tampere, Finland.
authors: Tingyin
authors: T
authors: Ning
authors: Outi
authors: O
authors: Hyvärinen
authors: Henna
authors: H
authors: Pietarinen
authors: Tommi
authors: T
authors: Kaplas
authors: Martti
authors: M
authors: Kauranen
authors: Göery
authors: G
authors: Genty
mesh_terms: D004867:Equipment Design; D019544:Equipment Failure Analysis; D008029:Lighting / Q000295:instrumentation*; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000528:radiation effects; D017655:Silicon Compounds / Q000737:chemistry* / Q000528:radiation effects; D014466:Ultraviolet Rays
chemical_list: D017655:Silicon Compounds; C032734:silicon nitride