title: Optimization of chemical displacement deposition of copper on porous silicon.
abstract: Copper (II) sulfate was used as a source of copper to achieve uniform distribution of Cu particles deposited on porous silicon. Layers of the porous silicon were formed by electrochemical anodization of Si wafers in a mixture of HF, C3H7OH and deionized water. The well-known chemical displacement technique was modified to grow the copper particles of specific sizes. SEM and XRD analysis revealed that the outer surface of the porous silicon was covered with copper particles of the crystal orientation inherited from the planes of porous silicon skeleton. The copper crystals were found to have the cubic face centering elementary cell. In addition, the traces of Cu2O cubic primitive crystalline phases were identified. The dimensions of Cu particles were determined by the Feret's analysis of the SEM images. The sizes of the particles varied widely from a few to hundreds of nanometers. A phenomenological model of copper deposition was proposed.
authors: Belarussian State University of Informatics and Radioelectronics, Brovka Street 6, Minsk 220013, Belarus.
authors: Hanna
authors: H
authors: Bandarenka
authors: Sergey
authors: S
authors: Redko
authors: Paolo
authors: P
authors: Nenzi
authors: Marco
authors: M
authors: Balucani
authors: Vitaly
authors: V
authors: Bondarenko
mesh_terms: D000327:Adsorption; D003198:Computer Simulation; D003300:Copper / Q000737:chemistry*; D003460:Crystallization / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008956:Models, Chemical; D008958:Models, Molecular; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D016062:Porosity; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D046911:Macromolecular Substances; D003300:Copper; D012825:Silicon