title: Plow and ridge nanofabrication.
abstract: Traditionally, scanning probe lithography tools are limited in resolution by the radius of curvature of the tip used. Herein, an approach is described for patterning the ridge of piled-up polymer that naturally occurs when a scanning probe is pressed against a soft surface. The use of this phenomenon to transfer patterns to hard materials with 20 nm resolution is demonstrated.
authors: Department of Materials Science and Engineering, Northwestern University, 2220 Campus Drive, Evanston, IL 60208, USA.
authors: Wooyoung
authors: W
authors: Shim
authors: Keith A
authors: KA
authors: Brown
authors: Xiaozhu
authors: X
authors: Zhou
authors: Boris
authors: B
authors: Rasin
authors: Xing
authors: X
authors: Liao
authors: Abrin L
authors: AL
authors: Schmucker
authors: Chad A
authors: CA
authors: Mirkin
mesh_terms: D018625:Microscopy, Atomic Force; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000379:methods*
keywords: atomic force microscopy; nanofabrication; nanolithography; polymers; scanning probe microscopy