title: Obtaining nanoimprint template gratings with 10 nm half-pitch by atomic layer deposition enabled spacer double patterning.
abstract: A strategy for fabricating nanoimprint templates with sub-10 nm line and 20 nm pitch gratings is demonstrated, by combining electron beam lithography and atomic layer deposition. This is achieved through pitch division using a spacer double-patterning technique. The nanostructures are then replicated using step-and-repeat ultra-violet assisted nanoimprint lithography.
authors: The Molecular Foundry, LBNL, One Cyclotron Road, Berkeley, CA 94702, USA. sddhuey@lbl.gov
authors: S
authors: S
authors: Dhuey
authors: C
authors: C
authors: Peroz
authors: D
authors: D
authors: Olynick
authors: G
authors: G
authors: Calafiore
authors: S
authors: S
authors: Cabrini