title: Using an SU-8 photoresist structure and cytochrome C thin film sensing material for a microbolometer.
abstract: There are two critical parameters for microbolometers: the temperature coefficient of resistance (TCR) of the sensing material, and the thermal conductance of the insulation structure. Cytochrome c protein, having a high TCR, is a good candidate for infrared detection. We can use SU-8 photoresist for the thermal insulation structure, given its low thermal conductance. In this study, we designed a platform structure based on a SU-8 photoresist. We fabricated an infrared sensing pixel and recorded a high TCR for this new structure. The SU-8 photoresist insulation structure was fabricated using the exposure dose method. We experimentally demonstrated high values of TCR from 22%/K to 25.7%/K, and the measured noise was 1.2 × 10(-8) V2/Hz at 60 Hz. When the bias current was 2 μA, the calculated voltage responsivity was 1.16 × 10(5) V/W. This study presents a new kind of microbolometer based on cytochrome c protein on top of an SU-8 photoresist platform that does not require expensive vacuum deposition equipment.
authors: Graduate Institute of Photonics and Optoelectronics, National Taiwan University, No. 1, Roosevelt Road, Section 4, Taipei 106, Taiwan. r99941023@ntu.edu.tw
authors: Jian-Lun
authors: JL
authors: Lai
authors: Chien-Jen
authors: CJ
authors: Liao
authors: Guo-Dung John
authors: GD
authors: Su
mesh_terms: D045304:Cytochromes c / Q000737:chemistry*; D004852:Epoxy Compounds / Q000737:chemistry*; D007259:Infrared Rays; D011108:Polymers / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D004852:Epoxy Compounds; D011108:Polymers; C520895:SU-8 compound; D045304:Cytochromes c