title: Chemical vapor deposition synthesis and Raman spectroscopic characterization of large-area graphene sheets.
abstract: We present a chemical vapor deposition (CVD) method to catalytically synthesize large-area, transferless, single- to few-layer graphene sheets using hexamethyldisilazane (HMDS) on a SiO2/Si substrate as a carbon source and thermally evaporated alternating Ni/Cu/Ni layers as a catalyst. The as-synthesized graphene films were characterized by Raman spectroscopic imaging to identify single- to few-layer sheets. This HMDS-derived graphene layer is continuous over the entire growth substrate, and single- to trilayer mixed sheets can be up to 30 μm in the lateral dimension. With the synthetic CVD method proposed here, graphene can be grown into tailored shapes directly on a SiO2/Si surface through vapor priming of HMDS onto predefined photolithographic patterns. The transparent and conductive HMDS-derived graphene exhibits its potential for widespread electronic and opto-electronic applications.
authors: Department of Chemistry, National Taiwan University , Taipei 106, Taiwan.
authors: Chun-Da
authors: CD
authors: Liao
authors: Yi-Ying
authors: YY
authors: Lu
authors: Srinivasa Reddy
authors: SR
authors: Tamalampudi
authors: Hung-Chieh
authors: HC
authors: Cheng
authors: Yit-Tsong
authors: YT
authors: Chen