title: Controlled placement of colloidal quantum dots in sub-15 nm clusters.
abstract: We demonstrated a technique to control the placement of 6 nm-diameter CdSe and 5 nm-diameter CdSe/CdZnS colloidal quantum dots (QDs) through electron-beam lithography. This QD-placement technique resulted in an average of three QDs in each cluster, and 87% of the templated sites were occupied by at least one QD. These QD clusters could be in close proximity to one another, with a minimum separation of 12 nm. Photoluminescence measurements of the fabricated QD clusters showed intermittent photoluminescence, which indicates that the QDs were optically active after the fabrication process. This optimized top-down lithographic process is a step towards the integration of individual QDs in optoelectronic and nano-optical systems.
authors: Electrical Engineering and Computer Science Department, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA.
authors: Vitor R
authors: VR
authors: Manfrinato
authors: Darcy D
authors: DD
authors: Wanger
authors: David B
authors: DB
authors: Strasfeld
authors: Hee-Sun
authors: HS
authors: Han
authors: Francesco
authors: F
authors: Marsili
authors: Jose P
authors: JP
authors: Arrieta
authors: Tamar S
authors: TS
authors: Mentzel
authors: Moungi G
authors: MG
authors: Bawendi
authors: Karl K
authors: KK
authors: Berggren