title: Sensitivity calibration of an imaging extreme ultraviolet spectrometer-detector system for determining the efficiency of broadband extreme ultraviolet sources.
abstract: We report on the absolute sensitivity calibration of an extreme ultraviolet (XUV) spectrometer system that is frequently employed to study emission from short-pulse laser experiments. The XUV spectrometer, consisting of a toroidal mirror and a transmission grating, was characterized at a synchrotron source in respect of the ratio of the detected to the incident photon flux at photon energies ranging from 15.5 eV to 99 eV. The absolute calibration allows the determination of the XUV photon number emitted by laser-based XUV sources, e.g., high-harmonic generation from plasma surfaces or in gaseous media. We have demonstrated high-harmonic generation in gases and plasma surfaces providing 2.3 μW and μJ per harmonic using the respective generation mechanisms.
authors: Institute of Optics und Quantum Electronics, Friedrich-Schiller-University Jena, Germany. silvio.fuchs@uni-jena.de
authors: S
authors: S
authors: Fuchs
authors: C
authors: C
authors: Rödel
authors: M
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authors: Krebs
authors: S
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authors: Hädrich
authors: J
authors: J
authors: Bierbach
authors: A E
authors: AE
authors: Paz
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authors: Kuschel
authors: M
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authors: Wünsche
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authors: Hilbert
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authors: Zastrau
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authors: Förster
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authors: Limpert
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authors: Paulus