title: The extended growth of graphene oxide flakes using ethanol CVD.
abstract: We report the extended growth of Graphene Oxide (GO) flakes using atmospheric pressure ethanol Chemical Vapor Deposition (CVD). GO was used to catalyze the deposition of carbon on a substrate in the ethanol CVD with Ar and H2 as carrier gases. Raman, SEM, XPS and AFM characterized the growth to be a reduced GO (RGO) of <5 layers. This newly grown RGO possesses lower defect density with larger and increased distribution of sp(2) domains than chemically reduced RGO. Furthermore this method without optimization reduces the relative standard deviation of electrical conductivity between chips, from 80.5% to 16.5%, enabling RGO to be used in practical electronic devices.
authors: School of Material Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 637553, Singapore.
authors: Jingfeng
authors: J
authors: Huang
authors: Melanie
authors: M
authors: Larisika
authors: W H Derrick
authors: WH
authors: Fam
authors: Qiyuan
authors: Q
authors: He
authors: Myra A
authors: MA
authors: Nimmo
authors: Christoph
authors: C
authors: Nowak
authors: I Y Alfred
authors: IY
authors: Tok