title: Infrared absorption of n-type tensile-strained Ge-on-Si.
abstract: We analyze the IR absorption of tensile-strained, n-type Ge for Si-compatible laser applications. A strong intervalley scattering from the indirect L valleys to the direct Γ valley in n+ Ge-on-Si is reported for the first time to our knowledge. The intervalley absorption edge is in good agreement with the theoretical value. On the other hand, we found that the classical λ2-dependent Drude model of intravalley free-carrier absorption (FCA) breaks down at λ<15 μm. A first-principle model has to be employed to reach a good agreement with the experimental data. The intravalley FCA loss is determined to be <20 cm(-1) for n=4×10(19) cm(-3) at λ=1.5-1.7 μm, an order lower than the results from Drude model. The strong L→Γ intervalley scattering favors electronic occupation of the direct Γ valley, thereby enhancing optical gain from the direct gap transition of Ge, while the low intravalley free-electron absorption at lasing wavelengths leads to low optical losses. These two factors explain why the first electrically pumped Ge-on-Si laser achieved a higher net gain than the theoretical prediction using λ2-dependent free-carrier losses of bulk Ge and indicate the great potential for further improvement of Ge-on-Si lasers.
authors: Thayer School of Engineering, Dartmouth College, Hanover, New Hampshire 03755, USA.
authors: Xiaoxin
authors: X
authors: Wang
authors: Haofeng
authors: H
authors: Li
authors: Rodolfo
authors: R
authors: Camacho-Aguilera
authors: Yan
authors: Y
authors: Cai
authors: Lionel C
authors: LC
authors: Kimerling
authors: Jurgen
authors: J
authors: Michel
authors: Jifeng
authors: J
authors: Liu