title: Optical and microstructural properties of ZnO/TiO2 nanolaminates prepared by atomic layer deposition.
abstract: ZnO/TiO2 nanolaminates were grown on Si (100) and quartz substrates by atomic layer deposition at 200°C using diethylzinc, titanium isopropoxide, and deionized water as precursors. All prepared multilayers are nominally 50 nm thick with a varying number of alternating TiO2 and ZnO layers. Sample thickness and ellipsometric spectra were measured using a spectroscopic ellipsometer, and the parameters determined by computer simulation matched with the experimental results well. The effect of nanolaminate structure on the optical transmittance is investigated using an ultraviolet-visible-near-infrared spectrometer. The data from X-ray diffraction spectra suggest that layer growth appears to be substrate sensitive and film thickness also has an influence on the crystallization of films. High-resolution transmission electron microscopy images show clear lattice spacing of ZnO in nanolaminates, indicating that ZnO layers are polycrystalline with preferred (002) orientation while TiO2 layers are amorphous.
authors: State Key Laboratory of ASIC and System, Department of Microelectronics, Fudan University, Shanghai 200433, China. honglianglu@fudan.edu.cn.
authors: Yu-Zhu
authors: YZ
authors: Gu
authors: Hong-Liang
authors: HL
authors: Lu
authors: Yang
authors: Y
authors: Geng
authors: Zhi-Yuan
authors: ZY
authors: Ye
authors: Yuan
authors: Y
authors: Zhang
authors: Qing-Qing
authors: QQ
authors: Sun
authors: Shi-Jin
authors: SJ
authors: Ding
authors: David Wei
authors: DW
authors: Zhang