title: Method for characterization of Si waveguide propagation loss.
abstract: A new method for measuring waveguide propagation loss in silicon nanowires is presented. This method, based on the interplay between traveling ring modes and standing wave modes due to back-scattering from edge roughness, is accurate and can be used for on wafer measurement of test structures. Examples of loss measurements and fitting are reported.
authors.affiliation: PhotonIC Corporation, 5800 Uplander Way, Los Angeles, CA 90230, USA.
authors.forename: Michele
authors.initials: M
authors.lastname: Moresco
authors.forename: Marco
authors.initials: M
authors.lastname: Romagnoli
authors.forename: Stefano
authors.initials: S
authors.lastname: Boscolo
authors.forename: Michele
authors.initials: M
authors.lastname: Midrio
authors.forename: Matteo
authors.initials: M
authors.lastname: Cherchi
authors.forename: Ehsan Shah
authors.initials: ES
authors.lastname: Hosseini
authors.forename: Douglas
authors.initials: D
authors.lastname: Coolbaugh
authors.forename: Michael R
authors.initials: MR
authors.lastname: Watts
authors.forename: Birendra
authors.initials: B
authors.lastname: Dutt