title: Integration of solid-state nanopores in a 0.5 μm CMOS foundry process.
abstract: High-bandwidth and low-noise nanopore sensor and detection electronics are crucial in achieving single-DNA-base resolution. A potential way to accomplish this goal is to integrate solid-state nanopores within a CMOS platform, in close proximity to the biasing electrodes and custom-designed amplifier electronics. Here we report the integration of solid-state nanopore devices in a commercial complementary metal-oxide-semiconductor (CMOS) potentiostat chip implemented in On-Semiconductor's 0.5 μm technology. Nanopore membranes incorporating electrodes are fabricated by post-CMOS micromachining utilizing the n+ polysilicon/SiO2/n+ polysilicon capacitor structure available in the aforementioned process. Nanopores are created in the CMOS process by drilling in a transmission electron microscope and shrinking by atomic layer deposition. We also describe a batch fabrication method to process a large of number of electrode-embedded nanopores with sub-10 nm diameter across CMOS-compatible wafers by electron beam lithography and atomic layer deposition. The CMOS-compatibility of our fabrication process is verified by testing the electrical functionality of on-chip circuitry. We observe high current leakage with the CMOS nanopore devices due to the ionic diffusion through the SiO2 membrane. To prevent this leakage, we coat the membrane with Al2O3, which acts as an efficient diffusion barrier against alkali ions. The resulting nanopore devices also exhibit higher robustness and lower 1/f noise as compared to SiO2 and SiNx. Furthermore, we propose a theoretical model for our low-capacitance CMOS nanopore devices, showing good agreement with the experimental value. In addition, experiments and theoretical models of translocation studies are presented using 48.5 kbp λ-DNA in order to prove the functionality of on-chip pores coated with Al2O3.
authors.affiliation: Department of Electrical and Computer Engineering, University of California, Santa Barbara, CA 93106, USA.
authors.forename: A
authors.initials: A
authors.lastname: Uddin
authors.forename: S
authors.initials: S
authors.lastname: Yemenicioglu
authors.forename: C-H
authors.initials: CH
authors.lastname: Chen
authors.forename: E
authors.initials: E
authors.lastname: Corigliano
authors.forename: K
authors.initials: K
authors.lastname: Milaninia
authors.forename: L
authors.initials: L
authors.lastname: Theogarajan
mesh_terms: D004247:DNA / Q000737:chemistry / Q000302:isolation & purification; D004553:Electric Conductivity; D046529:Microscopy, Electron, Transmission; D058608:Nanopores / Q000648:ultrastructure*; D036103:Nanotechnology / Q000295:instrumentation* / Q000379:methods*; D010316:Particle Size; D015203:Reproducibility of Results; D012666:Semiconductors; D012822:Silicon Dioxide / Q000737:chemistry
chemical_list: D012822:Silicon Dioxide; D004247:DNA