title: Lithography-free fabrication of silicon nanowire and nanohole arrays by metal-assisted chemical etching.
abstract: We demonstrated a novel, simple, and low-cost method to fabricate silicon nanowire (SiNW) arrays and silicon nanohole (SiNH) arrays based on thin silver (Ag) film dewetting process combined with metal-assisted chemical etching. Ag mesh with holes and semispherical Ag nanoparticles can be prepared by simple thermal annealing of Ag thin film on a silicon substrate. Both the diameter and the distribution of mesh holes as well as the nanoparticles can be manipulated by the film thickness and the annealing temperature. The silicon underneath Ag coverage was etched off with the catalysis of metal in an aqueous solution containing HF and an oxidant, which form silicon nanostructures (either SiNW or SiNH arrays). The morphologies of the corresponding etched SiNW and SiNH arrays matched well with that of Ag holes and nanoparticles. This novel method allows lithography-free fabrication of the SiNW and SiNH arrays with control of the size and distribution.
authors.affiliation: Jiangsu Key Laboratory for Carbon-Based Functional Materials & Devices, Institute of Functional Nano & Soft Materials (FUNSOM), Soochow University, Suzhou, 215123, People's Republic of China. bqsun@suda.edu.cn.
authors.forename: Ruiyuan
authors.initials: R
authors.lastname: Liu
authors.forename: Fute
authors.initials: F
authors.lastname: Zhang
authors.forename: Celal
authors.initials: C
authors.lastname: Con
authors.forename: Bo
authors.initials: B
authors.lastname: Cui
authors.forename: Baoquan
authors.initials: B
authors.lastname: Sun
references.citation: J Am Chem Soc. 2010 May 26;132(20):6872-3
references.pmid: 20426468
references.citation: Nano Lett. 2008 Sep;8(9):3046-51
references.pmid: 18698834
references.citation: Nat Mater. 2007 May;6(5):379-84
references.pmid: 17450146
references.citation: Adv Mater. 2011 Jan 11;23(2):285-308
references.pmid: 20859941
references.citation: Science. 2001 Aug 17;293(5533):1289-92
references.pmid: 11509722
references.citation: J Am Chem Soc. 2008 Jul 23;130(29):9224-5
references.pmid: 18576622
references.citation: Nano Lett. 2009 Jul;9(7):2519-25
references.pmid: 19480399
references.citation: Nano Lett. 2010 Mar 10;10(3):1012-5
references.pmid: 20141156
references.citation: Small. 2005 Nov;1(11):1062-7
references.pmid: 17193395
references.citation: Nanotechnology. 2010 Apr 16;21(15):155601
references.pmid: 20299723
references.citation: Nature. 2007 Oct 18;449(7164):885-9
references.pmid: 17943126
references.citation: Nano Lett. 2008 Nov;8(11):3799-802
references.pmid: 18954118
references.citation: Angew Chem Int Ed Engl. 2005 Apr 29;44(18):2737-2742
references.pmid: 15812791
references.citation: Phys Rev Lett. 1996 Aug 19;77(8):1536-1539
references.pmid: 10063103
references.citation: ACS Nano. 2011 Apr 26;5(4):3222-9
references.pmid: 21388226
references.citation: Nanotechnology. 2010 Mar 5;21(9):095302
references.pmid: 20110585
references.citation: Nano Lett. 2010 Mar 10;10(3):1082-7
references.pmid: 20108969
references.citation: Nano Lett. 2012 Jun 13;12(6):2971-6
references.pmid: 22545674