title: Wafer-scale patterning of reduced graphene oxide electrodes by transfer-and-reverse stamping for high performance OFETs.
abstract: A wafer-scale patterning method for solution-processed graphene electrodes, named the transfer-and-reverse stamping method, is universally applicable for fabricating source/drain electrodes of n- and p-type organic field-effect transistors with excellent performance. The patterning method begins with transferring a highly uniform reduced graphene oxide thin film, which is pre-prepared on a glass substrate, onto hydrophobic silanized (rigid/flexible) substrates. Patterns of the as-prepared reduced graphene oxide films are then formed by modulating the surface energy of the films and selectively delaminating the films using an oxygen-plasma-treated elastomeric stamp with patterns. Reduced graphene oxide patterns with various sizes and shapes can be readily formed onto an entire wafer. Also, they can serve as the source/drain electrodes for benchmark n- and p-type organic field-effect transistors with enhanced performance, compared to those using conventional metal electrodes. These results demonstrate the general utility of this technique. Furthermore, this simple, inexpensive, and scalable electrode-patterning-technique leads to assembling organic complementary circuits onto a flexible substrate successfully.
authors.affiliation: Department of Organic Materials and Fiber Engineering, Soongsil University, Seoul 156-746, Republic of Korea.
authors.forename: Joong Suk
authors.initials: JS
authors.lastname: Lee
authors.forename: Nam Hee
authors.initials: NH
authors.lastname: Kim
authors.forename: Moon Sung
authors.initials: MS
authors.lastname: Kang
authors.forename: Hojeong
authors.initials: H
authors.lastname: Yu
authors.forename: Dong Ryoul
authors.initials: DR
authors.lastname: Lee
authors.forename: Joon Hak
authors.initials: JH
authors.lastname: Oh
authors.forename: Suk Tai
authors.initials: ST
authors.lastname: Chang
authors.forename: Jeong Ho
authors.initials: JH
authors.lastname: Cho
keywords: flexible inverters; micropatterning; reduced graphene oxide; source-drain electrodes; thin films