title: Robust graphene membranes in a silicon carbide frame.
abstract: We present a fabrication process for freely suspended membranes consisting of bi- and trilayer graphene grown on silicon carbide. The procedure, involving photoelectrochemical etching, enables the simultaneous fabrication of hundreds of arbitrarily shaped membranes with an area up to 500 μm(2) and a yield of around 90%. Micro-Raman and atomic force microscopy measurements confirm that the graphene layer withstands the electrochemical etching and show that the membranes are virtually unstrained. The process delivers membranes with a cleanliness suited for high-resolution transmission electron microscopy (HRTEM) at atomic scale. The membrane, and its frame, is very robust with respect to thermal cycling above 1000 °C as well as harsh acidic or alkaline treatment.
authors.affiliation: Lehrstuhl für Angewandte Physik, Universität Erlangen-Nürnberg, Germany.
authors.forename: Daniel
authors.initials: D
authors.lastname: Waldmann
authors.forename: Benjamin
authors.initials: B
authors.lastname: Butz
authors.forename: Sebastian
authors.initials: S
authors.lastname: Bauer
authors.forename: Jan M
authors.initials: JM
authors.lastname: Englert
authors.forename: Johannes
authors.initials: J
authors.lastname: Jobst
authors.forename: Konrad
authors.initials: K
authors.lastname: Ullmann
authors.forename: Felix
authors.initials: F
authors.lastname: Fromm
authors.forename: Maximilian
authors.initials: M
authors.lastname: Ammon
authors.forename: Michael
authors.initials: M
authors.lastname: Enzelberger
authors.forename: Andreas
authors.initials: A
authors.lastname: Hirsch
authors.forename: Sabine
authors.initials: S
authors.lastname: Maier
authors.forename: Patrik
authors.initials: P
authors.lastname: Schmuki
authors.forename: Thomas
authors.initials: T
authors.lastname: Seyller
authors.forename: Erdmann
authors.initials: E
authors.lastname: Spiecker
authors.forename: Heiko B
authors.initials: HB
authors.lastname: Weber