title: CMOS-compatible high efficiency double-etched apodized waveguide grating coupler.
abstract: We present a high efficiency double-etched apodized fiber-to-waveguide grating coupler on a silicon-on-insulator substrate, which can be fabricated using deep UV photolithography. The fabricated grating coupler yields a coupling loss of -1.5 dB with 3-dB bandwidth of 54 nm at a wavelength of 1560 nm. Measurements and simulations show that the double-etched apodized grating coupler design is robust and tolerant to fabrication process variations.
authors.affiliation: Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research), 11 Science Park Road, Science Park II, 117685 Singapore. lic@ime.a-star.edu.sg
authors.forename: Chao
authors.initials: C
authors.lastname: Li
authors.forename: Huijuan
authors.initials: H
authors.lastname: Zhang
authors.forename: Mingbin
authors.initials: M
authors.lastname: Yu
authors.forename: G Q
authors.initials: GQ
authors.lastname: Lo
mesh_terms: D004867:Equipment Design; D019544:Equipment Failure Analysis; D005336:Fiber Optic Technology / Q000295:instrumentation*; D012031:Refractometry / Q000295:instrumentation*; D012666:Semiconductors; D020349:Surface Plasmon Resonance / Q000295:instrumentation*