title: Sub-100nm pattern generation by laser direct writing using a confinement layer.
abstract: A novel technique is introduced that dramatically increases the quality and spatial resolution of directly ablated periodic nanostructures on materials. The presented method utilizes a PMMA confinement layer spin coated on the surface of the ablated material reducing the violence and speed of expansion of the molten material. As a result, droplet formation deteriorating the achievable resolution can be completely avoided. Moreover, motion control of the molten material leads to structural details with dimensions well below the irradiation wavelength.
authors.affiliation: Laser-Laboratorium Göttingen e.V., Hans-Adolf-Krebs-Weg 1, 37077 Göttingen, Germany. Jan-Hendrik.Klein-Wiele@llg-ev.de
authors.forename: Jan-Hendrik
authors.initials: JH
authors.lastname: Klein-Wiele
authors.forename: Peter
authors.initials: P
authors.lastname: Simon
mesh_terms: D007834:Lasers; D008422:Materials Testing; D054802:Molecular Imprinting / Q000379:methods*; D053758:Nanoparticles / Q000737:chemistry* / Q000528:radiation effects* / Q000648:ultrastructure; D019904:Polymethyl Methacrylate / Q000737:chemistry* / Q000528:radiation effects*; D013499:Surface Properties / Q000528:radiation effects
chemical_list: D019904:Polymethyl Methacrylate