title: Smallest metallic nanorods using physical vapor deposition.
abstract: Physical vapor deposition provides a controllable means of growing two-dimensional metallic thin films and one-dimensional metallic nanorods. While theories exist for the growth of metallic thin films, their counterpart for the growth of metallic nanorods is absent. Because of this absence, the lower limit of the nanorod diameter is theoretically unknown; consequently the experimental pursuit of the smallest nanorods has no clear target. This Letter reports a closed-form theory that defines the diameter of the smallest metallic nanorods using physical vapor deposition. Further, the authors verify the theory using lattice kinetic Monte Carlo simulations and validate the theory using published experimental data. Finally, the authors carry out a series of theory-guided experiments to grow well-separated metallic nanorods of ∼10  nm in diameter, which are the smallest ever reported using physical vapor deposition.
authors.affiliation: Department of Mechanical Engineering, University of Connecticut, Storrs, Connecticut 06269, USA.
authors.forename: Xiaobin
authors.initials: X
authors.lastname: Niu
authors.forename: Stephen P
authors.initials: SP
authors.lastname: Stagon
authors.forename: Hanchen
authors.initials: H
authors.lastname: Huang
authors.forename: J Kevin
authors.initials: JK
authors.lastname: Baldwin
authors.forename: Amit
authors.initials: A
authors.lastname: Misra