title: Resistless nanoimprinting in metal for plasmonic nanostructures.
abstract: Metal nanostructures are the main building blocks of metamaterials and plasmonics which show many extraordinary properties not existing in nature. A simple and widely applicable method that can directly pattern metals with silicon molds without the need of resists, using pressures of <4 MPa and temperatures of 25-150 °C is reported. Three-dimensional structures with smooth and vertical sidewalls, down to sub-10 nm resolution, are generated in silver and gold films in a single patterning step. Using this nanopatterning scheme, large-scale vivid images through extraordinary optical transmission and strong surface-enhanced Raman scattering substrates are realized. Resistless nanoimprinting in metal (RNIM) is a new class of metal patterning that allows plasmonic nanostructures to be fabricated quickly, repeatedly, and at a low-cost.
authors.affiliation: Birck Nanotechnology Center and School of Electrical and Computer Engineering, Purdue University, Indiana 47907, USA.
authors.forename: Leo T
authors.initials: LT
authors.lastname: Varghese
authors.forename: Li
authors.initials: L
authors.lastname: Fan
authors.forename: Yi
authors.initials: Y
authors.lastname: Xuan
authors.forename: Chookiat
authors.initials: C
authors.lastname: Tansarawiput
authors.forename: Sangsik
authors.initials: S
authors.lastname: Kim
authors.forename: Minghao
authors.initials: M
authors.lastname: Qi
keywords: extraordinary optical transmission; metal patterning; nanoimprint lithography; plasmonics; surface enhanced Raman scattering