title: New deposition technique for metal films containing inorganic fullerene-like (IF) nanoparticles.
abstract: This study describes a new method for fabrication of thin composite films using physical vapor deposition (PVD). Titanium (Ti) and hybrid films of titanium containing tungsten disulphide nanoparticles with inorganic fullerene-like structure (Ti/IF-WS2) were fabricated with a modified PVD machine. The evaporation process includes the pulsed deposition of IF-WS2 by a sprayer head. This process results in IF-WS2 nanoparticles embedded in a Ti matrix. The layers were characterized by various techniques, which confirm the composition and structure of the hybrid film. The Ti/IF-WS2 shows better wear resistance and a lower friction coefficient when compared to the Ti layer or Ti substrate. The Ti/IF films show very good antireflective properties in the visible and near-IR region. Such films may find numerous applications, for example, in the aerospace and medical technology.
authors: Department of Materials and Interfaces, Weizmann Institute, Rehovot 76100, Israel.
authors: Ohad
authors: O
authors: Goldbart
authors: Alexander
authors: A
authors: Yoffe
authors: Sidney R
authors: SR
authors: Cohen
authors: Rita
authors: R
authors: Rosentsveig
authors: Yishay
authors: Y
authors: Feldman
authors: Lev
authors: L
authors: Rapoport
authors: Reshef
authors: R
authors: Tenne
mesh_terms: D053758:Nanoparticles / Q000737:chemistry*; D010316:Particle Size; D013440:Sulfides / Q000737:chemistry*; D013499:Surface Properties; D014025:Titanium / Q000737:chemistry*; D014414:Tungsten / Q000737:chemistry*; D014835:Volatilization
chemical_list: D013440:Sulfides; D014025:Titanium; D014414:Tungsten
keywords: nanostructures; physical vapor deposition; thin films; titanium; tribology