title: Fabrication of nanoporous arrays from photosensitive organic-inorganic hybrid materials by using an UV soft nanoimprint technique.
abstract: A honeycomb-like regular nanoporous pattern built in the photosensitive organic-inorganic hybrid film was fabricated by an UV soft nanoimprint technique. Polydimethylsiloxane (PDMS) soft mold was firstly replicated from an anodic aluminum oxide (AAO) template obtained by using a two-step anodization method. Scanning electron microscopy images show that the AAO template has a regular honeycomb-like nanoporous structure, while the PDMS soft mold has a relief structure of nanopillar arrays. Photosensitive TiO2-contained organic-inorganic hybrid films, which were prepared by combining a low temperature sol-gel process with a spin-coating technique, were used as the imprinted layer. Thus, a honeycomb-like regular nanoporous pattern built in the hybrid film can be easily obtained by imprinting the PDMS soft mold into the photosensitive hybrid film under an UV-irradiation. The as-fabricated organic-inorganic regular nonporous arrays have potential applications in two-dimensional photonic crystal.
authors: Electronic Materials Research Laboratory, School of Electronic and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, Shaanxi, People's Republic of China.
authors: Xuehua
authors: X
authors: Zhang
authors: Wenxiu
authors: W
authors: Que
authors: Jiaxing
authors: J
authors: Hu
authors: Jin
authors: J
authors: Chen
authors: Jin
authors: J
authors: Zhang
authors: Weiguo
authors: W
authors: Liu