title: Nanoscale silver-assisted wet etching of crystalline silicon for anti-reflection surface textures.
abstract: We report here an electro-less metal-assisted chemical etching (MacEtch) process as light management surface-texturing technique for single crystalline Si photovoltaics. Random Silver nanostructures were formed on top of the Si surface based on the thin film evaporation and annealing process. Significant reflection reduction was obtained from the fabricated Si sample, with approximately 2% reflection over a wide spectra range (300 to 1050 nm). The work demonstrates the potential of MacEtch process for anti-reflection surface texture fabrication of large area, high efficiency, and low cost thin film solar cell.
authors: Institute of Near-Field Optics and Nano Technology, School of Physics and Optoelectronic Technology Dalian University of Technology, Dalian 116024, P. R. China.
authors: Rui
authors: R
authors: Li
authors: Shuling
authors: S
authors: Wang
authors: Santhad
authors: S
authors: Chuwongin
authors: Weidong
authors: W
authors: Zhou
mesh_terms: D008027:Light; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D012031:Refractometry; D012542:Scattering, Radiation; D012825:Silicon / Q000737:chemistry*; D012834:Silver / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D012834:Silver; D012825:Silicon