title: Ageing dynamics of ion bombardment induced self-organization processes.
abstract: Instabilities caused during the erosion of a surface by an ion beam can lead to the formation of self-organized patterns of nanostructures. Understanding the self-organization process requires not only the in-situ characterization of ensemble averaged properties but also probing the dynamics. This can be done with the use of coherent X-rays and analyzing the temporal correlations of the scattered intensity. Here, we show that the dynamics of a semiconductor surface nanopatterned by normal incidence ion beam sputtering are age-dependent and slow down with sputtering time. This work provides a novel insight into the erosion dynamics and opens new perspectives for the understanding of self-organization mechanisms.
authors.affiliation: XMaS, The UK-CRG Beamline, European Synchrotron Radiation Facility, B.P. 220, F-38043 Grenoble cedex 09, France. oier.bikondoa@esrf.fr
authors.forename: Oier
authors.initials: O
authors.lastname: Bikondoa
authors.forename: Dina
authors.initials: D
authors.lastname: Carbone
authors.forename: Virginie
authors.initials: V
authors.lastname: Chamard
authors.forename: Till Hartmut
authors.initials: TH
authors.lastname: Metzger
mesh_terms: D008422:Materials Testing; D008962:Models, Theoretical; D049329:Nanostructures / Q000737:chemistry*; D056951:Photoelectron Spectroscopy; D012666:Semiconductors; D013499:Surface Properties; D014965:X-Rays