title: The stoichiometry of electroless silicon etching in solutions of V2O5 and HF.
authors.affiliation: Department of Chemistry, West Chester University, West Chester, PA 19383, USA. k.w.kolasinski@wcupa.edu
authors.forename: Kurt W
authors.initials: KW
authors.lastname: Kolasinski
authors.forename: William B
authors.initials: WB
authors.lastname: Barclay