title: Solvent-assisted directed self-assembly of spherical microdomain block copolymers to high areal density arrays.
abstract: The fabrication process for 5 Tb/in(2) bit patterns using solvent-assisted directed self-assembly is investigated. The N-methyl-2-pyrrolidone solvent vapor-annealing method was used to achieve good long-range lateral ordering of low-molecular-weight polystyrene-block-polydimethylsiloxane with a lattice spacing of 11 nm on flat Si substrates, PS modified substrates and lithographically patterned substrates, respectively.
authors.affiliation: Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts, Amherst, MA 01003, USA.
authors.forename: Weiyin
authors.initials: W
authors.lastname: Gu
authors.forename: Ji
authors.initials: J
authors.lastname: Xu
authors.forename: Jung-Keun
authors.initials: JK
authors.lastname: Kim
authors.forename: Sung Woo
authors.initials: SW
authors.lastname: Hong
authors.forename: Xinyu
authors.initials: X
authors.lastname: Wei
authors.forename: Xiaomin
authors.initials: X
authors.lastname: Yang
authors.forename: Kim Y
authors.initials: KY
authors.lastname: Lee
authors.forename: David S
authors.initials: DS
authors.lastname: Kuo
authors.forename: Shuaigang
authors.initials: S
authors.lastname: Xiao
authors.forename: Thomas P
authors.initials: TP
authors.lastname: Russell
mesh_terms: D010316:Particle Size; D011108:Polymers / Q000138:chemical synthesis* / Q000737:chemistry; D012997:Solvents / Q000737:chemistry; D013499:Surface Properties
chemical_list: D011108:Polymers; D012997:Solvents
keywords: bit-patterned media; block copolymers; directed self-assembly; nanodots; solvent annealing