title: Exploration of plasma-enhanced chemical vapor deposition as a method for thin-film fabrication with biological applications.
abstract: Chemical vapor deposition (CVD) has been used historically for the fabrication of thin films composed of inorganic materials. But the advent of specialized techniques such as plasma-enhanced chemical vapor deposition (PECVD) has extended this deposition technique to various monomers. More specifically, the deposition of polymers of responsive materials, biocompatible polymers, and biomaterials has made PECVD attractive for the integration of biotic and abiotic systems. This review focuses on the mechanisms of thin-film growth using low-pressure PECVD and current applications of classic PECVD thin films of organic and inorganic materials in biological environments. The last part of the review explores the novel application of low-pressure PECVD in the deposition of biological materials.
authors.affiliation: Soft Matter Materials Branch, Materials and Manufacturing Directorate, Wright-Patterson Air Force Base, Dayton, Ohio 45432, United States.
authors.forename: Milana C
authors.initials: MC
authors.lastname: Vasudev
authors.forename: Kyle D
authors.initials: KD
authors.lastname: Anderson
authors.forename: Timothy J
authors.initials: TJ
authors.lastname: Bunning
authors.forename: Vladimir V
authors.initials: VV
authors.lastname: Tsukruk
authors.forename: Rajesh R
authors.initials: RR
authors.lastname: Naik
mesh_terms: D001672:Biocompatible Materials; D058626:Plasma Gases
chemical_list: D001672:Biocompatible Materials; D058626:Plasma Gases