title: Dip-pen nanolithography: controlling surface architecture on the sub-100 nanometer length scale.
abstract: A new method for patterning surfaces with organic structures, termed "dip-pen" nanolithography (DPN), has been developed. DPN allows one to deliver collections of molecules to a surface in a positive printing mode. The technique offers 15 nm linewidths and 5 nm spatial resolution. Current capabilities and future applications of DPN are discussed.
authors.affiliation: Northwestern University Chemistry Department and NU Institute for Nanotechnology, 2145 Sheridan Rd, Evanston, IL 60208, USA. camirkin@chem.nwu.edu
authors.forename: C A
authors.initials: CA
authors.lastname: Mirkin
authors.forename: S
authors.initials: S
authors.lastname: Hong
authors.forename: L
authors.initials: L
authors.lastname: Demers