title: A damascene platform for controlled ultra-thin nanowire fabrication.
abstract: This paper presents a damascene process for the fabrication of titanium micro/nanostructures and nanowires with adjustable thickness down to 2 nm. Their depth is precisely controlled by chemical-mechanical planarization together with in-process electrical characterization. The latter, in combination with a model of the titanium resistivity versus thickness, allows control of the metal line depth in the nanometer range. In summary, we have developed a planarization end point detection method for metal nanostructures. In addition, the model adopted covers geometrical influences like oxidation and ageing. The fabricated titanium nanowire test structures have a thickness ranging from 2 to 25 nm and a width ranging between 15 and 230 nm.
authors.affiliation: Laboratoire Nanotechnologies et Nanosystèmes-UMI-LN2 346, CNRS/INSA Lyon/ECL/CPE Lyon/UJF 3IT, Université de Sherbrooke, Sherbrooke, QC, Canada.
authors.forename: M
authors.initials: M
authors.lastname: Guilmain
authors.forename: T
authors.initials: T
authors.lastname: Labbaye
authors.forename: F
authors.initials: F
authors.lastname: Dellenbach
authors.forename: C
authors.initials: C
authors.lastname: Nauenheim
authors.forename: D
authors.initials: D
authors.lastname: Drouin
authors.forename: S
authors.initials: S
authors.lastname: Ecoffey